公开(公告)号：US20070277732A1

公开(公告)日：2007-12-06

申请号：US10592556

申请日：2005-03-10

Applicant: Nobuo Yoneyama ,  Takashi Nakayama ,  Shiro Takigawa ,  Takao Umezawa ,  Motosuke Ishizawa ,  Hiroshi Takano

Inventor： Nobuo Yoneyama ,  Takashi Nakayama ,  Shiro Takigawa ,  Takao Umezawa ,  Motosuke Ishizawa ,  Hiroshi Takano

IPC: C23C14/00

CPC classification number: C23C14/34 ,  H01J37/32458 ,  H01J37/3435

Abstract: A film forming apparatus which can perform a film forming process to a base material while the base material is being mounted on a die for a molding process. The film forming apparatus is provided with a cylinder-shaped frame body (1h) having one end closed with a bottom part and the other end opened, a target (1a) arranged on an inner plane of the bottom part, and a port (3b) formed to penetrate a wall part of the frame body (1h).

Abstract translation: 一种成膜设备，其可以在将基材安装在用于模制过程的模具上的基材上进行成膜处理。 成膜装置具有：一端封闭的筒状框体（1h），另一端开口，另一端开放，设置在底部内面的靶（1a）和端部 （3b）形成为穿透框体（1h）的壁部。

公开(公告)号：US20070039545A1

公开(公告)日：2007-02-22

申请号：US10554901

申请日：2004-05-25

Applicant: Kouichi Nose ,  Koichi Sasagawa ,  Takeshi Furutsuka ,  Shiro Takigawa ,  Yasuhiro Koizumi

Inventor： Kouichi Nose ,  Koichi Sasagawa ,  Takeshi Furutsuka ,  Shiro Takigawa ,  Yasuhiro Koizumi

IPC: C23C14/00 ,  H05H1/24

CPC classification number: C23C14/205 ,  B05D1/62 ,  B05D5/068 ,  C23C14/0036 ,  C23C14/0089 ,  C23C14/352 ,  C23C14/562 ,  C23C16/45557 ,  C23C16/509

Abstract: The present invention provides film formation systems and film formation methods. A high frequency (HF) electric power supply (11) applies a high frequency voltage to a cathode (5) which is provided, at its rear surface, with a permanent magnet (10), thereby to generate a reactive-mode plasma, and film formation by plasma polymerization is performed by the use of the generated reactive-mode plasma. The pressure of a plasma source gas in a vacuum chamber (1) is regulated, thereby to generate not a reactive-mode plasma but a metallic-mode plasma. The cathode (5) as a target is subjected to sputtering by the generated metallic-mode plasma, and film formation by magnetron sputtering is carried out.

Abstract translation: 本发明提供成膜体系和成膜方法。 高频（HF）电源（11）向在其后表面设置有永磁体（10）的阴极（5）施加高频电压，从而产生电抗等离子体，并且 通过使用所生成的反应型等离子体来进行通过等离子体聚合的膜形成。 调节真空室（1）中的等离子体源气体的压力，从而不产生反应型等离子体而是产生金属模式等离子体。 作为靶的阴极（5）通过所产生的金属模式等离子体进行溅射，并且通过磁控溅射进行成膜。

公开(公告)号：US06831413B2

公开(公告)日：2004-12-14

申请号：US10196267

申请日：2002-07-17

Applicant: Hiroshi Kajiyama ,  Akira Katou ,  Kenichi Onisawa ,  Tetsuro Minemura ,  Kazuo Uetani ,  Yasushi Ihara ,  Shiro Takigawa ,  Kouichi Nose ,  Isao Tokomoto ,  Yasuhiro Koizumi

Inventor： Hiroshi Kajiyama ,  Akira Katou ,  Kenichi Onisawa ,  Tetsuro Minemura ,  Kazuo Uetani ,  Yasushi Ihara ,  Shiro Takigawa ,  Kouichi Nose ,  Isao Tokomoto ,  Yasuhiro Koizumi

IPC: H01J1749

CPC classification number: H01J11/40 ,  H01J11/12

Abstract: A plasma display panel (PDP), consisting of a front panel (10) equipped with display electrodes (8) and a rear panel (4) equipped with address electrodes (3), that displays an image by causing discharge in a small discharge space formed between the two panels; wherein there are provided two layers of protective films (5, 6), made of metallic oxide, covering the dielectric layer (7) installed on the front panel (10); the outer, upper layer (6) being formed into a layer of material with a specific surface area of 20 m2/g or more and a film thickness of 1 &mgr;m or less, exhibiting a high discharge characteristic; and the inner, lower layer (5) being formed into a layer of material with a specific surface area of 10 m2/g or less and a film thickness of 1 &mgr;m or more, exhibiting a low water-adsorption characteristic.

Abstract translation: 一种等离子体显示面板（PDP），其由配备有显示电极（8）的前面板（10）和配备有寻址电极（3）的后面板（4）组成，其通过在小放电空间中放电而显示图像 两面板之间形成; 其中，设置有两层由金属氧化物制成的覆盖安装在前面板（10）上的电介质层（7）的保护膜（5,6）。 所述外层上层（6）形成比表面积为20m 2 / g以上且膜厚为1μm以下且呈现高放电特性的材料层; 并且所述内下层（5）形成为具有10m 2 / g以下的比表面积和1μm以上的膜厚的材料层，具有低的吸水特性。

公开(公告)号：US06816134B2

公开(公告)日：2004-11-09

申请号：US10073099

申请日：2002-02-12

Applicant: Hiroshi Kajiyama ,  Akira Katou ,  Kenichi Onisawa ,  Tetsuro Minemura ,  Kazuo Uetani ,  Yasushi Ihara ,  Shiro Takigawa ,  Kouichi Nose ,  Isao Tokomoto ,  Yasuhiro Koizumi

Inventor： Hiroshi Kajiyama ,  Akira Katou ,  Kenichi Onisawa ,  Tetsuro Minemura ,  Kazuo Uetani ,  Yasushi Ihara ,  Shiro Takigawa ,  Kouichi Nose ,  Isao Tokomoto ,  Yasuhiro Koizumi

IPC: G09G328

CPC classification number: H01J11/40 ,  H01J11/12

Abstract: There is provided a plasma display panel (PDP), consisting of a front panel (10) equipped with display electrodes (8) and a rear panel (4) equipped with address electrodes (3), that displays an image by causing discharge in a small discharge space formed between the two panels; wherein there are provided two layers of protective films (5, 6), made of metallic oxide, covering the dielectric layer (7) installed on the front panel (10); the outer, upper layer (6) being formed into a layer of material with a specific surface area of 20 m2/g or more and a film thickness of 1 &mgr;m or less, exhibiting a high discharge characteristic; and the inner, lower layer (5) being formed into a layer of material with a specific surface area of 10 m2/g or less and a film thickness of 1 &mgr;m or more, exhibiting a low water-adsorption characteristic.