Vaccine for chikungunya virus infection
    1.
    发明授权
    Vaccine for chikungunya virus infection 有权
    基孔肯雅病毒感染疫苗

    公开(公告)号:US08865184B2

    公开(公告)日:2014-10-21

    申请号:US12439509

    申请日:2007-08-31

    摘要: The present invention relates to vaccine formulation capable of eliciting protective immune response against Chikungunya virus infection in humans and other mammalian hosts. The immunogenic formulation comprises purified inactivated Chikungunya virus in a stable formulation. Methods of propagation and purification of the virus are discussed. The inactivated virus formulation is non-infectious, immunogenic and elicits protective immune response in mammalian host. The immunogenic composition is formulated for in vivo administration to humans. The invention also discusses the strategy of developing a subunit vaccine using the recombinant viral proteins as antigens for immunization. The recombinant virus antigens that are potentially immunogenic can be used in diagnosing for the presence of the virus.

    摘要翻译: 本发明涉及能够在人和其他哺乳动物宿主中引起对基孔肯雅病毒感染的保护性免疫应答的疫苗制剂。 免疫原性制剂包含稳定制剂中纯化的灭活的基孔肯雅病毒。 讨论了病毒繁殖和纯化的方法。 灭活的病毒制剂是非传染性的,免疫原性的并且在哺乳动物宿主中引发保护性免疫应答。 免疫原性组合物被配制用于体内给予人。 本发明还讨论了使用重组病毒蛋白作为免疫的抗原开发亚单位疫苗的策略。 潜在免疫原性的重组病毒抗原可用于诊断病毒的存在。

    Yield and line width performance for liquid polymers and other materials

    公开(公告)号:US07625692B2

    公开(公告)日:2009-12-01

    申请号:US11595452

    申请日:2006-11-08

    IPC分类号: G03F7/30

    摘要: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.

    Yield and line width performance for liquid polymers and other materials
    4.
    发明授权
    Yield and line width performance for liquid polymers and other materials 有权
    液体聚合物和其他材料的产量和线宽性能

    公开(公告)号:US06248171B1

    公开(公告)日:2001-06-19

    申请号:US09221060

    申请日:1998-12-28

    IPC分类号: B05B700

    摘要: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.

    摘要翻译: 描述了用于提高液体聚合物和其它材料的产量和线宽性能的系统和方法。 通过降低pH的突然变化来最小化显影反应物的沉淀的方法包括:用显影剂流体的初始电荷在基底上显影至少一部分聚合物层; 然后用额外的显影剂流体冲洗聚合物,以便可控地最小化随后的pH的突然变化; 然后用另一种流体的电荷冲洗聚合物。 用于使要在基底上显影的聚合物层上的流体冲击力最小化的装置包括:喷嘴,包括:适于供应显影剂流体的显影剂歧管; 耦合到显影剂歧管的多个显影剂流体导管; 适于提供漂洗液的冲洗歧管; 以及耦合到显影剂歧管的多个冲洗流体导管。 显影剂歧管和冲洗歧管可以交错,以便与可实现的喷嘴的标称外部宽度相比,减小喷嘴的外部宽度,而不用与流体歧管和另一歧管交叉或交错流体歧管和另一歧管。 这些系统和方法提供了优点,包括通过减少的过程引起的缺陷和部分计数提高产量,以及改进的临界尺寸(CD)控制能力。

    Yield and line width performance for liquid polymers and other materials

    公开(公告)号:US07208262B2

    公开(公告)日:2007-04-24

    申请号:US11006876

    申请日:2004-12-07

    IPC分类号: G03F7/30

    摘要: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.

    Yield and line width performance for liquid polymers and other materials

    公开(公告)号:US20070059651A1

    公开(公告)日:2007-03-15

    申请号:US11595452

    申请日:2006-11-08

    IPC分类号: G03C5/00

    摘要: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.

    Yield and line width performance for liquid polymers and other materials
    7.
    发明申请
    Yield and line width performance for liquid polymers and other materials 有权
    液体聚合物和其他材料的产量和线宽性能

    公开(公告)号:US20050095368A1

    公开(公告)日:2005-05-05

    申请号:US11006876

    申请日:2004-12-07

    摘要: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.

    摘要翻译: 描述了用于提高液体聚合物和其它材料的产量和线宽性能的系统和方法。 通过降低pH的突然变化来最小化显影反应物的沉淀的方法包括:用显影剂流体的初始电荷在基底上显影至少一部分聚合物层; 然后用额外的显影剂流体冲洗聚合物,以便可控地最小化随后的pH的突然变化; 然后用另一种流体的电荷冲洗聚合物。 用于使要在基底上显影的聚合物层上的流体冲击力最小化的装置包括:喷嘴,包括:适于供应显影剂流体的显影剂歧管; 耦合到显影剂歧管的多个显影剂流体导管; 适于提供漂洗液的冲洗歧管; 以及耦合到显影剂歧管的多个冲洗流体导管。 显影剂歧管和冲洗歧管可以交错,以便与可实现的喷嘴的标称外部宽度相比,减小喷嘴的外部宽度,而不用与流体歧管和另一歧管交叉或交错流体歧管和另一歧管。 这些系统和方法提供了优点,包括通过减少的过程引起的缺陷和部分计数提高产量,以及改进的临界尺寸(CD)控制能力。

    Yield and line width performance for liquid polymers and other materials
    9.
    发明授权
    Yield and line width performance for liquid polymers and other materials 有权
    液体聚合物和其他材料的产量和线宽性能

    公开(公告)号:US07255975B2

    公开(公告)日:2007-08-14

    申请号:US10664095

    申请日:2003-09-16

    IPC分类号: G03F7/30

    摘要: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.

    摘要翻译: 描述了用于提高液体聚合物和其它材料的产量和线宽性能的系统和方法。 通过降低pH的突然变化来最小化显影反应物的沉淀的方法包括:用显影剂流体的初始电荷在基底上显影至少一部分聚合物层; 然后用额外的显影剂流体冲洗聚合物,以便可控地最小化随后的pH的突然变化; 然后用另一种流体的电荷冲洗聚合物。 用于使要在基底上显影的聚合物层上的流体冲击力最小化的装置包括:喷嘴,包括:适于供应显影剂流体的显影剂歧管; 耦合到显影剂歧管的多个显影剂流体导管; 适于提供漂洗液的冲洗歧管; 以及耦合到显影剂歧管的多个冲洗流体导管。 显影剂歧管和冲洗歧管可以交错,以便与可实现的喷嘴的标称外部宽度相比,减小喷嘴的外部宽度,而不用与流体歧管和另一歧管交叉或交错流体歧管和另一歧管。 这些系统和方法提供了优点,包括通过减少的过程引起的缺陷和部分计数提高产量,以及改进的临界尺寸(CD)控制能力。

    Yield and line width performance for liquid polymers and other materials

    公开(公告)号:US20070089671A1

    公开(公告)日:2007-04-26

    申请号:US11604130

    申请日:2006-11-22

    IPC分类号: B05B7/06

    摘要: Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.