摘要:
A method for the recovery or separation of sulfur oxyfluorides from gas mixtures, in which the gas mixture passes through at least one adsorption stage or membrane stage containing or consisting of zeolites with a modulus >10. The sulfur oxyfluorides fixed to the adsorbent may be made available for use after desorption. The sulfur oxyfluorides enriched through the membrane can be re-used directly.
摘要:
Gas mixtures of SF6 and N2, which have been used, for example, as an insulating filler gas for underground cables, for insulating-gas window panes or as a filler gas for car tires and SF6/air mixtures which have been used as a protective gas when casting magnesium can be separated if they are contacted with hydrophobic zeolites of a certain pore size as selective adsorption agent for sulfur hexafluoride. For a relatively high SF6 concentration, the mixture is preferably first subjected to a membrane separation process and the permeate is contacted with the adsorption agent. The invention also relates to an apparatus for carrying out the process. The process may also be used for separating SF6 from exhaust gases.
摘要:
Gas mixtures of SF6 and N2 which have been used as an insulating filler gas for underground cables can be separated by use of a membrane separation in order to recover the SF6.
摘要:
A method for separating gaseous mixtures from underground cables or gas-insulated circuits in which the gaseous mixtures, which contain partially fluorinated and/or perfluorinated hydrocarbons and inert gases, are brought into contact with hydrophobic zeolites in at least one adsorption step so that the fluorinated hydrocarbons are adsorbed.
摘要:
Mixtures of fluorine and inert gases like nitrogen and/or argon can be used for etching of semiconductors, solar panels and flat panels (TFTs and LCDs), and for cleaning of semiconductor surfaces and plasma chambers. Preferably, fluorine is comprised in an amount of 15 to 25 vol.-% in binary mixtures. The gas mixtures can be used as substitute or drop-in for respective mixtures comprising NF3 and permit a very flexible operation of plasma apparatus. For example, apparatus tuned for NF3/Ar mixtures can be operated without further tuning using fluorine and argon, optionally together with nitrogen. The fluorine content is preferably in the range of 1 to 5 vol.-%, if ternary mixtures of fluorine, nitrogen and argon are used.
摘要:
The invention relates to an abrasive means with abrasive-active fillers. The abrasive means is comprised, in general, of a support, abrasive grit and of a binder system. In order to improve the abrasive action and the serviceable life of the abrasive means, the binding agent system contains synthetic alkali metal fluoroaluminates, and/or alkaline earth metal fluoroaluminates, in particular, alkali metal tetrafluoroaluminate, preferably potassium tetrafluoroaluminate, together with at least one additional abrasive-active filler.
摘要:
Elemental fluorine is used as etching agent for the manufacture of electronic devices, especially semiconductor devices, micro-electromechanical devices, thin film transistors, flat panel displays and solar panels, and as chamber cleaning agent mainly for plasma-enhanced chemical vapor deposition (PECVD) apparatus. For this purpose, fluorine often is produced on-site. The invention provides a process for the manufacture of electronic devices wherein fluorine is produced on site and is purified from HF by a low temperature treatment. A pressure of between 1.5 and 20 Bars absolute is especially advantageous.
摘要:
A method of avoiding generation of waste water while brazing components made of aluminium or an aluminium alloy using a flux, especially a flux composed of an aqueous suspension of potassium fluoroaluminate. Since used suspension is replaced with fresh suspension after a given period of time and the apparatus regularly have to be cleaned, waste water is produced which contains flux, e.g. potassium fluoroaluminate. In the past, such waste water has been discharged into the environment. It has now been discovered that such waste water can be recycled to the brazing process after separation of the flux. In this manner, the production of waste water can be largely avoided. Since surfactants are frequently used, and these are likewise recirculated, a corresponding saving in terms of surfactant is possible. Furthermore, the environment is protected correspondingly.
摘要:
A tube trailer containing a gas comprising from 35 to 92.5 vol % of molecular fluorine. A semiconductor manufacturing plant having a gas supply system wherein such tube trailer is connected to the gas supply system of the semiconductor manufacturing plant. A method for supplying a gas comprising using such tube trailer to transport gas from a gas manufacturing site to a user site.