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公开(公告)号：US08431326B2
公开(公告)日：2013-04-30
申请号：US13251334
申请日：2011-10-03
IPC分类号： G03F7/004 , G03F7/30 , C07C309/65 , C07C309/71 , C07D321/10 , C07D321/12
CPC分类号： C07D321/10 , C07D321/12 , C07D327/06 , C07D327/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W represents a C3-C36 aliphatic ring in which one or more —CH2— can be replaced by —O—, —S—, —CO— or —SO2— and in which one or more hydrogen atoms can be replaced by a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C3-C12 alicyclic hydrocarbon group or a C6-C10 aromatic hydrocarbon group, Rf is independently in each occurrence a fluorine atom or a C1-C6 fluorinated alkyl group, n represents an integer of 1 to 10, and Z+ represents an organic counter ion.
摘要翻译： 本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W表示其中一个或多个-CH 2 - 可被-O - ， - S-，-CO-或-SO 2 - 代替的C 3 -C 36脂族环，并且在 其中一个或多个氢原子可以被羟基，C 1 -C 12烷基，C 1 -C 12烷氧基，C 3 -C 12脂环族烃基或C 6 -C 10芳族烃基所取代，Rf在每次出现时是独立的 氟原子或C1-C6氟化烷基，n表示1〜10的整数，Z +表示有机抗衡离子。
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公开(公告)号：US08709699B2
公开(公告)日：2014-04-29
申请号：US13551724
申请日：2012-07-18
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.
摘要翻译： 一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元 由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W，Rf1和Rf2，n和Z +定义在 规格。
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公开(公告)号：US08652754B2
公开(公告)日：2014-02-18
申请号：US13552278
申请日：2012-07-18
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, Q1 and Q2, L1, ring W, Rf1 and Rf2, n and Z+are defined in the specification.
摘要翻译： 一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元 由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，R2，Q1和Q2，L1，环W，Rf1和Rf2，n和Z +在说明书中定义。
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公开(公告)号：US09346750B2
公开(公告)日：2016-05-24
申请号：US12947349
申请日：2010-11-16
IPC分类号： C07C309/19 , C07C309/17 , C07C381/12 , C07D307/33 , C07D307/93 , C07D327/06 , C07D333/08 , G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74 , C07D307/33 , C07D307/93 , C07D327/06 , C07D333/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译： 由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子等，L1和L2各自独立地表示C1-C17二价饱和烃基，环W1表示C3-C36饱和烃环，R2 每次出现羟基等，s表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示的基团：其中，环W2表示C4-C36 饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替，R3是 在每次出现时独立地为C1-C6烷基等，t表示0〜2的整数，或式（X-2）表示的基团：其中，环W3表示C3-C36饱和烃环，R4表示 在每次出现时都独立地是羟基等，R5各自独立地出现 含有C 1 -C 6烷基等，v表示1〜3的整数，w表示0〜2的整数。
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公开(公告)号：US08481242B2
公开(公告)日：2013-07-09
申请号：US12946886
申请日：2010-11-16
IPC分类号： G03F7/00 , G03C1/00 , C07D407/12 , C07D333/16 , C07C69/74 , C07C229/00
CPC分类号： C07D333/46 , C07C25/18 , C07C309/12 , C07C309/17 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D307/33 , C07D307/93 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2, L1 and L2, ring W1, R5, w, v, Z+ and W10 are defined in the specification.
摘要翻译： 由式（X）表示的盐：其中Q1和Q2，L1和L2，环W1，R5，w，v，Z +和W10在说明书中定义。
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公开(公告)号：US09360754B2
公开(公告)日：2016-06-07
申请号：US13290618
申请日：2011-11-07
申请人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
发明人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
CPC分类号： G03F7/0397 , C07D327/04 , C08F20/58 , C08F28/06 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
摘要翻译： 本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中T1表示任选具有一个或多个取代基的C 4 -C 34磺内酯环基团，X 2表示-O-或-N（R c） - ，R c表示 氢原子或C1-C6烷基，当X2为-O-时，Z1为* -X1-，* -X3-CO-O-X1-，* -X3-CO-N（Rc）-X1-， * -X3-O-CO-X1-或* -X3-N（Rc）-CO-X1-，当X2为-N（Rc）时，Z1表示* -X1-，* -X1-O-X3- ，* -X1-CO-，* -X1-X4-CO-X3-，* -X1-CO-X4-X3-，* -X1-X4-CO-X3-CO-或* -X1-CO-X4 -X3-CO-，X1和X3各自独立地表示C1-C6二价脂族烃基，X4表示-O-或-N（Rc） - ，*表示与X2的结合位置，R1表示C1-C6烷基 具有一个或多个卤素原子的基团，氢原子或卤素原子。
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7.发明授权Chemically amplified photoresist composition and method for forming resist pattern 有权化学扩增的光致抗蚀剂组合物和形成抗蚀剂图案的方法公开(公告)号：US08916330B2
公开(公告)日：2014-12-23
申请号：US12821850
申请日：2010-06-23
申请人： Koji Ichikawa , Takashi Hiraoka
发明人： Koji Ichikawa , Takashi Hiraoka
IPC分类号： G03F7/004 , G03F7/40 , C07C321/00 , C07D407/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/20 , C08F2220/303 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： The present invention provides a resist composition giving a resist pattern excellent in CD uniformity and focus margin. A chemically amplified photoresist composition comprises a resin (A) and an acid generator (B), and the resin (A) contains, as a part or an entirety thereof, a copolymer (A1) which is obtained by polymerizing at least: a (meth)acrylic monomer (a1) having C5-20 alicyclic hydrocarbon group which becomes soluble in an aqueous alkali solution by the action of an acid; a (meth)acrylic monomer (a2) having a hydroxy group-containing adamantyl group; and a (meth)acrylic monomer (a3) having a lactone ring, and the copolymer (A1) has a weight-average molecular weight of 2500 or more and 5000 or less, and a content of the copolymer (A1) is not less than 50 parts by mass with respect to 100 parts by mass of the resin (A).
摘要翻译： 本发明提供了具有优异的CD均匀性和聚焦余量的抗蚀剂图案的抗蚀剂组合物。 化学放大型光致抗蚀剂组合物包含树脂（A）和酸产生剂（B），树脂（A）的一部分或全部含有共聚物（A1），其通过至少聚合得到：（ 甲基）丙烯酸单体（a1），其具有通过酸的作用变得可溶于碱性水溶液的C5-20脂环族烃基; 具有含羟基金刚烷基的（甲基）丙烯酸系单体（a2） 和具有内酯环的（甲基）丙烯酸系单体（a3），共聚物（A1）的重均分子量为2500以上且5000以下，共聚物（A1）的含量为 相对于100质量份树脂（A）为50质量份。
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公开(公告)号：US09671693B2
公开(公告)日：2017-06-06
申请号：US13325910
申请日：2011-12-14
申请人： Koji Ichikawa , Takashi Hiraoka , Shingo Fujita
发明人： Koji Ichikawa , Takashi Hiraoka , Shingo Fujita
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： A resist composition contains; (A1) a resin having a structural unit represented by the formula (aa) and at least one structural unit selected from the group consisting of a structural unit represented by the formula (a1-1) and a structural unit represented by the formula (a1-2); (A2) a resin which does not have the structural unit represented by the formula (aa) and which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid; and (B) an acid generator, wherein Raa1, Aaa1, Raa2, La1, La2, Ra4, Ra5, Ra6, Ra7, m1, n1 and n1′ are defined in the specification.
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公开(公告)号：US20110318688A1
公开(公告)日：2011-12-29
申请号：US13170990
申请日：2011-06-28
申请人： Takashi HIRAOKA , Hiromu Sakamoto , Koji Ichikawa
发明人： Takashi HIRAOKA , Hiromu Sakamoto , Koji Ichikawa
IPC分类号： G03F7/004 , C07D453/02 , G03F7/20 , C07D411/02 , C07D233/14 , C07D207/12 , C07D211/44 , C07D327/08
CPC分类号： G03F7/0045 , C07D207/12 , C07D211/46 , C07D233/60 , C07D307/77 , C07D327/08 , G03F7/0046 , G03F7/0397
摘要： The present invention is a salt represented by the formula (I) wherein R1 and R2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; L1 represents a C1 to C17 divalent saturated hydrocarbon group, a —CH2— contained in the saturated hydrocarbon group may be replaced by —O— or —CO—; ring W1 represents a C2 to C36 heterocycle; R3 represents a hydrogen atom or a C1 to C12 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; R4 in each occurrence independently represent a C1 to C6 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; m represents an integer of 0 to 6; and Z+ represents an organic cation.
摘要翻译： 本发明是由式（I）表示的盐，其中R 1和R 2各自独立地表示氟原子或C 1至C 6全氟烷基; L1表示C1〜C17二价饱和烃基，饱和烃基中所含的-CH 2可以被-O-或-CO-代替; 环W1表示C2〜C36杂环; R3表示氢原子或C1〜C12烃基，烃基中所含的-CH2-可以被-O-或-CO-代替; R4各自独立地表示C1〜C6烃基，烃基中所含的-CH 2可以被-O-或-CO-代替; m表示0〜6的整数， Z +表示有机阳离子。
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公开(公告)号：US20110065041A1
公开(公告)日：2011-03-17
申请号：US12881942
申请日：2010-09-14
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046
摘要： The present invention provides a photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 represents a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond etc., and B1 represents a group represented by the formula (1a): wherein R3, R4 and R5 each independently represents a C1-C16 aliphatic hydrocarbon group and R4 and R5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R4 and R5 are bonded, a C4-C20 saturated cyclic group having a lactone structure or a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group.
摘要翻译： 本发明提供一种光致抗蚀剂组合物，其包含酸产生剂和树脂，其包含衍生自由式（I）表示的单体的结构单元：其中R 1表示氢原子等，R 2表示氢原子或C 1 -C 4烷基 基团，A1表示单键等，B1表示由式（1a）表示的基团：其中R3，R4和R5各自独立地表示C1-C16脂族烃基，R4和R5可以彼此键合形成 C 3 -C 18环与R 4和R 5键合的碳原子，具有内酯结构的C 4 -C 20饱和环状基团或具有至少一个羟基的C 5 -C 20饱和环状烃基。
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