公开(公告)号：US5912468A

公开(公告)日：1999-06-15

申请号：US841762

申请日：1997-04-28

申请人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

发明人： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

IPC分类号： G21K5/04 ,  G01Q30/00 ,  G01Q70/02 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455

摘要： An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with high accuracy. According to the present invention, there is provided a charged particle beam exposure system comprising a holder for holding a substrate, a beam source for emitting a charged particle beam onto a surface of the substrate, beam scanning means for scanning the charged particle beam to draw a pattern on the surface of the substrate, a first electrical conductive block coming in electrical contact with a surface of a peripheral portion of the substrate, a first DC power supply unit for supplying an arbitrary voltage to the first electrical conductive block, a second electrical conductive block arranged to cover upside of the first electrical conductive block and upside of a peripheral portion along the periphery of the substrate, and to be electrically insulated from the substrate, and a second DC power supply unit for supplying the other arbitrary voltage to the second electrical conductive block.

摘要翻译： 本发明的目的是提供一种带电粒子曝光系统，其可以在将图案画到基板上时防止电子束在基板周围附近的轨道偏移，从而可以将 图案精度高。 根据本发明，提供了一种带电粒子束曝光系统，包括用于保持基板的保持器，用于将带电粒子束发射到基板的表面上的光束源;用于扫描带电粒子束以绘制的束扫描装置 衬底表面上的图案，与衬底的周边部分的表面电接触的第一导电块，用于向第一导电块提供任意电压的第一直流电源单元，第二电导体块 导电块，其布置成覆盖所述第一导电块的上侧和沿着所述衬底的周边的周边部分的上侧，并且与所述衬底电绝缘;以及第二DC电源单元，用于将所述另一任意电压提供给所述第二导电块 导电块。

公开(公告)号：US06182369B2

公开(公告)日：2001-02-06

申请号：US09038038

申请日：1998-03-11

申请人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

发明人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

IPC分类号： G01B5004

CPC分类号： G03F7/70383 ,  G03F7/70433 ,  H01J37/3023 ,  H01J2237/30461 ,  H01J2237/31764

摘要： A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those respective areas into which a whole drawing section of the sample is divided, the drawing position being calculated by the position measuring unit at the respective area, and a drawing unit for drawing a pattern on the sample on the basis of the position of the sample base measured by the position measuring unit and drawing position of the respective area corrected by the correcting unit.

摘要翻译： 一种图案形成装置，包括用于将样本定位在基座上并移动样本的绘制位置的样本基座，用于测量样本基座的位置的位置测量单元，用于相互独立地校正各个区域的绘制位置的校正单元 样本的整个绘图部分被划分成，绘图位置由各个区域的位置测量单元计算，以及绘图单元，用于根据样本的位置根据由 位置测量单元和由校正单元校正的各个区域的绘图位置。

公开(公告)号：US5894057A

公开(公告)日：1999-04-13

申请号：US887842

申请日：1997-07-03

申请人： Toshio Yamaguchi ,  Kazuto Matsuki ,  Shuichi Tamamushi ,  Souji Koikari ,  Eiji Murakami ,  Shigehiro Hara

发明人： Toshio Yamaguchi ,  Kazuto Matsuki ,  Shuichi Tamamushi ,  Souji Koikari ,  Eiji Murakami ,  Shigehiro Hara

IPC分类号： H01J37/305 ,  G03F7/20 ,  H01J37/302 ,  H01L21/027 ,  H01L21/302 ,  G03F9/00 ,  G03C5/00

CPC分类号： H01J37/3026 ,  G03F7/2065 ,  H01J2237/31764 ,  H01J2237/31767 ,  Y10S430/143

摘要： The present invention provides a charged beam drawing method comprising a first step of setting a stripe field independent of drawing pattern definition data and of determining the drawing pattern definition data which belongs to the stripe field set, a second step of setting a sub-field independent of the drawing pattern definition data and of determining the drawing pattern definition data which belongs to the sub-field, among the drawing pattern definition data determined, a third step of drawing the drawing pattern definition data which belongs to the sub-field onto an object to be subjected to drawing, a fourth step of shifting a position of the stripe field by a first predetermined value, and of shifting a position of the sub-field by a second predetermined value, and a fifth step of repeating the first to fourth steps for at least two times.

摘要翻译： 本发明提供了一种带电波束绘制方法，包括：第一步骤，设置与绘制图案定义数据无关的条带字段，并确定属于条带字段集的绘图模式定义数据;第二步，设置子场独立 并且在确定的绘图模式定义数据中确定属于该子场的绘图模式定义数据，以及将属于子场的绘图模式定义数据绘制到一个对象上的第三步骤 要进行绘制的第四步骤，将条纹域的位置移动第一预定值，并且将子场的位置移位第二预定值，第五步骤，重复第一至第四步骤 至少两次。

公开(公告)号：US06319642B1

公开(公告)日：2001-11-20

申请号：US09275186

申请日：1999-03-23

申请人： Shigehiro Hara ,  Eiji Murakami ,  Hitoshi Higurashi ,  Toshio Yamaguchi ,  Kazuto Matsuki ,  Souji Koikari ,  Shuichi Tamamushi ,  Kazuyuki Okuzono

发明人： Shigehiro Hara ,  Eiji Murakami ,  Hitoshi Higurashi ,  Toshio Yamaguchi ,  Kazuto Matsuki ,  Souji Koikari ,  Shuichi Tamamushi ,  Kazuyuki Okuzono

IPC分类号： G03F900

CPC分类号： G03F7/704 ,  H01J37/3026 ,  H01J2237/3175

摘要： A pattern lithography system for lithographing a pattern with reference to a pattern data by deflecting an electron beam includes a controller, an extracting unit, a dividing unit, and an expansion unit. The controller analyzes the pattern data and determines stripes of the pattern to be successively lithographed. The extracting unit extracts parts of the pattern data corresponding to stripes of the pattern in response to commands from the controller and sends the data to the dividing unit. The dividing unit divides the part of the pattern data into a plurality of sub-patterns. The sub-patterns are sized smaller than a minimum deflection range of the electron beam. The expanding unit expands the sub-patterns in accordance with a command from the controller to produce stripe data for driving a lithographing unit to lithograph the stripe. Stripes may have at least one sub-pattern in common such that multiple lithography is performed.

摘要翻译： 通过偏转电子束来参考图案数据对图案进行光刻的图案光刻系统包括控制器，提取单元，分割单元和扩展单元。 控制器分析图案数据，并确定要连续刻蚀的图案的条纹。 提取单元响应于来自控制器的命令提取对应于图案条纹的图案数据的部分，并将数据发送到分割单元。 分割单元将图案数据的一部分划分成多个子图案。 子图案的尺寸小于电子束的最小偏转范围。 扩展单元根据来自控制器的命令扩展子图案，以产生用于驱动光刻单元以对该条纹进行光刻的条带数据。 条纹可以具有共同的至少一个子图案，使得执行多次光刻。

公开(公告)号：US20120081538A1

公开(公告)日：2012-04-05

申请号：US13242655

申请日：2011-09-23

申请人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

发明人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

IPC分类号： H04N7/18

CPC分类号： G01N21/956

摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

摘要翻译： 该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内， 自动对焦机构控制单元停止自动对焦机构。

公开(公告)号：US20070071042A1

公开(公告)日：2007-03-29

申请号：US11278637

申请日：2006-04-04

申请人： Kazuto Matsuki

发明人： Kazuto Matsuki

IPC分类号： H01S3/10 ,  H01S3/00

CPC分类号： G02F1/3525

摘要： A method of operating a laser light source including a wavelength conversion device in which two wavelength laser beams are input to a nonlinear crystal to output a sum frequency wavelength, according to an embodiment of the present invention, comprises: inputting only one wavelength laser beam of the two input wavelength laser beams to the nonlinear crystal; measuring scattered light intensity of the one wavelength laser beam by a light sensitive sensor installed on an optical axis of the sum frequency wavelength output beam; and judging a damage state of the nonlinear crystal based on a measurement value obtained by the intensity measurement by the light sensitive sensor.

摘要翻译： 根据本发明的实施例，一种操作包括其中两个波长激光束被输入到非线性晶体以输出和频波长的波长转换装置的激光源的方法包括：仅输入一个波长激光束 两个输入波长激光束到非线性晶体; 通过安装在和频波长输出光束的光轴上的光敏传感器测量一个波长激光束的散射光强度; 并且基于通过光敏传感器的强度测量获得的测量值来判断非线性晶体的损伤状态。

公开(公告)号：US20130222782A1

公开(公告)日：2013-08-29

申请号：US13600123

申请日：2012-08-30

申请人： Kentaro KASA ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

发明人： Kentaro KASA ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

IPC分类号： G03B27/58

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.

摘要翻译： 根据一个实施例，一种基板保持装置包括主单元和多个第一支撑单元。 主机具有主要表面。 主机具有板配置。 第一支撑单元设置在主表面上。 每个第一支撑单元包括能够通过抽吸来保持基板的吸持保持单元。 抽吸保持单元可沿垂直于主表面的第一方向和平行于主表面的第二方向移动。

公开(公告)号：US07539222B2

公开(公告)日：2009-05-26

申请号：US11278637

申请日：2006-04-04

申请人： Kazuto Matsuki

发明人： Kazuto Matsuki

IPC分类号： H01S3/10

CPC分类号： G02F1/3525

摘要： A method of operating a laser light source including a wavelength conversion device in which two wavelength laser beams are input to a nonlinear crystal to output a sum frequency wavelength, according to one embodiment includes inputting only one wavelength laser beam of the two input wavelength laser beams to the nonlinear crystal; measuring scattered light intensity of the one wavelength laser beam by a light sensitive sensor installed on an optical axis of the sum frequency wavelength output beam; and judging a damage state of the nonlinear crystal based on a measurement value obtained of the intensity measurement by the light sensitive sensor.

摘要翻译： 根据一个实施例的操作包括其中两个波长激光束被输入到非线性晶体以输出和频波长的波长转换装置的激光源的方法包括仅输入两个输入波长激光束的一个波长激光束 到非线性晶体; 通过安装在和频波长输出光束的光轴上的光敏传感器测量一个波长激光束的散射光强度; 以及基于由所述光敏传感器测量的强度测量值来判断所述非线性晶体的损伤状态。

公开(公告)号：US09188879B2

公开(公告)日：2015-11-17

申请号：US13600123

申请日：2012-08-30

申请人： Kentaro Kasa ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

发明人： Kentaro Kasa ,  Manabu Takakuwa ,  Ryoichi Inanami ,  Kazuto Matsuki ,  Tetsuro Nakasugi ,  Hiroshi Koizumi ,  Minoru Inomoto

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70783 ,  G03F7/707

摘要： According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.

摘要翻译： 根据一个实施例，一种基板保持装置包括主单元和多个第一支撑单元。 主机具有主要表面。 主机具有板配置。 第一支撑单元设置在主表面上。 每个第一支撑单元包括能够通过抽吸来保持基板的吸持保持单元。 抽吸保持单元可沿垂直于主表面的第一方向和平行于主表面的第二方向移动。

公开(公告)号：US07359043B2

公开(公告)日：2008-04-15

申请号：US10743830

申请日：2003-12-24

申请人： Hideo Tsuchiya ,  Yoshihide Kato ,  Kazuto Matsuki ,  Yasushi Sanada ,  Riki Ogawa ,  Takuro Nagao

发明人： Hideo Tsuchiya ,  Yoshihide Kato ,  Kazuto Matsuki ,  Yasushi Sanada ,  Riki Ogawa ,  Takuro Nagao

IPC分类号： G01N21/00 ,  G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.

摘要翻译： 一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案 使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定 存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同 成像装置。