利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

21 条记录 (耗时 0.013 秒)

    Method and apparatus for cleaning and surface conditioning objects using plasma
    1.
    发明申请
    Method and apparatus for cleaning and surface conditioning objects using plasma 有权
    使用等离子体清洁和表面调理物体的方法和设备

    公开(公告)号：US20060272673A1

    公开(公告)日：2006-12-07

    申请号：US11142988

    申请日：2005-06-02

    申请人： Peter Kurunczi

    发明人： Peter Kurunczi

    IPC分类号： B08B6/00 ,  C23F1/00

    CPC分类号： B08B7/0035 ,  A61L2/14 ,  B01L3/021 ,  B01L3/022 ,  B01L3/0244 ,  B01L3/0275 ,  B01L99/00 ,  B08B9/00 ,  C23F4/00 ,  G01N35/1004 ,  H01J37/32009 ,  H01J37/32348

    摘要： A method and apparatus for cleaning and surface conditioning objects using plasma are disclosed. One embodiment of the method discloses providing a plurality of elongated dielectric barrier members arranged adjacent each other, the elongated dielectric barrier members having electrodes coupled therein, providing a ground plane, introducing the objects proximate the elongated dielectric barrier members and the ground plane, and producing a dielectric barrier discharge to form plasma between the ground plane and the elongated dielectric barrier members for cleaning the objects. One embodiment of the apparatus for cleaning objects using plasma discloses a plurality of elongated dielectric barrier members arranged adjacent each other, a plurality of electrodes, each contained within, and extending substantially along the length of, respective ones of the elongated dielectric barrier members, and a ground plane proximate the plurality of elongated dielectric barrier members.

    摘要翻译： 公开了一种使用等离子体清洁和表面调节物体的方法和装置。 该方法的一个实施例公开了提供多个彼此相邻布置的细长电介质阻挡件，细长电介质阻挡件具有耦合在其中的电极，提供接地平面，将物体靠近细长电介质阻挡件和接地平面引入，并产生 电介质阻挡放电，以在接地平面和细长介电阻挡件之间形成等离子体，用于清洁物体。 用于使用等离子体清洁物体的装置的一个实施例公开了彼此相邻布置的多个细长介质阻挡构件，多个电极，每个电极包含在延伸的介电阻挡构件的相应长度内并基本上延伸， 靠近所述多个细长介电阻挡构件的接地平面。

    METHOD AND APPARATUS FOR CLEANING AND SURFACE CONDITIONING OBJECTS USING PLASMA
    2.
    发明申请
    METHOD AND APPARATUS FOR CLEANING AND SURFACE CONDITIONING OBJECTS USING PLASMA 有权
    使用等离子体清洗和表面调节对象的方法和装置

    公开(公告)号：US20060201916A1

    公开(公告)日：2006-09-14

    申请号：US11421977

    申请日：2006-06-02

    申请人： Peter Kurunczi

    发明人： Peter Kurunczi

    IPC分类号： B23K9/00

    CPC分类号： B08B7/0035 ,  H05H1/24 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/2418 ,  H05H2001/2437

    摘要： A method and apparatus for cleaning and surface conditioning objects using plasma are disclosed. One embodiment of the apparatus for cleaning conductive objects using plasma discloses at least one planar dielectric barrier plate having a first surface and a second surface, and at least one electrode proximate the second surface of the at least one planar dielectric barrier plate, wherein the planar dielectric barrier plate is positioned to receive at least one object substantially orthogonally proximate the first surface. Another embodiment of the apparatus includes a ground plane for cleaning non-conductive objects, wherein the ground plane has apertures sized and arranged for receiving each object to be cleaned.

    摘要翻译： 公开了一种使用等离子体清洁和表面调节物体的方法和装置。 用于使用等离子体清洁导电物体的装置的一个实施例公开了至少一个具有第一表面和第二表面的平面介质阻挡板，以及邻近至少一个平面介质阻挡板的第二表面的至少一个电极，其中平面 绝缘阻挡板被定位成接收基本上正交地靠近第一表面的至少一个物体。 该设备的另一实施例包括用于清洁非导电物体的接地平面，其中接地平面具有尺寸和布置成用于接收每个待清洁物体的孔。

    Method and apparatus for cleaning and surface conditioning objects with plasma
    3.
    发明申请
    Method and apparatus for cleaning and surface conditioning objects with plasma 审中-公开
    用等离子体清洁和表面调理物体的方法和设备

    公开(公告)号：US20060162741A1

    公开(公告)日：2006-07-27

    申请号：US11043787

    申请日：2005-01-26

    申请人： Peter Kurunczi

    发明人： Peter Kurunczi

    IPC分类号： B08B6/00 ,  C23F1/00

    CPC分类号： B08B7/00 ,  A61L2/14 ,  B01L3/021 ,  B01L3/0244 ,  B01L3/0275 ,  B01L13/02 ,  B08B7/0035 ,  H01J37/32348 ,  H01J2237/335 ,  H05H1/2406 ,  H05H2001/2418 ,  H05H2001/2437

    摘要： A method and apparatus for cleaning and surface conditioning objects using plasma is disclosed. One embodiment of the method discloses providing a plurality of elongated dielectric barrier plates arranged adjacent each other, the plates having inner electrodes connected therein, introducing the objects proximate the plates, and producing a dielectric barrier discharge to form plasma between the objects and the plates for cleaning at least a portion of the objects. One embodiment of the apparatus for cleaning objects using plasma discloses a plurality of elongated dielectric barrier plates arranged adjacent each other, and a plurality of inner electrodes, each contained within, and extending substantially along the length of, respective ones of the elongated dielectric barrier plates.

    摘要翻译： 公开了一种用于使用等离子体清洁和表面调节物体的方法和装置。 该方法的一个实施例公开了提供多个彼此相邻布置的细长电介质阻挡板，其中连接有内部电极的板，引入靠近板的物体，并产生电介质阻挡放电以在物体和板之间形成等离子体 清洁至少一部分物体。 用于使用等离子体清洁物体的装置的一个实施例公开了彼此相邻布置的多个细长电介质阻挡板，以及多个内部电极，每个内部电极容纳在相应的长形介电阻挡板的内部并基本上延伸 。

    Use of patterned UV source for photolithography
    4.
    发明授权
    Use of patterned UV source for photolithography 失效
    使用图案化UV光源进行光刻

    公开(公告)号：US08450051B2

    公开(公告)日：2013-05-28

    申请号：US12973065

    申请日：2010-12-20

    申请人： Nicholas Bateman ,  Peter Kurunczi

    发明人： Nicholas Bateman ,  Peter Kurunczi

    IPC分类号： G03F7/20

    CPC分类号： G03F7/2051 ,  H01L31/022441 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： A system and method of exposing photoresist on the surface of the solar cell to light so as to create an appropriate mask is disclosed. A microcavity array is used to expose the photoresist to UV light in a pattern that matches the desired pattern on the solar cell. Microcavity arrays consist of an array of cavities, which may include tens of thousands of cavities. When an appropriate potential is applied to an electrode, a plasma is formed in the activated cavity. If the cavity contains a suitable gaseous environment, these activated cavities will emit light in the near ultraviolet spectrum. By properly configuring the locations of the activated cavities, a UV source may be created that exposes the photoresist in a desired pattern. The desired pattern can be created by selectively activating cavities, disabling certain cavities, or filling certain cavities so that they cannot create a plasma.

    摘要翻译： 公开了一种将太阳能电池表面上的光致抗蚀剂曝光以产生适当掩模的系统和方法。 微腔阵列用于以与太阳能电池上的期望图案匹配的图案将光致抗蚀剂暴露于UV光。 微腔阵列由空腔阵列组成，其可以包括数万个空腔。 当对电极施加适当的电位时，在激活的腔中形成等离子体。 如果空腔含有合适的气体环境，这些活化的空腔将在近紫外光谱中发光。 通过适当地配置活化空腔的位置，可以产生以期望的图案曝光光致抗蚀剂的UV源。 可以通过选择性地激活空腔，禁用某些空腔或填充某些空腔使其不能产生等离子体来产生所需的图案。

    METHOD AND APPARATUS FOR CLEANING AND SURFACE CONDITIONING OBJECTS USING PLASMA
    6.
    发明申请
    METHOD AND APPARATUS FOR CLEANING AND SURFACE CONDITIONING OBJECTS USING PLASMA 有权
    使用等离子体清洗和表面调节对象的方法和装置

    公开(公告)号：US20060201534A1

    公开(公告)日：2006-09-14

    申请号：US11421983

    申请日：2006-06-02

    申请人： Peter Kurunczi

    发明人： Peter Kurunczi

    IPC分类号： B08B6/00

    CPC分类号： B08B7/0035 ,  A61L2/14 ,  B01L3/021 ,  B01L3/022 ,  B01L3/0244 ,  B01L3/0275 ,  B01L99/00 ,  B08B9/00 ,  C23F4/00 ,  G01N35/1004 ,  H01J37/32009 ,  H01J37/32348 ,  H05H1/2406 ,  H05H2001/245 ,  H05H2245/1225

    摘要： An apparatus and method for cleaning objects using plasma are disclosed. The apparatus provides a plurality of elongated dielectric barrier members arranged adjacent each other, a plurality of electrodes each contained within, and extending substantially along the length of, the plurality of elongated dielectric barrier members, and at least one buss bar for electrically coupling the plurality of electrodes to a voltage source. The method provides providing a plurality of elongated dielectric barrier members arranged adjacent each other, providing a plurality of electrodes each contained within, and extending substantially along the length of the plurality of elongated dielectric barrier members, providing at least one buss bar connected to the plurality of electrodes, electrically coupling the plurality of electrodes to a voltage source through the at least one buss bar, introducing the objects proximate the plurality of elongated dielectric barrier members, generating a dielectric barrier discharge between the plurality of dielectric barrier members and the objects; and forming plasma to clean at least a portion of the objects.

    摘要翻译： 公开了一种使用等离子体清洁物体的设备和方法。 该装置提供了彼此相邻布置的多个细长的电介质阻挡件，多个电极各自容纳在多个细长的电介质阻挡件的内部并且基本沿其长度延伸，以及至少一个用于电耦合多个 的电极到电压源。 该方法提供了多个彼此相邻布置的细长电介质阻挡件，提供多个电极，每个电极均包含在多个细长的电介质阻挡件的内部并基本上沿其长度延伸，提供至少一个连接到多个 通过所述至少一个汇流条将所述多个电极电耦合到电压源，引入靠近所述多个细长介质阻挡构件的物体，在所述多个介电阻挡构件和所述物体之间产生电介质势垒放电; 以及形成等离子体以清洁所述物体的至少一部分。

    PLASMA ATTENUATION FOR UNIFORMITY CONTROL
    7.
    发明申请
    PLASMA ATTENUATION FOR UNIFORMITY CONTROL 有权
    平等控制的等离子体衰减

    公开(公告)号：US20120293070A1

    公开(公告)日：2012-11-22

    申请号：US13108052

    申请日：2011-05-16

    申请人： Peter Kurunczi ,  Frank Sinclair ,  Costel Biloiu ,  Ludovic Godet ,  Ernest Allen

    发明人： Peter Kurunczi ,  Frank Sinclair ,  Costel Biloiu ,  Ludovic Godet ,  Ernest Allen

    IPC分类号： H05H1/24

    CPC分类号： H01J37/08 ,  H01J37/3171 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/32669

    摘要： A plasma processing apparatus and method are disclosed which create a uniform plasma within an enclosure. In one embodiment, a conductive or ferrite material is used to influence a section of the antenna, where a section is made up of portions of multiple coiled segments. In another embodiment, a ferrite material is used to influence a portion of the antenna. In another embodiment, plasma uniformity is improved by modifying the internal shape and volume of the enclosure.

    摘要翻译： 公开了一种等离子体处理装置和方法，其在外壳内产生均匀的等离子体。 在一个实施例中，导电或铁氧体材料用于影响天线的一部分，其中一部分由多个线圈段的部分组成。 在另一个实施例中，铁氧体材料用于影响天线的一部分。 在另一个实施例中，通过改变外壳的内部形状和体积来提高等离子体的均匀性。

    Wafer charge monitoring
    9.
    发明申请
    Wafer charge monitoring 有权
    晶圆充电监控

    公开(公告)号：US20070187615A1

    公开(公告)日：2007-08-16

    申请号：US11353820

    申请日：2006-02-14

    申请人： Russell Low ,  George Gammel ,  Peter Kurunczi ,  Eric Cobb

    发明人： Russell Low ,  George Gammel ,  Peter Kurunczi ,  Eric Cobb

    IPC分类号： G01K1/08

    CPC分类号： H01J37/3171 ,  H01J2237/24405 ,  H01J2237/31703

    摘要： A charge monitoring system may include a platen having a surface configured to accept a wafer thereon, and a charge monitor disposed relative to the platen so that an ion beam simultaneously strikes a portion of the charge monitor and a portion of the wafer. The charge monitor is configured to provide a charge monitor signal representative of a charge on a surface of the wafer when the ion beam simultaneously strikes the portion of the charge monitor and the portion of the wafer. The charge monitor signal may depend, at least in part, on a beam potential of the ion beam.

    摘要翻译： 电荷监测系统可以包括具有被配置为在其上接受晶片的表面的压板和相对于压板设置的电荷监测器，使得离子束同时撞击电荷监测器的一部分和晶片的一部分。 电荷监视器被配置为当离子束同时撞击电荷监视器的部分和晶片的部分时，提供表示晶片表面上的电荷的电荷监测信号。 电荷监测信号至少部分地取决于离子束的束电位。