公开(公告)号：US20120330047A1

公开(公告)日：2012-12-27

申请号：US13510207

申请日：2010-11-18

申请人： Seiji Shinkai ,  Shuichi Haraguchi ,  Tomohiro Shiraki ,  Masashi Ogawa ,  Shuhei Nakatani ,  Kei Sakanoue ,  Osamu Goto ,  Hidenobu Kakimoto

发明人： Seiji Shinkai ,  Shuichi Haraguchi ,  Tomohiro Shiraki ,  Masashi Ogawa ,  Shuhei Nakatani ,  Kei Sakanoue ,  Osamu Goto ,  Hidenobu Kakimoto

IPC分类号： C07F7/18

CPC分类号： G03F7/027 ,  C07F7/12 ,  C07F7/1804 ,  G03F7/0046 ,  G03F7/0755 ,  H01L51/0056 ,  H01L51/0095

摘要： A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency.

摘要翻译： 本发明的问题在于，通过光照射进行功能性薄膜的精细图案化，可以防止层下面的基底层被特性劣化的光照射，功能性薄膜的性能劣化。 用于解决问题的方法是通过光照射包含具有光敏性且可以被光二聚化的基团的化合物（A）和具有亲液性的基团和含有具有光敏性并可以被光二聚化的基团的化合物（B））而获得的化合物 和具有拒水性的组。

公开(公告)号：US09024053B2

公开(公告)日：2015-05-05

申请号：US13510207

申请日：2010-11-18

申请人： Seiji Shinkai ,  Shuichi Haraguchi ,  Tomohiro Shiraki ,  Masashi Ogawa ,  Shuhei Nakatani ,  Kei Sakanoue ,  Osamu Goto ,  Hidenobu Kakimoto

发明人： Seiji Shinkai ,  Shuichi Haraguchi ,  Tomohiro Shiraki ,  Masashi Ogawa ,  Shuhei Nakatani ,  Kei Sakanoue ,  Osamu Goto ,  Hidenobu Kakimoto

IPC分类号： C07F7/04 ,  G03F7/027 ,  C07F7/12 ,  C07F7/18 ,  G03F7/075 ,  H01L51/00 ,  G03F7/004

CPC分类号： G03F7/027 ,  C07F7/12 ,  C07F7/1804 ,  G03F7/0046 ,  G03F7/0755 ,  H01L51/0056 ,  H01L51/0095

摘要： A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency.

摘要翻译： 本发明的问题在于，通过光照射进行功能性薄膜的精细图案化，可以防止层下面的基底层被特性劣化的光照射，功能性薄膜的性能劣化。 用于解决问题的方法是通过光照射包含具有光敏性且可以被光二聚化的基团的化合物（A）和具有亲液性的基团和含有具有光敏性并可以被光二聚化的基团的化合物（B））而获得的化合物 和具有拒水性的组。

公开(公告)号：US08847211B2

公开(公告)日：2014-09-30

申请号：US13510178

申请日：2010-11-18

申请人： Seiji Shinkai ,  Shuichi Haraguchi ,  Tomohiro Shiraki ,  Masashi Ogawa ,  Shuhei Nakatani ,  Kei Sakanoue ,  Osamu Goto ,  Hidenobu Kakimoto

发明人： Seiji Shinkai ,  Shuichi Haraguchi ,  Tomohiro Shiraki ,  Masashi Ogawa ,  Shuhei Nakatani ,  Kei Sakanoue ,  Osamu Goto ,  Hidenobu Kakimoto

IPC分类号： H01L35/24

CPC分类号： H01L51/0512 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1011 ,  C09K2211/1029 ,  G03F7/0046 ,  H01L27/3246 ,  H01L51/0558 ,  H01L51/56 ,  H01L2227/323 ,  H05B33/10

摘要： A problem of the present invention is to provide a device having good characteristics and long life, wherein a functional thin film is formed in a desired region by a coating method; a thin film transistor; a method for producing the device; and a method for producing the thin film transistor. This problem can be solved by a device comprising: a substrate, a first electrode formed on the substrate, a functional thin film formed above the first electrode, and a second electrode disposed above the functional thin film, characterized by further comprising, in a region surrounding the region where the functional thin film is formed, a film containing a compound in which a group containing fluorine and a π-conjugated system are bound together by a cycloalkene structure or a cycloalkane structure.

摘要翻译： 本发明的一个问题是提供一种具有良好特性和长寿命的器件，其中通过涂覆方法在所需区域中形成功能性薄膜; 薄膜晶体管; 一种制造该装置的方法; 以及薄膜晶体管的制造方法。 这个问题可以通过一种器件来解决，该器件包括：衬底，形成在衬底上的第一电极，形成在第一电极上的功能性薄膜，以及设置在功能性薄膜上方的第二电极，其特征在于， 围绕形成功能性薄膜的区域，含有其中含氟基团和共轭体系的基团通过环烯烃结构或环烷烃结构结合在一起的化合物的膜。