公开(公告)号：US07990549B2

公开(公告)日：2011-08-02

申请号：US12592773

申请日：2009-12-02

Applicant: Phillip Walsh

Inventor： Phillip Walsh

IPC: G01B11/30

CPC classification number: G01N21/4788 ,  G01B11/24 ,  G01N21/211

Abstract: An optical metrology apparatus for measuring periodic structures using multiple incident azimuthal (phi) and polar (theta) incident angles is described. One embodiment provides the enhanced calculation speed for the special case of phi=90 incidence for 1-D (line and space) structures, which has the incident plane parallel to the grating lines, as opposed to the phi=0 classical mounting, which has incident plane perpendicular to the grating lines. The enhancement reduces the computation time of the phi=90 case to the same order as the corresponding phi=0 case, and in some cases the phi=90 case can be significantly faster. One advantageous configuration consists of two measurements for each sample structure, one perpendicular to the grating lines and one parallel. This provides additional information about the structure, equivalent to two simultaneous angles of incidence, without excessive increase in computation time. Alternately, in cases where the computation for phi=90 is faster than the corresponding phi=0 incidence, it may be advantageous to measure parallel to the grating lines only. In the case where two sets of incident angles are used, the incident light can be polarized to provide a total of four sets of data—Rs0, Rp0, Rs90, Rp90—for each incident polar angle, all from the same structure.

Abstract translation: 描述了使用多个入射方位角（phi）和极化（theta）入射角来测量周期结构的光学测量装置。 一个实施例提供了对于具有与光栅线平行的入射平面的1-D（线和空间）结构的phi = 90入射的特殊情况的增强的计算速度，与具有 垂直于光栅线的入射平面。 该增强将phi = 90情况的计算时间减少到与相应的phi = 0情况相同的顺序，并且在某些情况下，phi = 90的情况可以显着更快。 一个有利的配置包括对于每个样品结构的两个测量，一个垂直于光栅线和一个平行的测量结构。 这提供了关于结构的附加信息，相当于两个同时入射的入射角，而不会过多地增加计算时间。 或者，在phi = 90的计算比对应的phi = 0入射速度更快的情况下，可能有利的是仅与栅格线平行地测量。 在使用两组入射角的情况下，入射光可以被极化，以为每个入射极角提供总共四组数据-R00，Rp0，Rs90，Rp90，全部来自相同的结构。

公开(公告)号：US07253909B1

公开(公告)日：2007-08-07

申请号：US11028894

申请日：2005-01-03

Applicant: Guoguang Li ,  Phillip Walsh ,  Shuqiang Chen ,  Abdul Rahim Forouhi

Inventor： Guoguang Li ,  Phillip Walsh ,  Shuqiang Chen ,  Abdul Rahim Forouhi

IPC: G01B11/00

CPC classification number: G01B11/0625 ,  G01N21/4788 ,  G01N21/59 ,  G01N21/956 ,  G01N2021/4735

Abstract: An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. A direct approximate phase measurement is provided when the response light is transmitted light.

Abstract translation: 一种用于通过用覆盖入射波长范围（例如190nm至1000nm）的入射光照射衬底来确定衬底上特征的物理参数的装置和方法，其中衬底至少是半透明的。 测量从衬底接收的响应光和特征以获得响应光的响应光谱。 此外，计算由特征和衬底引起的复值响应，并且在确定物理参数中使用响应谱和复值响应。 当响应光透射光时，提供直接近似相位测量。

公开(公告)号：US08564780B2

公开(公告)日：2013-10-22

申请号：US12844851

申请日：2010-07-28

Applicant: Phillip Walsh ,  Dale Harrison

Inventor： Phillip Walsh ,  Dale Harrison

IPC: G01N21/55

CPC classification number: G01J3/02 ,  G01J3/021 ,  G01J3/0286 ,  G01J3/0291 ,  G01J3/08 ,  G01J3/2803 ,  G01J3/2823 ,  G01J3/36 ,  G01N21/274 ,  G01N21/4788

Abstract: A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-θ stage to further reduce the footprint.

Abstract translation: 公开了一种用于使用下面的深紫外（DUV）波长反射测量法来测量半导体工件上的衍射和/或散射结构的性质的方法和装置。 该系统可以使用任何入射配置的偏振光，但是本文公开的一种技术有利地使用正常入射配置中的非偏振光。 因此，该系统使用下面的深紫外（DUV）辐射提供增强的光学测量能力，同时保持容易集成到其它工艺工具中的小型光学模块。 进一步的细化使用r-θ级来进一步减少占地面积。

公开(公告)号：US20100177324A1

公开(公告)日：2010-07-15

申请号：US12592773

申请日：2009-12-02

Applicant: Phillip Walsh

Inventor： Phillip Walsh

IPC: G01B11/24

CPC classification number: G01N21/4788 ,  G01B11/24 ,  G01N21/211

Abstract: An optical metrology apparatus for measuring periodic structures using multiple incident azimuthal (phi) and polar (theta) incident angles is described. One embodiment provides the enhanced calculation speed for the special case of phi=90 incidence for 1-D (line and space) structures, which has the incident plane parallel to the grating lines, as opposed to the phi=0 classical mounting, which has incident plane perpendicular to the grating lines. The enhancement reduces the computation time of the phi=90 case to the same order as the corresponding phi=0 case, and in some cases the phi=90 case can be significantly faster. One advantageous configuration consists of two measurements for each sample structure, one perpendicular to the grating lines and one parallel. This provides additional information about the structure, equivalent to two simultaneous angles of incidence, without excessive increase in computation time. Alternately, in cases where the computation for phi=90 is faster than the corresponding phi=0 incidence, it may be advantageous to measure parallel to the grating lines only. In the case where two sets of incident angles are used, the incident light can be polarized to provide a total of four sets of data—Rs0, Rp0, Rs90, Rp90—for each incident polar angle, all from the same structure.

Abstract translation: 描述了使用多个入射方位角（phi）和极化（theta）入射角来测量周期结构的光学测量装置。 一个实施例提供了对于具有与光栅线平行的入射平面的1-D（线和空间）结构的phi = 90入射的特殊情况的增强的计算速度，与具有 垂直于光栅线的入射平面。 该增强将phi = 90情况的计算时间减少到与相应的phi = 0情况相同的顺序，并且在某些情况下，phi = 90的情况可以显着更快。 一个有利的配置包括对于每个样品结构的两个测量，一个垂直于光栅线和一个平行的测量结构。 这提供了关于结构的附加信息，相当于两个同时入射的入射角，而不会过多地增加计算时间。 或者，在phi = 90的计算比对应的phi = 0入射速度更快的情况下，可能有利的是仅与栅格线平行地测量。 在使用两组入射角的情况下，入射光可以被极化，以为每个入射极角提供总共四组数据-R00，Rp0，Rs90，Rp90，全部来自相同的结构。

公开(公告)号：US07349103B1

公开(公告)日：2008-03-25

申请号：US11264733

申请日：2005-10-31

Applicant: Mehdi Balooch ,  Marc Aho ,  Homan Amin ,  Abdul Rahim Forouhi ,  Phillip Walsh ,  Guoguang Li

Inventor： Mehdi Balooch ,  Marc Aho ,  Homan Amin ,  Abdul Rahim Forouhi ,  Phillip Walsh ,  Guoguang Li

IPC: G01B11/24

CPC classification number: G01J3/10 ,  G01J3/108 ,  G01N21/4738 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4735

Abstract: An apparatus and method for examining features of a sample with a broadband beam of light obtained from a long-wavelength source that may include two distinct emitters that emit a long-wavelength radiation and a short-wavelength source that emits a short-wavelength radiation. A passage is positioned between the sources and a reflective beam combining optics is provided for shaping the long-wavelength radiation to enter the short-wavelength source via the passage and also for shaping the short-wavelength radiation that exits through the passage and propagates toward the long-wavelength source. The reflective beam combining optics shape the short-wavelength radiation such that it re-enters the short-wavelength source via the passage and is combined with the long-wavelength radiation into the broadband beam that exits the short-wavelength source. A beam steering optics projects the broadband beam to a spot on the sample, and a scattered broadband radiation from the spot is intercepted and shaped to a broadband signal beam, which is passed through a sampling pinhole that passes a test portion of it on to a detector for optical examination; the test portion that is passed can correspond to a center portion of the spot.

Abstract translation: 一种用于利用从可能包括发射长波长辐射的两个不同的发射体和发射短波长辐射的短波长源的长波长源获得的宽带光束来检查样本的特征的装置和方法。 通道位于源之间，并且提供反射光束组合光学器件用于使长波长辐射成形以经由通道进入短波长源，并且还用于使通过通道离开的短波长辐射成形，并朝向 长波长源。 反射光束组合光学器件形成短波长辐射，使得其经由通道重新进入短波长源并且与长波长辐射组合成离开短波长源的宽带光束。 光束转向光学器件将宽带光束投射到样品上的光点，并且来自光斑的散射宽带辐射被截取并成形为宽带信号光束，该宽带信号光束通过将其测试部分通过的采样针孔 光学检测仪 通过的测试部分可以对应于点的中心部分。

公开(公告)号：US20070181794A1

公开(公告)日：2007-08-09

申请号：US11418827

申请日：2006-05-05

Applicant: Phillip Walsh ,  Dale Harrison

Inventor： Phillip Walsh ,  Dale Harrison

IPC: G01D18/00 ,  G01N21/33

CPC classification number: G01D5/00 ,  G01N21/274 ,  G01N21/33 ,  G01N21/55

Abstract: A reflectometer calibration technique is provided that may include the use of two calibration samples in the calibration process. Further, the technique allows for calibration even in the presence of variations between the actual and assumed properties of at least one or more of the calibration samples. In addition, the technique utilizes a ratio of the measurements from the first and second calibration samples to determine the actual properties of at least one of the calibration samples. The ratio may be a ratio of the intensity reflected from the first and second calibration samples. The samples may exhibit relatively different reflective properties at the desired wavelengths. In such a technique the reflectance data of each sample may then be considered relatively decoupled from the other and actual properties of one or more of the calibration samples may be calculated. The determined actual properties may then be utilized to assist calibration of the reflectometer.

公开(公告)号：US06891628B2

公开(公告)日：2005-05-10

申请号：US10607410

申请日：2003-06-25

Applicant: Guoguang Li ,  Phillip Walsh ,  Abdul R. Forouhi

Inventor： Guoguang Li ,  Phillip Walsh ,  Abdul R. Forouhi

IPC: G01B11/06 ,  G01N21/47 ,  G01N21/59 ,  G01N21/956 ,  G01B11/00

CPC classification number: G01B11/0625 ,  G01N21/4788 ,  G01N21/59 ,  G01N21/956 ,  G01N2021/4735

Abstract: An apparatus and method for determining a physical parameter of features on a substrate by illuminating the substrate with an incident light covering an incident wavelength range Δλ, e.g., from 190 nm to 1000 nm, where the substrate is at least semi-transparent. A response light received from the substrate and the feature is measured to obtain a response spectrum of the response light. Further, a complex-valued response due to the feature and the substrate is computed and both the response spectrum and the complex-valued response are used in determining the physical parameter. The response light is reflected light, transmitted light or a combination of the two. The complex-valued response typically includes a complex reflectance amplitude, a complex transmittance amplitude or both. The apparatus and method take into account the effects of vertical and lateral coherence length and are well suited for examining adjacent features.

Abstract translation: 一种用于通过用覆盖入射波长范围（例如190nm至1000nm）的入射光照射衬底来确定衬底上特征的物理参数的装置和方法，其中衬底至少是半透明的。 测量从衬底接收的响应光和特征以获得响应光的响应光谱。 此外，计算由特征和衬底引起的复值响应，并且在确定物理参数中使用响应谱和复值响应。 响应光是反射光，透射光或两者的组合。 复值响应通常包括复反射幅度，复透射幅度或二者。 该装置和方法考虑到纵向和横向相干长度的影响，并且非常适合于检查相邻特征。

公开(公告)号：US08773662B2

公开(公告)日：2014-07-08

申请号：US13184619

申请日：2011-07-18

Applicant: Phillip Walsh ,  Anthony T. Hayes ,  Dale A. Harrison

Inventor： Phillip Walsh ,  Anthony T. Hayes ,  Dale A. Harrison

IPC: G01J4/00 ,  G01N21/19

CPC classification number: G01N21/255 ,  G01N21/19 ,  G01N21/33 ,  G01N2021/335

Abstract: A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region.

Abstract translation: 提供了一种高效的真空紫外圆二色光谱仪; 该光谱仪适用于实验室使用或用于在同步加速器辐射设备处集成到光束线中。 在一个实施例中，提供了一种光谱圆二色性仪器; 该仪器被配置为使得能够同时获得多个波长的光的圆二色性数据。 该仪器可以被进一步配置成在真空紫外波长区域的至少一部分中操作。

公开(公告)号：US20120268740A1

公开(公告)日：2012-10-25

申请号：US13184619

申请日：2011-07-18

Applicant: Phillip Walsh ,  Anthony T. Hayes ,  Dale A. Harrison

Inventor： Phillip Walsh ,  Anthony T. Hayes ,  Dale A. Harrison

IPC: G01J3/447

CPC classification number: G01N21/255 ,  G01N21/19 ,  G01N21/33 ,  G01N2021/335

Abstract: A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region.

Abstract translation: 提供了一种高效的真空紫外圆二色光谱仪; 该光谱仪适用于实验室使用或用于在同步加速器辐射设备处集成到光束线中。 在一个实施例中，提供了一种光谱圆二色性仪器; 该仪器被配置为使得能够同时获得多个波长的光的圆二色性数据。 该仪器可以被进一步配置成在真空紫外波长区域的至少一部分中操作。

公开(公告)号：US20100294922A1

公开(公告)日：2010-11-25

申请号：US12454837

申请日：2009-05-22

Applicant: JEFFREY B. HURST ,  MATTHEW WELDON ,  PHILLIP WALSH ,  CRISTIAN RIVAS ,  DALE A. HARRISON

Inventor： JEFFREY B. HURST ,  MATTHEW WELDON ,  PHILLIP WALSH ,  CRISTIAN RIVAS ,  DALE A. HARRISON

IPC: G12B13/00

CPC classification number: G01N21/278 ,  G01N2021/335

Abstract: A calibration pad having multiple calibration sites is provided. A particular calibration site may be utilized until that particular site has been determined to have become unacceptable for further use, for example from contamination, in which case the calibration processes may then move to use a different calibration site(s) on the calibration pad(s). A variety of techniques may be utilized to provide the determination that a site is no longer acceptable for use. Movement may thus occur over time from site to site for use in a calibration process. A variety of criteria may be established to determine when to move to another site. Though the designation of a site as “bad” may be based upon measured reflectance data, other criteria may also be used. For example, the number of times a site has been exposed to light may be the criteria for designating a site as bad. Alternatively the cumulative exposure of a site may be the criteria. Further, the plurality of calibration sites that are provided on the single calibration pad may be pre-evaluated so as to initially screen out unacceptable calibration sites prior to use. The techniques provided may be utilized in calibration processes which utilize a single calibration sample or processes which require a plurality of calibration samples.

Abstract translation: 提供具有多个校准位置的校准垫。 可以使用特定的校准位点，直到该特定位点被确定为不可接受以进一步使用，例如来自污染，在这种情况下，校准过程然后可以移动到在校准垫上使用不同的校准位点 s）。 可以使用各种技术来提供站点不再可接受使用的确定。 因此，随着时间的推移，运动可能会在现场到现场进行，以用于校准过程。 可以建立各种标准来确定何时移动到另一个站点。 虽然将站点指定为“不良”可以基于测量的反射率数据，但是也可以使用其他标准。 例如，站点暴露于光线的次数可能是指定站点不佳的标准。 或者，站点的累积曝光可以是标准。 此外，可以预先评估设置在单个校准垫上的多个校准位置，以便在使用之前最初屏蔽不可接受的校准位置。 提供的技术可以用于利用单个校准样品或需要多个校准样品的过程的校准过程。