公开(公告)号：US5850083A

公开(公告)日：1998-12-15

申请号：US821303

申请日：1997-03-20

申请人： Souji Koikari ,  Shuichi Tamamushi ,  Shusuke Yoshitake ,  Munehiro Ogasawara

发明人： Souji Koikari ,  Shuichi Tamamushi ,  Shusuke Yoshitake ,  Munehiro Ogasawara

IPC分类号： H01L21/027 ,  H01J37/153 ,  H01J37/145

CPC分类号： H01J37/153 ,  H01J2237/3175

摘要： A charged particle beam lithograph apparatus of the present invention projects a charged particle beam onto a sample through a mask and lithographs a mask pattern on the sample through the movement of the charged particle beam. In order to focus the charged particle beam, the apparatus creates an electromagnetic field, from the magnetic lens, symmetric with respect to an optical axis of the charged particle beam. An aberration of the charged particle beam is created under the symmetric electromagnetic magnet. The aberration is compensated for under an electromagnetic field nonsymmetric with respect to the optical axis which is created by a deflection unit.

摘要翻译： 本发明的带电粒子束光刻设备通过掩模将带电粒子束投射到样品上，并通过带电粒子束的运动对样品上的掩模图案进行平版印刷。 为了聚焦带电粒子束，该装置从磁性透镜产生相对于带电粒子束的光轴对称的电磁场。 在对称电磁磁铁下产生带电粒子束的像差。 在由偏转单元产生的光轴不对称的电磁场下补偿像差。

公开(公告)号：US5894057A

公开(公告)日：1999-04-13

申请号：US887842

申请日：1997-07-03

申请人： Toshio Yamaguchi ,  Kazuto Matsuki ,  Shuichi Tamamushi ,  Souji Koikari ,  Eiji Murakami ,  Shigehiro Hara

发明人： Toshio Yamaguchi ,  Kazuto Matsuki ,  Shuichi Tamamushi ,  Souji Koikari ,  Eiji Murakami ,  Shigehiro Hara

IPC分类号： H01J37/305 ,  G03F7/20 ,  H01J37/302 ,  H01L21/027 ,  H01L21/302 ,  G03F9/00 ,  G03C5/00

CPC分类号： H01J37/3026 ,  G03F7/2065 ,  H01J2237/31764 ,  H01J2237/31767 ,  Y10S430/143

摘要： The present invention provides a charged beam drawing method comprising a first step of setting a stripe field independent of drawing pattern definition data and of determining the drawing pattern definition data which belongs to the stripe field set, a second step of setting a sub-field independent of the drawing pattern definition data and of determining the drawing pattern definition data which belongs to the sub-field, among the drawing pattern definition data determined, a third step of drawing the drawing pattern definition data which belongs to the sub-field onto an object to be subjected to drawing, a fourth step of shifting a position of the stripe field by a first predetermined value, and of shifting a position of the sub-field by a second predetermined value, and a fifth step of repeating the first to fourth steps for at least two times.

摘要翻译： 本发明提供了一种带电波束绘制方法，包括：第一步骤，设置与绘制图案定义数据无关的条带字段，并确定属于条带字段集的绘图模式定义数据;第二步，设置子场独立 并且在确定的绘图模式定义数据中确定属于该子场的绘图模式定义数据，以及将属于子场的绘图模式定义数据绘制到一个对象上的第三步骤 要进行绘制的第四步骤，将条纹域的位置移动第一预定值，并且将子场的位置移位第二预定值，第五步骤，重复第一至第四步骤 至少两次。

公开(公告)号：US06319642B1

公开(公告)日：2001-11-20

申请号：US09275186

申请日：1999-03-23

申请人： Shigehiro Hara ,  Eiji Murakami ,  Hitoshi Higurashi ,  Toshio Yamaguchi ,  Kazuto Matsuki ,  Souji Koikari ,  Shuichi Tamamushi ,  Kazuyuki Okuzono

发明人： Shigehiro Hara ,  Eiji Murakami ,  Hitoshi Higurashi ,  Toshio Yamaguchi ,  Kazuto Matsuki ,  Souji Koikari ,  Shuichi Tamamushi ,  Kazuyuki Okuzono

IPC分类号： G03F900

CPC分类号： G03F7/704 ,  H01J37/3026 ,  H01J2237/3175

摘要： A pattern lithography system for lithographing a pattern with reference to a pattern data by deflecting an electron beam includes a controller, an extracting unit, a dividing unit, and an expansion unit. The controller analyzes the pattern data and determines stripes of the pattern to be successively lithographed. The extracting unit extracts parts of the pattern data corresponding to stripes of the pattern in response to commands from the controller and sends the data to the dividing unit. The dividing unit divides the part of the pattern data into a plurality of sub-patterns. The sub-patterns are sized smaller than a minimum deflection range of the electron beam. The expanding unit expands the sub-patterns in accordance with a command from the controller to produce stripe data for driving a lithographing unit to lithograph the stripe. Stripes may have at least one sub-pattern in common such that multiple lithography is performed.

摘要翻译： 通过偏转电子束来参考图案数据对图案进行光刻的图案光刻系统包括控制器，提取单元，分割单元和扩展单元。 控制器分析图案数据，并确定要连续刻蚀的图案的条纹。 提取单元响应于来自控制器的命令提取对应于图案条纹的图案数据的部分，并将数据发送到分割单元。 分割单元将图案数据的一部分划分成多个子图案。 子图案的尺寸小于电子束的最小偏转范围。 扩展单元根据来自控制器的命令扩展子图案，以产生用于驱动光刻单元以对该条纹进行光刻的条带数据。 条纹可以具有共同的至少一个子图案，使得执行多次光刻。

公开(公告)号：US5912468A

公开(公告)日：1999-06-15

申请号：US841762

申请日：1997-04-28

申请人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

发明人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

IPC分类号： G21K5/04 ,  G01Q30/00 ,  G01Q70/02 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455

摘要： An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with high accuracy. According to the present invention, there is provided a charged particle beam exposure system comprising a holder for holding a substrate, a beam source for emitting a charged particle beam onto a surface of the substrate, beam scanning means for scanning the charged particle beam to draw a pattern on the surface of the substrate, a first electrical conductive block coming in electrical contact with a surface of a peripheral portion of the substrate, a first DC power supply unit for supplying an arbitrary voltage to the first electrical conductive block, a second electrical conductive block arranged to cover upside of the first electrical conductive block and upside of a peripheral portion along the periphery of the substrate, and to be electrically insulated from the substrate, and a second DC power supply unit for supplying the other arbitrary voltage to the second electrical conductive block.

摘要翻译： 本发明的目的是提供一种带电粒子曝光系统，其可以在将图案画到基板上时防止电子束在基板周围附近的轨道偏移，从而可以将 图案精度高。 根据本发明，提供了一种带电粒子束曝光系统，包括用于保持基板的保持器，用于将带电粒子束发射到基板的表面上的光束源;用于扫描带电粒子束以绘制的束扫描装置 衬底表面上的图案，与衬底的周边部分的表面电接触的第一导电块，用于向第一导电块提供任意电压的第一直流电源单元，第二电导体块 导电块，其布置成覆盖所述第一导电块的上侧和沿着所述衬底的周边的周边部分的上侧，并且与所述衬底电绝缘;以及第二DC电源单元，用于将所述另一任意电压提供给所述第二导电块 导电块。