公开(公告)号：US07534547B2

公开(公告)日：2009-05-19

申请号：US10296831

申请日：2002-03-29

申请人： Makoto Hanabata ,  Masahiro Sato ,  Junko Katayama ,  Satsuki Kitajima ,  Atsushi Niwa

发明人： Makoto Hanabata ,  Masahiro Sato ,  Junko Katayama ,  Satsuki Kitajima ,  Atsushi Niwa

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： C07C317/22 ,  C07C43/303 ,  C07C43/313 ,  C07C43/315 ,  C07C69/92 ,  C07C69/96 ,  C07C271/58 ,  C07C2601/14 ,  C07C2603/18 ,  G03F7/0045 ,  G03F7/0392 ,  Y02P20/55 ,  Y10S430/114

摘要： A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A-[(J)m-(X-Pro)]n  (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

摘要翻译： 光活性化合物与由下式（1）表示的光敏剂组合使用：<？in-line-formula description =“In-line Formulas”end =“lead”？> A - [（J）m- （X-Pro）] n（1）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中A表示疏水单元，其包含至少一种选自烃 基团和杂环基团，J表示连接基团，X-Pro表示被保护基团Pro保护的亲水基团，其可通过曝光可除去，m表示0或1，n表示不小于1的整数。 保护基Pro可以通过与光敏剂（特别是光酸产生剂）相关联的曝光而被除去，或者可以是疏水性保护基。 亲水基团可以是羟基或羧基。 光敏化合物对于短波长光束的光源具有高灵敏度，为了抗蚀剂应用，因此光敏化合物有利地用于形成高分辨率的图案。

公开(公告)号：US06310116B1

公开(公告)日：2001-10-30

申请号：US09157100

申请日：1998-09-18

申请人： Tokugen Yasuda ,  Hitoshi Inoue ,  Satsuki Kitajima ,  Masahiro Sato ,  Wu Yang ,  Ikuo Omura

发明人： Tokugen Yasuda ,  Hitoshi Inoue ,  Satsuki Kitajima ,  Masahiro Sato ,  Wu Yang ,  Ikuo Omura

IPC分类号： G02C704

CPC分类号： C08J5/00

摘要： A molded polymer article comprises a main molded body having on the surface thereof a hydrophilic polymer layer, the article being obtained by polymerizing both a monomer having a hydrophilic group and coated on the surface of a hydrophilic mold, and a polymerizable composition consisting essentially of a monomer and/or oligomer and placed in the mold. The hydrophilic polymer layer has excellent adhesiveness to the main body of the molded polymer article and excellent durability, so that the high hydrophilic property can be maintained, even when the article is exposed to external forces such as friction, over a long period of time. The molded articles are therefore useful as, in particular, contact lenses.

摘要翻译： 模制的聚合物制品包括在其表面上具有亲水性聚合物层的主要成型体，该制品通过聚合具有亲水基团的单体并涂覆在亲水性模具的表面上而获得，以及可聚合组合物，其基本上由 单体和/或低聚物并置于模具中。 亲水性聚合物层与模塑聚合物制品的主体具有优异的粘合性，并且具有优异的耐久性，即使当制品长时间暴露于诸如摩擦的外力时，也能保持高的亲水性。 因此，模塑制品可用作特别是隐形眼镜。

公开(公告)号：US09017476B2

公开(公告)日：2015-04-28

申请号：US13695979

申请日：2011-05-11

申请人： Masahiro Satoh ,  Satsuki Kitajima ,  Daisaku Shojo

发明人： Masahiro Satoh ,  Satsuki Kitajima ,  Daisaku Shojo

IPC分类号： C08K5/548 ,  C09D5/00 ,  C08K3/36 ,  C09K3/16 ,  C07F7/08 ,  C08G77/58 ,  C09D1/00 ,  C09K3/14 ,  C07F7/18

CPC分类号： C07F7/0838 ,  C07F7/1804 ,  C08G77/58 ,  C09D1/00 ,  C09K3/1463

摘要： Disclosed is a modified metal oxide sol that has a large hydrophilizing effect and antistatic effect, can be produced at low cost and is capable of being a coating. Specifically disclosed is a modified metal oxide sol characterized by modification by a functional group represented by formula (1) at 0.55-5.5 mmol per 1 g of metal oxide sol. MOS(═O)2—R1—Si(CH3)n(—O—)3-n (1) {In the formula, M is a hydrogen ion, C1-4 alkyl group, metal ion or ammonium (NR24) group; Rl is a C1-10 alkylene group (may have urethane bonds or urea bonds in the main alkylene chain); R2 may be the same or different and is a C1-5 alkyl group or a hydrogen atom; and n represents 0 or 1}.

摘要翻译： 公开了具有大的亲水化效果和抗静电效果的改性金属氧化物溶胶，可以低成本制造，能够进行涂布。 具体公开了一种改性金属氧化物溶胶，其特征在于用式（1）表示的官能团以每0.5克金属氧化物溶胶为0.55-5.5毫摩尔进行改性。 MOS（ΟO）2-R1-Si（CH3）n（-O-）3-n（1）{式中，M为氢离子，C1-4烷基，金属离子或铵（NR24） ; R1是C1-10亚烷基（主亚烷基链中可具有氨基甲酸酯键或脲键）; R2可以相同或不同，为C1-5烷基或氢原子; n表示0或1}。

公开(公告)号：US20130055927A1

公开(公告)日：2013-03-07

申请号：US13695979

申请日：2011-05-11

申请人： Masahiro Satoh ,  Satsuki Kitajima ,  Daisaku Shojo

发明人： Masahiro Satoh ,  Satsuki Kitajima ,  Daisaku Shojo

IPC分类号： C08K5/548 ,  C09D5/00

CPC分类号： C07F7/0838 ,  C07F7/1804 ,  C08G77/58 ,  C09D1/00 ,  C09K3/1463

摘要： Disclosed is a modified metal oxide sol that has a large hydrophilizing effect and antistatic effect, can be produced at low cost and is capable of being a coating. Specifically disclosed is a modified metal oxide sol characterized by modification by a functional group represented by formula (1) at 0.55-5.5 mmol per 1 g of metal oxide sol. MOS(═0)2—R1—Si(CH3)n(—O—)3-n (1) {In the formula, M is a hydrogen ion, C1-4 alkyl group, metal ion or ammonium (NR24) group; Rl is a C1-10 alkylene group (may have urethane bonds or urea bonds in the main alkylene chain); R2 may be the same or different and is a C1-5 alkyl group or a hydrogen atom; and n represents 0 or 1.}

摘要翻译： 公开了具有大的亲水化效果和抗静电效果的改性金属氧化物溶胶，可以低成本制造，能够进行涂布。 具体公开了一种改性金属氧化物溶胶，其特征在于用式（1）表示的官能团以每0.5克金属氧化物溶胶为0.55-5.5毫摩尔进行改性。 MOS（≡0）2-R1-Si（CH3）n（-O-）3-n（1）{式中，M为氢离子，C1-4烷基，金属离子或铵（NR24） ; R1是C1-10亚烷基（主亚烷基链中可具有氨基甲酸酯键或脲键）; R2可以相同或不同，为C1-5烷基或氢原子; n表示0或1.}

公开(公告)号：US06921623B2

公开(公告)日：2005-07-26

申请号：US10203032

申请日：2001-12-04

申请人： Makoto Hanabata ,  Masahiro Sato ,  Junko Katayama ,  Satsuki Kitajima

发明人： Makoto Hanabata ,  Masahiro Sato ,  Junko Katayama ,  Satsuki Kitajima

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03F7/004

CPC分类号： G03F7/0757 ,  G03F7/0382 ,  G03F7/0392

摘要： A photosensitive resin composition for using in combination with a photosensitizer comprises an active component selected from an active metal alkoxide represented by the formula (1) or a polycondensate thereof and a particle represented by the formula (2), (X)m-n-Mm-[(U1)p—(U2-Z)t]n  (1) P—[(Y)s—{(U1)p—(U2-Z)t}]k  (2) wherein, X shows a hydrogen, a halogen, an alkoxy group or an alkoxycarbonyl group, M shows a metal atom whose valence m is not less than 2, U1 shows a first connecting unit, U2 shows a second connecting unit and Z shows a group causing a difference in solubility by light exposure, P shows a fine particle carrier, Y shows a coupling residue, n shows an integer of not less than 1 and m>n, p shows 0 or 1, t shows 1 or 2, k shows an integer of not less than 1, and s shows 0 or 1). The unit (U1)p—(U2-Z)t is represented by the following formula: f(R1)q-(B)r]p-({(R2),,-(Ar)v}-Zlt (wherein, R1 and R2 show an alkylene or alkenylene group; and B shows an ester bond, an amide bond, a urea bond, a urethane bond, an imino group, a sulfur atom or a nitrogen atom; Ar represents an arylene or cycloalkylene group; each of the factors, q, r, a and v, shows 0 or 1, and q+r+u+vzl; and Z, p and t have the same meanings defined above).