公开(公告)号：US07872247B2

公开(公告)日：2011-01-18

申请号：US11907403

申请日：2007-10-11

Applicant: Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

Inventor： Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

IPC: H01J37/317 ,  H01L21/265

CPC classification number: H01J37/16 ,  H01J37/026 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/31705

Abstract: A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.

Abstract translation: 位于邻近被植入的半导体晶片的离子注入机中的离子束引导管具有向外渐缩的中心孔，从而减轻离子束通过引导管的束冲击问题。

公开(公告)号：US20090095916A1

公开(公告)日：2009-04-16

申请号：US11907403

申请日：2007-10-11

Applicant: Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

Inventor： Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

IPC: H01J3/14

CPC classification number: H01J37/16 ,  H01J37/026 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/31705

Abstract: A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.

Abstract translation: 位于邻近被植入的半导体晶片的离子注入机中的离子束引导管具有向外渐缩的中心孔，从而减轻离子束通过引导管的束冲击问题。

公开(公告)号：US20090189597A1

公开(公告)日：2009-07-30

申请号：US12022793

申请日：2008-01-30

Applicant: Chris Lagerberg ,  Duncan Kearsley ,  Matthew Castle ,  Charles Bowden

Inventor： Chris Lagerberg ,  Duncan Kearsley ,  Matthew Castle ,  Charles Bowden

IPC: G01R19/155

CPC classification number: G01R19/2503 ,  G01R1/04 ,  G01R1/06788 ,  G01R13/405 ,  G01R15/12

Abstract: An instrument for testing an electrical circuit includes a housing, a printed circuit board disposed within the housing, and at least one probe in electrical communication with the printed circuit board. The instrument further includes a plurality of panels disposed within the housing, wherein each one of the plurality of panels has an indicator. Each of the plurality of panels is capable of being activated into an on state in response to an electrical measurement. When at least one of the plurality of panels is activated the indicator on that panel substantially corresponds to a magnitude of the electrical measurement.

Abstract translation: 一种用于测试电路的仪器包括壳体，设置在壳体内的印刷电路板以及与印刷电路板电连通的至少一个探针。 仪器还包括设置在壳体内的多个面板，其中多个面板中的每一个具有指示器。 响应于电测量，多个面板中的每一个能够被激活成打开状态。 当多个面板中的至少一个被激活时，该面板上的指示器基本上对应于电测量的大小。

公开(公告)号：US07807984B2

公开(公告)日：2010-10-05

申请号：US12003852

申请日：2008-01-02

Applicant: Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

Inventor： Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

IPC: H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/24405 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Components in an ion implanter that may see incidence of the ion beam include a chamber having an elongate slot opening defined by edges so that a central portion of the ion beam enters the component through the opening with the edges clipping at least a peripheral portion of the ion beam. The arrangement mitigates the problem of sputtered material escaping back out from the component and becoming entrained in the ion beam.

Abstract translation: 可以看到离子束的入射的离子注入机中的部件包括具有由边缘限定的细长狭缝开口的室，使得离子束的中心部分通过开口进入部件，边缘至少限定 离子束。 该装置减轻了溅射材料从组件中退出并被夹带在离子束中的问题。

公开(公告)号：US20090166565A1

公开(公告)日：2009-07-02

申请号：US12003852

申请日：2008-01-02

Applicant: Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

Inventor： Gregory Robert Alcott ,  Adrian Murrell ,  Matthew Castle ,  Martin Hilkene

IPC: G21K5/00

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0268 ,  H01J2237/028 ,  H01J2237/24405 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: The present invention relates to components in an ion implanter that may see incidence of the ion beam, such as a beam dump or a beam stop. Such components will be prone to the ions sputtering material from their surfaces, and sputtered material may become entrained in the ion beam. This entrained material is a source of contamination. The present invention provides such components with a chamber having an elongate slot opening defined by edges, and operating the ion implanter such that a central portion of the ion beam enters the component through the opening with the edges clipping at least a peripheral portion of the ion beam. The arrangement mitigates the problem of sputtered material escaping back out from the component and becoming entrained in the ion beam.

Abstract translation: 本发明涉及离子注入机中的组件，其可以看到离子束的入射，例如光束倾倒或光束停止。 这些组分将倾向于从它们的表面离子溅射材料，并且溅射的材料可能被夹带在离子束中。 这种夹带的材料是污染源。 本发明提供了这样一些组件，其具有由边缘限定的细长狭槽开口的腔室，并操作离子注入机，使得离子束的中心部分通过开口进入组件，边缘至少夹住离子的周边部分 光束。 该装置减轻了溅射材料从组件中退出并被夹带在离子束中的问题。