Salt and photoresist composition comprising the same
    1.
    发明授权
    Salt and photoresist composition comprising the same 有权
    包含其的盐和光致抗蚀剂组合物

    公开(公告)号:US08431326B2

    公开(公告)日:2013-04-30

    申请号:US13251334

    申请日:2011-10-03

    摘要: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W represents a C3-C36 aliphatic ring in which one or more —CH2— can be replaced by —O—, —S—, —CO— or —SO2— and in which one or more hydrogen atoms can be replaced by a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C3-C12 alicyclic hydrocarbon group or a C6-C10 aromatic hydrocarbon group, Rf is independently in each occurrence a fluorine atom or a C1-C6 fluorinated alkyl group, n represents an integer of 1 to 10, and Z+ represents an organic counter ion.

    摘要翻译: 本发明提供由式(I)表示的盐:其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基,L1表示C1-C17二价饱和烃基,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,环W表示其中一个或多个-CH 2 - 可被-O - , - S-,-CO-或-SO 2 - 代替的C 3 -C 36脂族环,并且在 其中一个或多个氢原子可以被羟基,C 1 -C 12烷基,C 1 -C 12烷氧基,C 3 -C 12脂环族烃基或C 6 -C 10芳族烃基所取代,Rf在每次出现时是独立的 氟原子或C1-C6氟化烷基,n表示1〜10的整数,Z +表示有机抗衡离子。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    2.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号:US20130022923A1

    公开(公告)日:2013-01-24

    申请号:US13552278

    申请日:2012-07-18

    IPC分类号: G03F7/027 G03F7/20

    摘要: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, Q1 and Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.

    摘要翻译: 一种抗蚀剂组合物,其具有由式(I)表示的结构单元的树脂,树脂在碱性水溶液中不溶或难溶,但通过酸而不溶于碱性水溶液,不包括结构单元 由式(I)表示的酸产生剂和由式(II)表示的酸产生剂,其中R1,A1,R2,Q1和Q2,L1,环W,Rf1和Rf2,n和Z +在说明书中定义。

    RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME
    3.
    发明申请
    RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
    树脂和光学组合物包括它们

    公开(公告)号:US20120122034A1

    公开(公告)日:2012-05-17

    申请号:US13290618

    申请日:2011-11-07

    摘要: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

    摘要翻译: 本发明提供一种树脂,其包含由式(aa)表示的结构单元:其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团,X 2表示-O-或-N(R c) - ,R c表示 氢原子或C1-C6烷基,当X2为-O-时,Z1为* -X1-,* -X3-CO-O-X1-,* -X3-CO-N(Rc)-X1-, * -X3-O-CO-X1-或* -X3-N(Rc)-CO-X1-,当X2为-N(Rc)时,Z1表示* -X1-,* -X1-O-X3- ,* -X1-CO-,* -X1-X4-CO-X3-,* -X1-CO-X4-X3-,* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-,X1和X3各自独立地表示C1-C6二价脂族烃基,X4表示-O-或-N(Rc) - ,*表示与X2的结合位置,R1表示C1-C6烷基 具有一个或多个卤素原子的基团,氢原子或卤素原子。

    Salt and photoresist composition containing the same
    4.
    发明授权
    Salt and photoresist composition containing the same 有权
    含有其的盐和光致抗蚀剂组合物

    公开(公告)号:US09346750B2

    公开(公告)日:2016-05-24

    申请号:US12947349

    申请日:2010-11-16

    摘要: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

    摘要翻译: 由式(X)表示的盐:其中Q1和Q2各自独立地表示氟原子等,L1和L2各自独立地表示C1-C17二价饱和烃基,环W1表示C3-C36饱和烃环,R2 每次出现羟基等,s表示0〜2的整数,Z +表示有机抗衡离子,W10表示由式(X-1)表示的基团:其中,环W2表示C4-C36 饱和烃环,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替,R3是 在每次出现时独立地为C1-C6烷基等,t表示0〜2的整数,或式(X-2)表示的基团:其中,环W3表示C3-C36饱和烃环,R4表示 在每次出现时都独立地是羟基等,R5各自独立地出现 含有C 1 -C 6烷基等,v表示1〜3的整数,w表示0〜2的整数。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    5.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号:US20130022916A1

    公开(公告)日:2013-01-24

    申请号:US13551724

    申请日:2012-07-18

    IPC分类号: G03F7/027 G03F7/20

    摘要: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.

    摘要翻译: 一种抗蚀剂组合物,其具有由式(I)表示的结构单元的树脂,树脂在碱性水溶液中不溶或难溶,但通过酸而不溶于碱性水溶液,不包括结构单元 由式(I)表示的酸产生剂和由式(II)表示的酸产生剂,其中R1,A1,A13,A14,X12,Q1,Q2,L1,环W,Rf1和Rf2,n和Z +定义在 规格。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    7.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20110117495A1

    公开(公告)日:2011-05-19

    申请号:US12947349

    申请日:2010-11-16

    摘要: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

    摘要翻译: 由式(X)表示的盐:其中Q1和Q2各自独立地表示氟原子等,L1和L2各自独立地表示C1-C17二价饱和烃基,环W1表示C3-C36饱和烃环,R2 每次出现羟基等,s表示0〜2的整数,Z +表示有机抗衡离子,W10表示由式(X-1)表示的基团:其中,环W2表示C4-C36 饱和烃环,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替,R3是 在每次出现时独立地为C1-C6烷基等,t表示0〜2的整数,或式(X-2)表示的基团:其中,环W3表示C3-C36饱和烃环,R4表示 在每次出现时都独立地是羟基等,R5各自独立地出现 含有C 1 -C 6烷基等,v表示1〜3的整数,w表示0〜2的整数。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    8.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号:US20110117494A1

    公开(公告)日:2011-05-19

    申请号:US12946886

    申请日:2010-11-16

    摘要: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C3-C36 saturated hydrocarbon ring, R5 is independently in each occurrence a C1-C6 alkyl group or a C1-C6 alkoxy group, w represents an integer of 0 to 2, v represents 1 or 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C3-C36 saturated hydrocarbon ring, R1 represents a C1-C12 hydrocarbon group, R2 is independently in each occurrence a C1-C6 alkyl group or a C1-C6 alkoxy group, and represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C4-C36 lactone ring, R3 is independently in each occurrence a C1-C6 alkyl group, a C1-C6 alkoxy group or a C2-C7 alkoxycarbonyl group and t represents an integer of 0 to 2.

    摘要翻译: 由式(X)表示的盐:其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基,L1和L2各自表示C1-C17二价饱和烃基,其中一个或多个-CH 2 - 可以被-O-或-CO-代替,环W1表示C3-C36饱和烃环,R5各自独立地为C1-C6烷基或C1-C6烷氧基,w表示0〜 2,v表示1或2,Z +表示有机抗衡离子,W10表示由式(X-1)表示的基团:其中,环W2表示C3-C36饱和烃环,R1表示C1-C12烃基 R2各自独立地为C1-C6烷基或C1-C6烷氧基,代表0-2的整数,或由式(X-2)表示的基团:其中,环W3表示C4- C36内酯环,R3各自独立地为C1-C6烷基,C1-C6烷氧基或C2-C7 烷氧基羰基,t表示0〜2的整数。

    Resin and photoresist composition comprising the same
    9.
    发明授权
    Resin and photoresist composition comprising the same 有权
    树脂和包含其的光致抗蚀剂组合物

    公开(公告)号:US09360754B2

    公开(公告)日:2016-06-07

    申请号:US13290618

    申请日:2011-11-07

    摘要: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

    摘要翻译: 本发明提供一种树脂,其包含由式(aa)表示的结构单元:其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团,X 2表示-O-或-N(R c) - ,R c表示 氢原子或C1-C6烷基,当X2为-O-时,Z1为* -X1-,* -X3-CO-O-X1-,* -X3-CO-N(Rc)-X1-, * -X3-O-CO-X1-或* -X3-N(Rc)-CO-X1-,当X2为-N(Rc)时,Z1表示* -X1-,* -X1-O-X3- ,* -X1-CO-,* -X1-X4-CO-X3-,* -X1-CO-X4-X3-,* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-,X1和X3各自独立地表示C1-C6二价脂族烃基,X4表示-O-或-N(Rc) - ,*表示与X2的结合位置,R1表示C1-C6烷基 具有一个或多个卤素原子的基团,氢原子或卤素原子。

    Resist composition and method for producing resist pattern
    10.
    发明授权
    Resist composition and method for producing resist pattern 有权
    抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号:US08709699B2

    公开(公告)日:2014-04-29

    申请号:US13551724

    申请日:2012-07-18

    摘要: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.

    摘要翻译: 一种抗蚀剂组合物,其具有由式(I)表示的结构单元的树脂,树脂在碱性水溶液中不溶或难溶,但通过酸而不溶于碱性水溶液,不包括结构单元 由式(I)表示的酸产生剂和由式(II)表示的酸产生剂,其中R1,A1,A13,A14,X12,Q1,Q2,L1,环W,Rf1和Rf2,n和Z +定义在 规格。