公开(公告)号：US08976337B2

公开(公告)日：2015-03-10

申请号：US13210003

申请日：2011-08-15

申请人： Satoru Oishi

发明人： Satoru Oishi

IPC分类号： G03F9/00 ,  G03B27/52 ,  G03B27/53

CPC分类号： G03F9/7092 ,  G03B27/521 ,  G03B27/53

摘要： A method and an apparatus are provided to measure a position of a mark with a less measurement error caused by a variation in a wafer process condition. The mark is illuminated with light and an image of the mark is formed, via an optical system, in a light receiving surface of a sensor. The image of the mark is sensed and image data thereof is acquired by the sensor. Correction data of a fundamental frequency and a high harmonic of the image data is set based on information associated with a shape of the mark, an imaging magnification of the optical system, and an imaging area of the sensor. The image data is corrected using the correction data, and the position of the mark is calculated using the corrected image data.

摘要翻译： 提供了一种方法和装置，用于测量由晶片工艺条件变化引起的较小测量误差的标记位置。 标记用光照亮，并且通过光学系统在传感器的光接收表面中形成标记的图像。 检测标记的图像，并且通过传感器获取其图像数据。 基于与标记的形状，光学系统的成像倍率和传感器的成像区域相关联的信息来设置图像数据的基频和高次谐波的校正数据。 使用校正数据校正图像数据，并且使用校正图像数据来计算标记的位置。

公开(公告)号：US08097473B2

公开(公告)日：2012-01-17

申请号：US12323312

申请日：2008-11-25

申请人： Satoru Oishi ,  Hideki Ina

发明人： Satoru Oishi ,  Hideki Ina

IPC分类号： H01L21/00

CPC分类号： G03F9/7076 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7084

摘要： An alignment method is provided in which a substrate including first and second layers is aligned in forming a second pattern in the second layer. The method includes storing first alignment measurement data to be used in alignment performed in forming a first pattern and a second alignment mark in the second layer, the first alignment measurement data obtained by measuring a first alignment mark provided in the first layer; obtaining second alignment measurement data by measuring the second alignment mark through a resist applied over the second layer; obtaining third alignment measurement data by measuring the first alignment mark through the resist; and performing alignment of the substrate in accordance with a first difference between the first and second alignment measurement data, or in accordance with the first difference and a second difference between the first and third alignment measurement data.

摘要翻译： 提供了一种对准方法，其中包括第一和第二层的基板在第二层中形成第二图案。 该方法包括存储在第二层中形成第一图案和第二对准标记时所进行对准中使用的第一对准测量数据，通过测量设置在第一层中的第一对准标记获得的第一对准测量数据; 通过在第二层上施加的抗蚀剂测量第二对准标记来获得第二对准测量数据; 通过测量通过抗蚀剂的第一对准标记获得第三对准测量数据; 以及根据第一和第二对准测量数据之间的第一差异，或者根据第一差异和第一和第三对准测量数据之间的第二差异来执行衬底的对准。

公开(公告)号：US20090244513A1

公开(公告)日：2009-10-01

申请号：US12412295

申请日：2009-03-26

申请人： Takahiro Matsumoto ,  Koichi Sentoku ,  Satoru Oishi

发明人： Takahiro Matsumoto ,  Koichi Sentoku ,  Satoru Oishi

IPC分类号： G03B27/32 ,  G01B11/14

CPC分类号： G01B11/024 ,  G03B27/32 ,  G03F9/7046 ,  G03F9/7065 ,  G03F9/7088

摘要： The present invention provides a position detection apparatus including a first obtaining unit configured to obtain imaging characteristics of an imaging optical system for a plurality of light beams, having different wavelength with each other, of the light having the wavelength width, a second obtaining unit configured to obtain optical images of a target object for the plurality of light beams, a restoration unit configured to restore optical images of the target object for the plurality of light beams by correcting, deterioration in the obtained optical images of the target object attributed to the imaging optical system, based on the obtained imaging characteristics of the imaging optical system, and a generation unit configured to generate an optical image of the target object for light including the plurality of light beams by synthesizing the restored optical images of the target object for the plurality of light beams.

摘要翻译： 本发明提供了一种位置检测装置，包括第一获取单元，被配置为获得具有波长宽度的光彼此具有不同波长的多个光束的成像光学系统的成像特性，第二获取单元配置 以获得所述多个光束的目标物体的光学图像;恢复单元，被配置为通过校正所获得的所述目标对象的光学图像的劣化来恢复所述多个光束中的目标对象的光学图像 光学系统，基于所获得的成像光学系统的成像特性，以及生成单元，被配置为通过合成复原的多个目标对象的光学图像来生成包括多个光束的光的目标对象的光学图像 的光束。

公开(公告)号：US20070237253A1

公开(公告)日：2007-10-11

申请号：US11688408

申请日：2007-03-20

申请人： Satoru Oishi ,  Hideki Ina

发明人： Satoru Oishi ,  Hideki Ina

IPC分类号： H04L23/02

CPC分类号： G01M11/0292

摘要： A transfer characteristic calculation apparatus for calculating a transfer characteristic of an imaging optical system includes a light source, a generation unit which generates a second signal by converting a first signal obtained by stretching an impulse signal on a space axis into a positive value using a light from the light source, a sensor which obtains an image that is output from the imaging optical system as an output signal when a light intensity distribution is inputted as the second signal, and a calculation unit which calculates the transfer characteristic of the imaging optical system by convolution of a third signal with a fourth signal that is obtained by canceling a bias component of the output signal obtained by the sensor, the third signal being an impulse signal upon convolution with the first signal.

摘要翻译： 用于计算成像光学系统的传送特性的传送特性计算装置包括光源，生成单元，其通过将使用空间轴将空间轴上的脉冲信号拉伸获得的第一信号转换成正值而产生第二信号 从所述光源接收作为所述第二信号输入光强度分布时的从所述摄像光学系统输出的图像作为输出信号的传感器，以及计算所述摄像光学系统的传送特性的计算单元， 第三信号与通过消除由传感器获得的输出信号的偏置分量获得的第四信号进行卷积，第三信号是与第一信号卷积的脉冲信号。

公开(公告)号：US07110116B2

公开(公告)日：2006-09-19

申请号：US10279924

申请日：2002-10-25

申请人： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

发明人： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

IPC分类号： G01B21/00 ,  G03B27/42

CPC分类号： G03F9/7065 ,  G03F7/70233 ,  G03F7/70283 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7088

摘要： An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.

摘要翻译： 用于对准反射标线的对准装置包括用于发射对准光的光源，设置在光罩上的光学对准标记，以及设置在保持光罩的标线片台上的参考标记。 检测单元检测从对准标记和参考标记反射的对准光，并且基于检测单元的检测结果对准标线。

公开(公告)号：US07067826B2

公开(公告)日：2006-06-27

申请号：US10151151

申请日：2002-05-21

申请人： Takehiko Suzuki ,  Hideki Ina ,  Koichi Sentoku ,  Satoru Oishi

发明人： Takehiko Suzuki ,  Hideki Ina ,  Koichi Sentoku ,  Satoru Oishi

IPC分类号： G01N21/00

CPC分类号： G03F9/7015 ,  G03F7/70233 ,  G03F9/7011 ,  G03F9/7065 ,  G03F9/7088

摘要： A reticle stage reference mark 3 of material having high reflectivity to alignment illumination light is provided on a reticle 5, and a chuck mark 8 of material having high reflectivity to the alignment illumination light is provided on a wafer chuck 11. A relative position of the reticle stage reference mark 3 to the chuck mark 8 is detected by using a first position detection optical system 1 and a first illumination optical system 2, and relative alignment is performed between the reticle 5 and a wafer 10.

摘要翻译： 在掩模版5上设置有对齐照明光具有高反射率的材料的标线片基准标记3，并且在晶片卡盘11上设置具有对准照明光的高反射率的材料的卡盘8。 通过使用第一位置检测光学系统1和第一照明光学系统2来​​检测标线片基准标记3与卡盘标记8的相对位置，并且在标线片5和晶片10之间进行相对对准。

公开(公告)号：US20060106566A1

公开(公告)日：2006-05-18

申请号：US11320944

申请日：2005-12-28

申请人： Satoru Oishi ,  Takehiko Suzuki

发明人： Satoru Oishi ,  Takehiko Suzuki

IPC分类号： G06F15/00

CPC分类号： G03F9/7088 ,  G03F7/70633 ,  G03F9/7092

摘要： A position detecting method includes the steps of forming an image of a mark on a sensor, performing a first process that processes a raw signal obtained from the sensor with plural parameters, performing a second process that determines an edge of a signal processed by the first process for each parameter, determining a parameter from a result of the second process obtained for each parameter, and calculating a position of the mark based on a determined parameter.

公开(公告)号：US20060050274A1

公开(公告)日：2006-03-09

申请号：US11218538

申请日：2005-09-06

申请人： Takahiro Matsumoto ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Satoru Oishi

发明人： Takahiro Matsumoto ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Satoru Oishi

IPC分类号： G01B11/00

CPC分类号： G03F9/7092 ,  G03F7/70633

摘要： An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The exposure apparatus notifies a central processing unit of AGA measurement results and the alignment parameter. An overlay inspection apparatus measures an actual exposure position on the exposed wafer, and notifies the central processing unit of the measurement result. The central processing unit optimizes alignment processing on the basis of the AGA measurement results, alignment parameter, and actually measured exposure position.

摘要翻译： 曝光装置通过使用形成在晶片上的预定取样组进行AGA测量，并且确定对准参数。 曝光装置通过使用对准参数来执行晶片对准处理和曝光处理。 曝光装置向中央处理单元通知AGA测量结果和对准参数。 覆盖检查装置测量曝光的晶片上的实际曝光位置，并向中央处理单元通知测量结果。 中央处理单元根据AGA测量结果，对准参数和实际测量的曝光位置优化对准处理。

公开(公告)号：US06992767B2

公开(公告)日：2006-01-31

申请号：US10423889

申请日：2003-04-28

申请人： Takahiro Matsumoto ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Satoru Oishi

发明人： Takahiro Matsumoto ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Satoru Oishi

IPC分类号： G01B11/00 ,  G06F19/00

CPC分类号： G03F9/7092 ,  G03F7/70633

摘要： An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The exposure apparatus notifies a central processing unit (4) of AGA measurement results and the alignment parameter. An overlay inspection apparatus measures an actual exposure position on the exposed wafer, and notifies the central processing unit of the measurement result. The central processing unit (4) optimizes alignment processing on the basis of the AGA measurement results, alignment parameter, and actually measured exposure position.

摘要翻译： 曝光装置通过使用形成在晶片上的预定取样组进行AGA测量，并且确定对准参数。 曝光装置通过使用对准参数来执行晶片对准处理和曝光处理。 曝光装置向中央处理单元（4）通知AGA测量结果和对准参数。 覆盖检查装置测量曝光的晶片上的实际曝光位置，并向中央处理单元通知测量结果。 中央处理单元（4）基于AGA测量结果，对准参数和实际测量的曝光位置来优化对准处理。

公开(公告)号：US06412978B1

公开(公告)日：2002-07-02

申请号：US09476082

申请日：2000-01-03

申请人： Naoto Watanabe ,  Satoru Oishi

发明人： Naoto Watanabe ,  Satoru Oishi

IPC分类号： H05G102

CPC分类号： A61B6/4441 ,  A61B6/105 ,  A61B6/4233 ,  A61B6/4464 ,  A61B6/587

摘要： An X-ray diagnostic apparatus includes an X-ray tube for irradiating a subject with X-rays, a rectangular planar type X-ray detector formed by arraying a plurality of solid-state detection elements, a supporting mechanism for supporting the X-ray tube and the planar type X-ray detector in arbitrary postures with respect to the subject, and a suspending mechanism for suspending the planar type X-ray detector from the supporting mechanism. The suspending mechanism has a rotating mechanism for rotating the planar type X-ray detector through an arbitrary angle about a central path of the X-rays. When necessary, the planar type X-ray detector is rotated about the central path of the X-rays so as to be very close to the subject. When necessary, the planar type X-ray detector is rotated, so that the longitudinal direction of the subject on the image and the vertical direction of the screen can coincide with each other.

摘要翻译： X射线诊断装置包括：用X射线照射被检体的X射线管，通过排列多个固体检测元件形成的矩形平面型X射线检测器，支撑X射线 管和相对于被检体的任意姿态的平面型X射线检测器，以及用于将平面型X射线检测器从支撑机构悬挂的悬挂机构。 悬挂机构具有使平面型X射线检测器围绕X射线的中心路径旋转任意角度的旋转机构。 必要时，平面型X射线检测器围绕X射线的中心路径旋转，以使其非常靠近被检体。 必要时，平面型X射线检测器旋转，使得被检体在图像上的纵向方向和屏幕的垂直方向相互重合。