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    Particle filter for partially enclosed microelectromechanical systems
    2.
    发明授权
    Particle filter for partially enclosed microelectromechanical systems 失效

    公开(公告)号：US06703675B1

    公开(公告)日：2004-03-09

    申请号：US10224179

    申请日：2002-08-20

    Applicant: Murray Steven Rodgers

    Inventor： Murray Steven Rodgers

    IPC: H01L2982

    CPC classification number: B81B7/0012

    Abstract: A particle filter for a partially enclosed microelectromechanical systems that include a substrate material having at least one micro-device formed thereon. The particle filter includes a first structural layer forming a filter bottom and a second structural layer forming a filter wall. The filter bottom and filter wall are interconnected by at least one support feature to define a particle trap between the filter wall and filter bottom. The particle trap is a gap formed by mating, but non-interconnected portions of the filter wall and filter bottom that operates to trap and prevent particles from passing beyond the filter bottom into the microelectromechanical system.

    Non-linear actuator suspension for microelectromechanical systems
    4.
    发明授权
    Non-linear actuator suspension for microelectromechanical systems 有权
    用于微机电系统的非线性致动器悬架

    公开(公告)号：US06894420B2

    公开(公告)日：2005-05-17

    申请号：US10099893

    申请日：2002-03-14

    Applicant: Murray Steven Rodgers

    Inventor： Murray Steven Rodgers

    IPC: H01L27/14 ,  H02N1/00

    CPC classification number: H02N1/008

    Abstract: The present invention is generally directed to a method and assembly for supporting an actuation apparatus (e.g. a movable electrostatic comb) of a microelectromechanical (MEM) system. A suspension assembly of the present invention generally resists actuation forces inherent to electrostatically controlled MEM systems by utilizing an opposingly-directed non-linear tensile force. This can be accomplished by utilizing a suspension assembly of the invention including a longitudinal center beam and a plurality of first and second lateral beams extending out from lateral sides of the center beam. When the center beam of the suspension assembly is drawn in a first direction due to the actuation force(s), either or both of the plurality of first lateral beams and the plurality of second lateral beams are stretched to exert a non-linear tensile force having a force vector component generally oriented in a second direction generally opposite the first direction.

    Abstract translation: 本发明一般涉及用于支撑微机电（MEM）系统的致动装置（例如，可动静电梳）的方法和组件。 本发明的悬架组件通常利用相对定向的非线性拉力来抵抗静电控制的MEM系统固有的致动力。 这可以通过利用本发明的悬架组件来实现，该悬架组件包括纵向中心梁和从中心梁的横向侧面延伸出的多个第一和第二横梁。 当由于致动力使悬架组件的中心梁沿第一方向拉动时，多个第一横梁和多个第二横梁中的任一个或两个被拉伸以发挥非线性拉力 具有通常沿与第一方向相反的第二方向定向的力矢量分量。

    Self-shadowing MEM structures
    6.
    发明授权
    Self-shadowing MEM structures 失效
    自遮蔽MEM结构

    公开(公告)号：US06824278B2

    公开(公告)日：2004-11-30

    申请号：US10098266

    申请日：2002-03-15

    Applicant: Murray Steven Rodgers ,  Samuel Lee Miller

    Inventor： Murray Steven Rodgers ,  Samuel Lee Miller

    IPC: G02B508

    CPC classification number: G02B6/357 ,  B81B7/0006 ,  B81B2201/042 ,  B81C1/00833 ,  G02B6/3518

    Abstract: Self-shadowed microelectromechanical structures such as self-shadowed bond pads, fuses and compliant members and a method of fabricating self-shadowing microelectromechanical structures that anticipate and accommodate blanket metalization process steps are disclosed. In one embodiment, a self-shadowed bond pad (10) configured for shadowing an exposed end (44A) of a shielded interconnect line (44) connected to the bond pad (10) from undesired metalization during a metalization fabrication process step includes electrically connected overlaying first, second and third bond pad areas (42, 72, 92) patterned from respective first, second and third layers (40, 70, 90) of material deposited on a substrate (20). The exposed end (44A) of the interconnect line (44) abuts an edge of the first bond pad area (42). The third bond pad area (92) includes at least one tab portion (94) extending laterally from an edge of the third bond pad area (92) to shadow an area on the substrate (20) including the exposed end (44A) of the interconnect line (44) abutting the edge of the first bond pad area (42).

    Abstract translation: 公开了自遮蔽微电子机械结构，例如自遮盖接合焊盘，熔断器和柔性元件，以及制造预期并适应覆盖金属化工艺步骤的自阴影微机电结构的方法。 在一个实施例中，被配置用于遮蔽在金属化制造工艺步骤期间连接到接合焊盘（10）的屏蔽互连线（44）的暴露端（44A）与不期望的金属化的自阴影接合焊盘（10A），电连接 覆盖从沉积在衬底（20）上的材料的相应的第一，第二和第三层（40,70,90）构图的第一，第二和第三接合焊盘区域（42,72,92）。 互连线（44）的露出端（44A）邻接第一接合焊盘区域（42）的边缘。 第三接合焊盘区域（92）包括从第三接合焊盘区域（92）的边缘横向延伸的至少一个突片部分（94），以遮蔽包括基板（20）的暴露端部（44A）的区域 互连线（44）邻接第一接合焊盘区域（42）的边缘。

    Apparatus to position a microelectromechanical platform
    7.
    发明授权
    Apparatus to position a microelectromechanical platform 失效
    用于定位微机电平台的装置

    公开(公告)号：US06624548B1

    公开(公告)日：2003-09-23

    申请号：US09964922

    申请日：2001-09-26

    Applicant: Samuel Lee Miller ,  Murray Steven Rodgers

    Inventor： Samuel Lee Miller ,  Murray Steven Rodgers

    IPC: H03H3732

    CPC classification number: H02N1/008

    Abstract: The present invention comprises a microelectromechanical positioner to achieve substantially translational positioning of a platform without rotational motion, thereby maintaining a constant angular orientation of the platform during movement. A linkage mechanism of the positioner can comprise parallelogram linkages to constrain the rotational motion of the platform. Such linkages further can comprise flexural hinges or other turning joints at the linkage pivots to eliminate the need for rubbing surfaces. A plurality of the linkage mechanisms can be used to enable translational motion of the platform with two degrees of freedom. A variety of means can be used to actuate the positioner. Independent actuation of the anchor links of the linkage mechanisms with rotary electrostatic actuators can be used to provide controlled translational movement of the platform.

    Abstract translation: 本发明包括微机电定位器，以实现平台的基本平移定位而无需旋转运动，从而在运动期间保持平台的恒定的角度定向。 定位器的连杆机构可以包括平行四边形连杆以约束平台的旋转运动。 这种连接件还可以包括在连接枢轴处的弯曲铰链或其他转动接头，以消除对摩擦表面的需要。 可以使用多个连杆机构来实现平台具有两个自由度的平移运动。 可以使用各种手段来驱动定位器。 连杆机构与旋转式静电执行机构的锚固连接件的独立驱动可用于提供平台受控的平移运动。

    Low voltage control of MEM actuators
    8.
    发明授权
    Low voltage control of MEM actuators 有权
    MEM执行器的低压控制

    公开(公告)号：US06621681B2

    公开(公告)日：2003-09-16

    申请号：US10012827

    申请日：2001-12-05

    Applicant: Murray Steven Rodgers ,  Samuel Lee Miller

    Inventor： Murray Steven Rodgers ,  Samuel Lee Miller

    IPC: H05F300

    CPC classification number: G02B26/0841

    Abstract: A low voltage method and system for controlling electrically activated microelectromechanical (MEM) actuators such as electrostatic comb actuators in reflective microstructure positioning systems are provided. In one embodiment, a low voltage control system (110) includes a single fixed DC voltage source (14) and a plurality of variable DC voltage sources (16). The fixed DC voltage source (14) is electrically connected to commonly connected first terminals (12a) of a plurality of MEM actuators (12) between the MEM actuators (12) and a reference potential (18). Each variable DC voltage source (16) is associated with a separate MEM actuator (12) and is electrically connected between the reference potential (18) and a second terminal (12b) of its associated MEM actuator (12). The fixed DC voltage source supplies a fixed DC voltage that is common to the MEM actuators (12). Each variable DC source (16) supplies a controllable DC voltage to its associated MEM actuator (12). The fixed and controllable voltages are selected to permit control of the variable DC voltage sources (16) using inexpensive control electronics.

    Abstract translation: 提供了用于控制电激活微机电（MEM）致动器的低电​​压方法和系统，例如反射微结构定位系统中的静电梳状致动器。 在一个实施例中，低压控制系统（110）包括单个固定DC电压源（14）和多个可变直流电压源（16）。 固定直流电压源（14）电连接到MEM致动器（12）和参考电位（18）之间的多个MEM致动器（12）的共同连接的第一端子（12a）。 每个可变直流电压源（16）与单独的MEM致动器（12）相关联，并且电连接在其相关的MEM致动器（12）的参考电位（18）和第二端子（12b）之间。 固定的DC电压源提供与MEM致动器（12）通用的固定DC电压。 每个可变直流电源（16）向其相关的MEM致动器（12）提供可控的直流电压。 选择固定和可控电压以允许使用廉价的控制电子装置来控制可变直流电压源（16）。

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