公开(公告)号：US5464657A

公开(公告)日：1995-11-07

申请号：US264816

申请日：1994-06-23

申请人： Patricia R. Athey ,  Douglas S. Dauson ,  David E. Lecocq ,  George A. Neuman ,  John F. Sopko ,  Royann L. Stewart-Davis

发明人： Patricia R. Athey ,  Douglas S. Dauson ,  David E. Lecocq ,  George A. Neuman ,  John F. Sopko ,  Royann L. Stewart-Davis

IPC分类号： B32B9/00 ,  B32B17/06 ,  C03C17/00 ,  C03C17/23 ,  C03C17/245 ,  C03C17/30 ,  C03C17/34 ,  C07C7/04 ,  C23C16/40 ,  C23C16/44 ,  C23C16/453 ,  C23C16/455 ,  C23C16/54 ,  C23C16/00

CPC分类号： C03C17/245 ,  C03C17/002 ,  C03C17/2453 ,  C03C17/3417 ,  C23C16/401 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/545 ,  C03C2217/211 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2217/215 ,  C03C2217/216 ,  C03C2217/218 ,  C03C2217/219 ,  C03C2217/228 ,  C03C2217/23 ,  C03C2217/241 ,  C03C2217/244 ,  C03C2218/152

摘要： A method for coating a moving substrate provides a coating having a chemical composition which varies continuously from the interface with the substrate to the opposite surface of the coating. The method involves directing a vapor coating composition toward a substrate surface and moving portions of the vapor in opposite directions. A vapor coating mixture may include a tin-containing precursor and a silicon-containing precursor. An accelerant, e.g. a phosphorus-containing precursor, may be used with the metal-containing precursors to increase the deposition rate of the coating. The coating deposited on the substrate has regions of continuously varying weight percent of silicon oxide and tin oxide as the distance from the substrate-coating interface increases, with the surface of the coating farthest from the substrate-coating interface being predominantly tin oxide. The regions of varying composition provide the coating with varying indices of refraction to eliminate iridescence to provide a coated article, particularly a tin oxide coated glass article, with a neutral color.

摘要翻译： 涂覆移动衬底的方法提供了具有从衬底到衬底的相对表面连续变化的化学组成的涂层。 该方法包括将蒸气涂料组合物引向衬底表面，并使蒸汽的相反方向移动。 蒸气涂覆混合物可以包括含锡前体和含硅前体。 促进剂，例如。 含磷前体可以与含金属的前体一起使用以增加涂层的沉积速率。 沉积在基板上的涂层具有连续改变重量百分比的氧化硅和氧化锡的区域，这是随着与基板 - 涂层界面的距离增加，涂层表面离基材 - 涂层界面最远的地方主要是氧化锡。 不同组成的区域为涂层提供了不同的折射率，以消除虹彩以提供具有中性色的涂层制品，特别是涂有氧化锡的玻璃制品。

公开(公告)号：US5776236A

公开(公告)日：1998-07-07

申请号：US678252

申请日：1996-07-11

申请人： George A. Neuman ,  Patricia Ruzakowski Athey ,  Royann L. Stewart-Davis

发明人： George A. Neuman ,  Patricia Ruzakowski Athey ,  Royann L. Stewart-Davis

IPC分类号： C03C17/00 ,  C03C17/245 ,  C03C17/34 ,  C23C16/40 ,  C23C16/44 ,  C23C16/453 ,  C23C16/54 ,  C03C1/00

CPC分类号： C03C17/002 ,  C03C17/245 ,  C03C17/2453 ,  C03C17/3417 ,  C23C16/401 ,  C23C16/402 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/545 ,  C03C2217/211 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2217/215 ,  C03C2217/216 ,  C03C2217/218 ,  C03C2217/219 ,  C03C2217/228 ,  C03C2217/23 ,  C03C2217/241 ,  C03C2217/244 ,  C03C2218/152

摘要： Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula ##STR1## wherein R.sub.1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R.sub.2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds. Also disclosed are compositions including an additional metal-containing coating precursor, such as an organotin compound, to deposit another metal oxide along with silicon oxide.

摘要翻译： 公开了可用作氧化硅的化学气相沉积的涂料反应物的硅化合物，以及可用作增加氧化硅沉积速率的促进剂的化合物。 含硅前体包括结构式：其中R 1是可以被取代的烷基，链烯基，炔基或芳基，R 2是通过将电子密度从 硅原子，例如氢，卤素，烯基，炔基，卤代烷基和全卤代烷基。 促进剂是选择用于利用硅原子上的部分正电荷的化合物。 这种促进剂化合物包括路易斯酸和碱; 水; 臭氧; 氮，硼和磷的三价化合物; 硫和硒的四价化合物; 五价磷化合物和各种金属化合物。 还公开了包含另外的含金属的涂层前体，例如有机锡化合物，以沉积另外的金属氧化物和氧化硅的组合物。

公开(公告)号：US5395698A

公开(公告)日：1995-03-07

申请号：US072792

申请日：1993-06-04

申请人： George A. Neuman ,  Royann L. Stewart-Davis

发明人： George A. Neuman ,  Royann L. Stewart-Davis

IPC分类号： B05D5/06 ,  B32B7/02 ,  B32B15/06 ,  B32B17/00 ,  C03C17/23 ,  C03C17/245 ,  C03C17/34 ,  G02B1/10 ,  B32B15/00

CPC分类号： G02B1/10 ,  C03C17/3417 ,  Y10T428/24942 ,  Y10T428/24975 ,  Y10T428/265

摘要： A coated article and method of producing it are disclosed wherein the iridescence caused by the difference between the refractive index of a transparent substrate and the refractive index of a metal oxide coating is reduced by means of two intermediate layers, the first of which, closest to the substrate, has a refractive index higher than the refractive index of the substrate but lower than the refractive index of the second, and the second has a refractive index higher than the refractive index of the first but lower than the refractive index of the metal oxide coating. The thicknesses of the two intermediate layers for optimizing a neutral appearance are determined by the thickness and refractive index of the metal oxide coating.

摘要翻译： 公开了一种涂覆制品及其制造方法，其中由透明基材的折射率与金属氧化物涂层的折射率之间的差异引起的虹彩通过两个中间层而减少，其中第一个最接近 基板具有比基板的折射率高的折射率，但低于第二折射率的折射率，第二折射率的折射率比第一折射率高，但低于金属氧化物的折射率 涂层。 用于优化中性外观的两个中间层的厚度由金属氧化物涂层的厚度和折射率决定。

公开(公告)号：US5599387A

公开(公告)日：1997-02-04

申请号：US472589

申请日：1995-06-07

申请人： George A. Neuman ,  Patricia R. Athey ,  Royann L. Stewart-Davis

发明人： George A. Neuman ,  Patricia R. Athey ,  Royann L. Stewart-Davis

IPC分类号： C03C17/00 ,  C03C17/245 ,  C03C17/34 ,  C23C16/40 ,  C23C16/44 ,  C23C16/453 ,  C23C16/54 ,  C09D5/00

CPC分类号： C03C17/002 ,  C03C17/245 ,  C03C17/2453 ,  C03C17/3417 ,  C23C16/401 ,  C23C16/402 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/545 ,  C03C2217/211 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2217/215 ,  C03C2217/216 ,  C03C2217/218 ,  C03C2217/219 ,  C03C2217/228 ,  C03C2217/23 ,  C03C2217/241 ,  C03C2217/244 ,  C03C2218/152

摘要： Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula ##STR1## wherein R.sup.1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R.sub.2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds. Also disclosed are compositions including an additional metal-containing coating precursor, such as an organotin compound, to deposit another metal oxide along with silicon oxide.

摘要翻译： 公开了可用作氧化硅的化学气相沉积的涂料反应物的硅化合物，以及可用作增加氧化硅沉积速率的促进剂的化合物。 含硅前体包括结构式：其中R 1是可以被取代的烷基，链烯基，炔基或芳基，R 2是通过将电子密度从 硅原子，例如氢，卤素，烯基，炔基，卤代烷基和全卤代烷基。 促进剂是选择用于利用硅原子上的部分正电荷的化合物。 这种促进剂化合物包括路易斯酸和碱; 水; 臭氧; 氮，硼和磷的三价化合物; 硫和硒的四价化合物; 五价磷化合物和各种金属化合物。 还公开了包含另外的含金属的涂层前体，例如有机锡化合物，以沉积另外的金属氧化物和氧化硅的组合物。

公开(公告)号：US07897259B1

公开(公告)日：2011-03-01

申请号：US09057677

申请日：1998-04-09

申请人： David E. Lococq ,  George A. Neuman ,  Royann L. Stewart-Davis

发明人： David E. Lococq ,  George A. Neuman ,  Royann L. Stewart-Davis

IPC分类号： B32B17/06 ,  B32B18/00

CPC分类号： C23C16/401 ,  C03C17/002 ,  C03C17/245 ,  C03C17/2453 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2217/23 ,  C03C2218/152 ,  C23C16/4412 ,  C23C16/545

摘要： Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula wherein R1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds. Also disclosed are compositions including an additional metal-containing coating precursor, such as an organotin compound, to deposit another metal oxide along with silicon oxide.

摘要翻译： 公开了可用作氧化硅的化学气相沉积的涂料反应物的硅化合物，以及可用作增加氧化硅沉积速率的促进剂的化合物。 含硅前体包括以下结构式：其中R 1为可被取代的烷基，链烯基，炔基或芳基，R2为通过从硅原子排出电子密度而提高硅化合物反应性的官能团， 例如氢，卤素，烯基，炔基，卤代烷基和全卤代烷基。 促进剂是选择用于利用硅原子上的部分正电荷的化合物。 这种促进剂化合物包括路易斯酸和碱; 水; 臭氧; 氮，硼和磷的三价化合物; 硫和硒的四价化合物; 五价磷化合物和各种金属化合物。 还公开了包含另外的含金属的涂层前体，例如有机锡化合物，以沉积另外的金属氧化物和氧化硅的组合物。

公开(公告)号：US5356718A

公开(公告)日：1994-10-18

申请号：US17930

申请日：1993-02-16

申请人： Patricia R. Athey ,  Douglas S. Dauson ,  David E. Lecocq ,  George A. Neuman ,  John F. Sopko ,  Royann L. Stewart-Davis

发明人： Patricia R. Athey ,  Douglas S. Dauson ,  David E. Lecocq ,  George A. Neuman ,  John F. Sopko ,  Royann L. Stewart-Davis

IPC分类号： B32B9/00 ,  B32B17/06 ,  C03C17/00 ,  C03C17/23 ,  C03C17/245 ,  C03C17/30 ,  C03C17/34 ,  C07C7/04 ,  C23C16/40 ,  C23C16/44 ,  C23C16/453 ,  C23C16/455 ,  C23C16/54

CPC分类号： C03C17/245 ,  C03C17/002 ,  C03C17/2453 ,  C03C17/3417 ,  C23C16/401 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/545 ,  C03C2217/211 ,  C03C2217/212 ,  C03C2217/213 ,  C03C2217/215 ,  C03C2217/216 ,  C03C2217/218 ,  C03C2217/219 ,  C03C2217/228 ,  C03C2217/23 ,  C03C2217/241 ,  C03C2217/244 ,  C03C2218/152

摘要： An apparatus for coating a glass ribbon has an exhaust on each side of a coating unit at different distances therefrom. With this arrangement, portions of the ribbon upstream and downstream of the coating unit are exposed to coating vapors from the coating unit for different periods of time. A coating mixture includes tin containing precursors and a silicon containing precursor. The silicon containing precursor has the structural formula ##STR1## where R.sub.1 is a group which does not have an oxygen available to form a peroxide, R.sub.2 is a functional group giving the silicon containing precursor the ability to be easily converted to silicon oxide coating, R.sub.3 is a bridging group to provide for multiple silicon atoms and R.sub.4 completes the bonding on the foundation silicon atom. An accelerant e.g. a phosphorus containing precursor may be used with the metal containing precursors to increase the deposition rate of the coating. The coating deposited on the glass has regions of continuously varying weight percent of silicon oxide and tin oxide as the distance from the glass-coating interface increases, with the surface of the coating farthest from the glass-coating interface being predominantly tin oxide. The regions within the coating provide the coating with different indices of refraction to eliminate iridescence resulting from increased thickness of the tin oxide at the outer coating surface and to provide the coated glass article with a neutral color. When phosphorus is used as the accelerant, the percent of crystallinity is reduced and approaches O, thereby reducing or eliminating the coating haze.

摘要翻译： 用于涂覆玻璃带的设备在与其不同的距离处的涂布单元的每一侧上具有排气。 通过这种布置，涂层单元的上游和下游的部分部分暴露于来自涂覆单元的涂覆蒸气不同的时间段。 涂料混合物包括含锡前体和含硅前体。 含硅前体具有结构式“IMAGE”，其中R1是不具有可用于形成过氧化物的氧的基团，R2是赋予含硅前体的能够容易地转化为氧化硅涂层的功能，R3 是提供多个硅原子的桥接基团，R4完成了在基础硅原子上的键合。 加速剂例如 可以将含磷前体与含金属的前体一起使用以增加涂层的沉积速率。 随着玻璃 - 涂层界面的距离增加，沉积在玻璃上的涂层具有连续变化重量百分比的氧化硅和氧化锡的区域，其中最远离玻璃 - 涂层界面的涂层的表面主要是氧化锡。 涂层中的区域为涂层提供不同的折射率，以消除由外涂层表面上的氧化锡厚度增加而产生的虹彩，并为涂覆的玻璃制品提供中性色。 当磷用作促进剂时，结晶度的百分比降低并接近O，从而减少或消除涂层雾度。