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    Silicon-containing resist underlayer film forming composition having fluorine-based additive
    1.
    发明授权
    Silicon-containing resist underlayer film forming composition having fluorine-based additive 有权
    含氟抗蚀剂下层膜形成用组合物含氟类添加剂

    公开(公告)号：US08877425B2

    公开(公告)日：2014-11-04

    申请号：US13880787

    申请日：2011-10-20

    申请人： Yuta Kanno ,  Makoto Nakajima ,  Tomoko Misaki ,  Motonobu Matsuyama ,  Masayuki Haraguchi

    发明人： Yuta Kanno ,  Makoto Nakajima ,  Tomoko Misaki ,  Motonobu Matsuyama ,  Masayuki Haraguchi

    IPC分类号： G03F7/09 ,  G03F7/20 ,  G03F7/30 ,  G03F7/36 ,  G03F7/40

    CPC分类号： G03F7/091 ,  C08G77/14 ,  C08G77/26 ,  C09D183/06 ,  G03F7/0752 ,  G03F7/11 ,  H01L21/0271 ,  H01L21/3081 ,  C08L33/16 ,  C09D183/08

    摘要： A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds.

    摘要翻译： 用于光刻的抗蚀剂下层膜形成组合物包括：作为组分（I），通过在其分子中聚合具有两个或更多个可自由基聚合的双键的单体A获得的含氟高支化聚合物，具有氟烷基的单体B 和分子中的至少一个自由基聚合性双键，以及分子中具有含硅原子的有机基团和至少一个自由基聚合性双键的单体D，在聚合引发剂C的存在下， 相对于单体A，单体B和单体D的总摩尔数为5摩尔％以上且200摩尔％以下。 作为组分（II），可水解硅烷化合物，其水解产物，其水解缩合产物或这些化合物的组合的含硅化合物。

    HIGHLY BRANCHED LIPOPHILIC POLYMER, AND PHOTOPOLYMERIZABLE COMPOSITION CONTAINING THE SAME
    3.
    发明申请
    HIGHLY BRANCHED LIPOPHILIC POLYMER, AND PHOTOPOLYMERIZABLE COMPOSITION CONTAINING THE SAME 有权
    高分子量的锂聚合物和含有它的光聚合组合物

    公开(公告)号：US20140088216A1

    公开(公告)日：2014-03-27

    申请号：US14005633

    申请日：2012-03-16

    申请人： Motonobu Matsuyama ,  Masayuki Haraguchi ,  Masaaki Ozawa

    发明人： Motonobu Matsuyama ,  Masayuki Haraguchi ,  Masaaki Ozawa

    IPC分类号： C08L33/10 ,  C09D133/06 ,  C08F22/10

    CPC分类号： C08L33/10 ,  C08F2/50 ,  C08F4/04 ,  C08F22/10 ,  C08F220/18 ,  C08F222/1006 ,  C08F230/08 ,  C08F257/00 ,  C08F265/06 ,  C08F267/06 ,  C08F2220/1833 ,  C09D133/06

    摘要： There is provided a highly branched lipophilic polymer that is excellent in blending and dispersing properties in a matrix resin, and is possible to provide surface modification properties such as excellent lipophilicity (anti-fingerprint property) and the like to a coating that is obtained from the resin composition while the intrinsic transparency of the resin is not impaired; and a photopolymeizable composition comprising the highly branched lipophilic polymer. A highly branched lipophilic polymer obtained by polymerizing a monomer A containing two or more radically polymerizable double bonds per molecule and a monomer B containing a C6-30 alkyl group or a C3-30 alicyclic group and at least one radically polymerizable double bond per molecule in the presence of 5 to 200 mol % of a polymerization initiator C relative to the number of moles of the monomer A. A photopolymeizable composition comprising the highly branched lipophilic polymer.

    摘要翻译： 提供了一种在基质树脂中具有优异的共混和分散性能的高度支化的亲脂性聚合物，并且可以提供表面改性性质，例如从亲水性聚合物获得的涂料具有优异的亲油性（抗指纹性）等 树脂组合物，而树脂的固有透明度不受损害; 和包含高支化亲脂性聚合物的光聚合组合物。 通过聚合每分子含有两个或更多个可自由基聚合的双键的单体A和每分子含有C 6-30烷基或C 3-30脂环族基团和至少一个可自由基聚合的双键的单体B而获得的高度支化的亲脂性聚合物 相对于单体A的摩尔数，存在5〜200摩尔％的聚合引发剂C.含有高支化亲脂性聚合物的光聚合性组合物。

    CURABLE COMPOSITION FOR COATING CONTAINING FLUORINE-CONTAINING HIGHLY BRANCHED POLYMER
    4.
    发明申请
    CURABLE COMPOSITION FOR COATING CONTAINING FLUORINE-CONTAINING HIGHLY BRANCHED POLYMER 审中-公开
    含有含氟荧光高分散聚合物的涂料的可固化组合物

    公开(公告)号：US20130302598A1

    公开(公告)日：2013-11-14

    申请号：US13990216

    申请日：2011-12-01

    申请人： Masayuki Haraguchi ,  Motonobu Matsuyama ,  Tomoko Misaki ,  Masaaki Ozawa

    发明人： Masayuki Haraguchi ,  Motonobu Matsuyama ,  Tomoko Misaki ,  Masaaki Ozawa

    IPC分类号： C09D133/14

    CPC分类号： C09D133/14 ,  C08G77/20 ,  C08G77/24 ,  C09D4/06 ,  C09D183/04 ,  Y10T428/265

    摘要： A curable composition for coating comprising: (a) a fluorine-containing highly branched polymer obtained by polymerization of a monomer A having two or more radical polymerizable double bonds in a molecule of the monomer A and a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in a molecule of the monomer B, in the presence of a polymerization initiator C at an amount of 5% by mole to 200% by mole per the number of moles of the monomer A, (b) at least one surface modifier selected from the group consisting of a perfluoropolyether compound and a silicone compound, (c) an active energy ray-curable polyfunctional monomer, and (d) a polymerization initiator that generates radicals by irradiation with an active energy ray; a cured film obtained from the composition; and a hard coating film obtained by use of the composition.

    摘要翻译： 一种涂料用可固化组合物，其包含：（a）通过在单体A的分子中聚合具有两个或更多个可自由基聚合的双键的单体A和具有氟烷基的单体B和至少 单体B分子中的一个可自由基聚合的双键，在聚合引发剂C的存在下，单体A的摩尔数为5摩尔％至200摩尔％，（b）至少一种 选自全氟聚醚化合物和硅氧烷化合物的表面改性剂，（c）活性能量射线固化型多官能单体，和（d）通过用活性能量射线照射产生自由基的聚合引发剂; 由该组合物得到的固化膜; 和使用该组合物得到的硬质涂膜。

    Highly branched lipophilic polymer, and photopolymerizable composition containing the same
    5.
    发明授权
    Highly branched lipophilic polymer, and photopolymerizable composition containing the same 有权
    高度支化的亲脂性聚合物和含有它们的光聚合组合物

    公开(公告)号：US09334400B2

    公开(公告)日：2016-05-10

    申请号：US14005633

    申请日：2012-03-16

    申请人： Motonobu Matsuyama ,  Masayuki Haraguchi ,  Masaaki Ozawa

    发明人： Motonobu Matsuyama ,  Masayuki Haraguchi ,  Masaaki Ozawa

    IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C08L33/10 ,  C08F4/04 ,  C08F220/18 ,  C08F22/10 ,  C09D133/06 ,  C08F222/10 ,  C08F230/08

    CPC分类号： C08L33/10 ,  C08F2/50 ,  C08F4/04 ,  C08F22/10 ,  C08F220/18 ,  C08F222/1006 ,  C08F230/08 ,  C08F257/00 ,  C08F265/06 ,  C08F267/06 ,  C08F2220/1833 ,  C09D133/06

    摘要： There is provided a highly branched lipophilic polymer that is excellent in blending and dispersing properties in a matrix resin, and is possible to provide surface modification properties such as excellent lipophilicity (anti-fingerprint property) and the like to a coating that is obtained from the resin composition while the intrinsic transparency of the resin is not impaired; and a photopolymeizable composition comprising the highly branched lipophilic polymer. A highly branched lipophilic polymer obtained by polymerizing a monomer A containing two or more radically polymerizable double bonds per molecule and a monomer B containing a C6-30 alkyl group or a C3-30 alicyclic group and at least one radically polymerizable double bond per molecule in the presence of 5 to 200 mol % of a polymerization initiator C relative to the number of moles of the monomer A. A photopolymeizable composition comprising the highly branched lipophilic polymer.

    摘要翻译： 提供了一种在基质树脂中具有优异的共混和分散性能的高度支化的亲脂性聚合物，并且可以提供表面改性性质，例如从亲水性聚合物获得的涂料具有优异的亲油性（抗指纹性）等 树脂组合物，而树脂的固有透明度不受损害; 和包含高支化亲脂性聚合物的光聚合组合物。 通过聚合每分子含有两个或更多个可自由基聚合的双键的单体A和每分子含有C 6-30烷基或C 3-30脂环族基团和至少一个可自由基聚合的双键的单体B而获得的高度支化的亲脂性聚合物 相对于单体A的摩尔数，存在5〜200摩尔％的聚合引发剂C.含有高支化亲脂性聚合物的光聚合性组合物。

    SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING FLUORINE-BASED ADDITIVE
    6.
    发明申请
    SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING FLUORINE-BASED ADDITIVE 有权
    含氟基膜形成组合物含氟基添加剂

    公开(公告)号：US20130224957A1

    公开(公告)日：2013-08-29

    申请号：US13880787

    申请日：2011-10-20

    申请人： Yuta Kanno ,  Makoto Nakajima ,  Tomoko Misaki ,  Motonobu Matsuyama ,  Masayuki Haraguchi

    发明人： Yuta Kanno ,  Makoto Nakajima ,  Tomoko Misaki ,  Motonobu Matsuyama ,  Masayuki Haraguchi

    IPC分类号： G03F7/09 ,  H01L21/308 ,  H01L21/027

    CPC分类号： G03F7/091 ,  C08G77/14 ,  C08G77/26 ,  C09D183/06 ,  G03F7/0752 ,  G03F7/11 ,  H01L21/0271 ,  H01L21/3081 ,  C08L33/16 ,  C09D183/08

    摘要： A resist underlayer film forming composition for lithography includes: as a component (I), a fluorine-containing highly branched polymer obtained by polymerizing a monomer A having two or more radical polymerizable double bonds in the molecule thereof, a monomer B having a fluoroalkyl group and at least one radical polymerizable double bond in the molecule thereof, and a monomer D having a silicon atom-containing organic group and at least one radical polymerizable double bond in the molecule thereof, in the presence of a polymerization initiator C in a content of 5% by mole or more and 200% by mole or less, based on the total mole of the monomer A, the monomer B, and the monomer D; and as a component (II), a hydrolyzable silane compound, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a silicon-containing compound that is a combination of these compounds.

    摘要翻译： 用于光刻的抗蚀剂下层膜形成组合物包括：作为组分（I），通过在其分子中聚合具有两个或更多个可自由基聚合的双键的单体A获得的含氟高支化聚合物，具有氟烷基的单体B 和分子中的至少一个自由基聚合性双键，以及分子中具有含硅原子的有机基团和至少一个自由基聚合性双键的单体D，在聚合引发剂C的存在下， 相对于单体A，单体B和单体D的总摩尔数为5摩尔％以上且200摩尔％以下。 作为组分（II），可水解硅烷化合物，其水解产物，其水解缩合产物或这些化合物的组合的含硅化合物。