Separation of gases containing SF6
    2.
    发明授权
    Separation of gases containing SF6 失效
    含SF6的气体分离

    公开(公告)号:US06454837B1

    公开(公告)日:2002-09-24

    申请号:US09763185

    申请日:2001-02-20

    IPC分类号: B01D5304

    摘要: Gas mixtures of SF6 and N2, which have been used, for example, as an insulating filler gas for underground cables, for insulating-gas window panes or as a filler gas for car tires and SF6/air mixtures which have been used as a protective gas when casting magnesium can be separated if they are contacted with hydrophobic zeolites of a certain pore size as selective adsorption agent for sulfur hexafluoride. For a relatively high SF6 concentration, the mixture is preferably first subjected to a membrane separation process and the permeate is contacted with the adsorption agent. The invention also relates to an apparatus for carrying out the process. The process may also be used for separating SF6 from exhaust gases.

    摘要翻译: SF6和N2的气体混合物已被用作例如用于地下电缆的绝缘填充气体,绝缘气体窗玻璃或用作汽车轮胎和SF6 /空气混合物的填充气体,其已被用作保护 如果铸造镁的气体与一定孔径的疏水性沸石接触,则可分离出气体作为六氟化硫的选择性吸附剂。 对于相对高的SF 6浓度,优选首先对该混合物进行膜分离处理,并使渗透物与吸附剂接触。 本发明还涉及一种用于执行该过程的装置。 该方法也可用于将SF6与废气分离。

    Etching Process
    5.
    发明申请
    Etching Process 审中-公开
    蚀刻工艺

    公开(公告)号:US20090068844A1

    公开(公告)日:2009-03-12

    申请号:US12296139

    申请日:2007-04-06

    摘要: Mixtures of fluorine and inert gases like nitrogen and/or argon can be used for etching of semiconductors, solar panels and flat panels (TFTs and LCDs), and for cleaning of semiconductor surfaces and plasma chambers. Preferably, fluorine is comprised in an amount of 15 to 25 vol.-% in binary mixtures. The gas mixtures can be used as substitute or drop-in for respective mixtures comprising NF3 and permit a very flexible operation of plasma apparatus. For example, apparatus tuned for NF3/Ar mixtures can be operated without further tuning using fluorine and argon, optionally together with nitrogen. The fluorine content is preferably in the range of 1 to 5 vol.-%, if ternary mixtures of fluorine, nitrogen and argon are used.

    摘要翻译: 氟和惰性气体如氮气和/或氩气的混合物可用于半导体,太阳能电池板和平板(TFT和LCD)的蚀刻以及半导体表面和等离子体室的清洗。 优选地,氟以二元混合物计含量为15至25体积%。 气体混合物可以用作包含NF 3的相应混合物的替代或滴加,并允许等离子体装置的非常灵活的操作。 例如,调节NF3 / Ar混合物的设备可以在不进一步调节的情况下使用氟和氩,任选与氮一起进行操作。 如果使用氟,氮和氩的三元混合物,氟含量优选在1至5体积%的范围内。

    Aluminum brazing method which avoids waste water
    8.
    发明授权
    Aluminum brazing method which avoids waste water 失效
    铝钎焊法避免废水

    公开(公告)号:US6105850A

    公开(公告)日:2000-08-22

    申请号:US186660

    申请日:1998-11-06

    摘要: A method of avoiding generation of waste water while brazing components made of aluminium or an aluminium alloy using a flux, especially a flux composed of an aqueous suspension of potassium fluoroaluminate. Since used suspension is replaced with fresh suspension after a given period of time and the apparatus regularly have to be cleaned, waste water is produced which contains flux, e.g. potassium fluoroaluminate. In the past, such waste water has been discharged into the environment. It has now been discovered that such waste water can be recycled to the brazing process after separation of the flux. In this manner, the production of waste water can be largely avoided. Since surfactants are frequently used, and these are likewise recirculated, a corresponding saving in terms of surfactant is possible. Furthermore, the environment is protected correspondingly.

    摘要翻译: 一种避免产生废水的方法,同时使用助熔剂特别是由氟铝酸钾的水悬浮液组成的焊剂钎焊铝或铝合金制成的组分。 由于在给定的时间段内使用的悬浮液被新鲜的悬浮液代替,并且该装置经常需要清洁,因此产生含有助熔剂的废水, 氟铝酸钾 过去这种废水已经排入环境。 现在已经发现,在分离助熔剂之后,这种废水可以再循环到钎焊过程中。 以这种方式,可以大大地避免废水的生产。 由于表面活性剂经常被使用,并且它们同样被再循环,因此表面活性剂的相应的节省是可能的。 此外,相应地保护环境。