公开(公告)号：US20110094994A1

公开(公告)日：2011-04-28

申请号：US12821609

申请日：2010-06-23

申请人： VALENTIN N. TODOROW ,  SAMER BANNA ,  ANKUR AGARWAL ,  ZHIGANG CHEN ,  TSE-CHIANG WANG ,  ANDREW NGUYEN ,  MARTIN JEFF SALINAS ,  SHAHID RAUF

发明人： VALENTIN N. TODOROW ,  SAMER BANNA ,  ANKUR AGARWAL ,  ZHIGANG CHEN ,  TSE-CHIANG WANG ,  ANDREW NGUYEN ,  MARTIN JEFF SALINAS ,  SHAHID RAUF

IPC分类号： C23F1/08 ,  C23F1/00

CPC分类号： H01J37/321 ,  B44C1/227 ,  C23C16/505 ,  H01J37/32165 ,  H01J37/3244

摘要： Methods and apparatus for plasma processing are provided herein. In some embodiments, a plasma processing apparatus includes a process chamber having an interior processing volume; a first RF coil disposed proximate the process chamber to couple RF energy into the processing volume; and a second RF coil disposed proximate the process chamber to couple RF energy into the processing volume, the second RF coil disposed coaxially with respect to the first RF coil, wherein the first and second RF coils are configured such that RF current flowing through the first RF coil is out of phase with RF current flowing through the RF second coil.

摘要翻译： 本文提供了等离子体处理的方法和装置。 在一些实施例中，等离子体处理装置包括具有内部处理量的处理室; 设置在处理室附近的将RF能量耦合到处理容积中的第一RF线圈; 以及设置在所述处理室附近以将RF能量耦合到所述处理容积中的第二RF线圈，所述第二RF线圈相对于所述第一RF线圈同轴设置，其中所述第一和第二RF线圈被配置为使得流过所述第一RF线圈的RF电流 RF线圈与RF电流流过RF第二线圈不同相。

公开(公告)号：US08492980B2

公开(公告)日：2013-07-23

申请号：US13090916

申请日：2011-04-20

申请人： Samer Banna ,  Valentin N. Todorow ,  Tse-Chiang Wang ,  Xing Lin

发明人： Samer Banna ,  Valentin N. Todorow ,  Tse-Chiang Wang ,  Xing Lin

IPC分类号： H05B31/26

CPC分类号： H01J37/32174 ,  H01J37/321 ,  H01J37/32926 ,  H01J37/3299

摘要： Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.

摘要翻译： 提供了用于校准施加到多个RF线圈的RF功率的方法。 在一些实施例中，一种校准施加到具有功率分配器的处理室的第一和第二RF线圈的RF功率的方法，以控制提供给第一RF线圈的第一幅度等于第二幅度的第一比率 提供给第二RF线圈的RF功率可以包括在功率分配器的设定值的范围内测量多个第一比值，将多个测量的第一比值与多个参考第一比较，并且调整实际值 所述功率分配器在给定设定点值处，使得给定设定点处的功率分配器的第一比例与相应的参考第一比率匹配到第一容限水平内。

公开(公告)号：US20120104950A1

公开(公告)日：2012-05-03

申请号：US13090916

申请日：2011-04-20

申请人： SAMER BANNA ,  VALENTIN N. TODOROW ,  TSE-CHIANG WANG ,  XING LIN

发明人： SAMER BANNA ,  VALENTIN N. TODOROW ,  TSE-CHIANG WANG ,  XING LIN

IPC分类号： H05B31/26

CPC分类号： H01J37/32174 ,  H01J37/321 ,  H01J37/32926 ,  H01J37/3299

摘要： Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.

摘要翻译： 提供了用于校准施加到多个RF线圈的RF功率的方法。 在一些实施例中，一种校准施加到具有功率分配器的处理室的第一和第二RF线圈的RF功率的方法，以控制提供给第一RF线圈的第一幅度等于第二幅度的第一比率 提供给第二RF线圈的RF功率可以包括在功率分配器的设定值的范围内测量多个第一比值，将多个测量的第一比值与多个参考第一比较，并且调整实际值 所述功率分配器在给定设定点值处，使得给定设定点处的功率分配器的第一比例与相应的参考第一比率匹配到第一容限水平内。

公开(公告)号：US20110097901A1

公开(公告)日：2011-04-28

申请号：US12821636

申请日：2010-06-23

申请人： SAMER BANNA ,  VALENTIN N. TODOROW ,  KENNETH S. COLLINS ,  ANDREW NGUYEN ,  MARTIN JEFF SALINAS ,  ZHIGANG CHEN ,  ANKUR AGARWAL ,  ANNIRUDDHA PAL ,  TSE-CHIANG WANG ,  SHAHID RAUF

发明人： SAMER BANNA ,  VALENTIN N. TODOROW ,  KENNETH S. COLLINS ,  ANDREW NGUYEN ,  MARTIN JEFF SALINAS ,  ZHIGANG CHEN ,  ANKUR AGARWAL ,  ANNIRUDDHA PAL ,  TSE-CHIANG WANG ,  SHAHID RAUF

IPC分类号： H01L21/465 ,  H01L21/46

CPC分类号： H01J37/32165 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32174

摘要： Embodiments of dual mode inductively coupled plasma reactors and methods of use of same are provided herein. In some embodiments, a dual mode inductively coupled plasma processing system may include a process chamber having a dielectric lid and a plasma source assembly disposed above the dielectric lid. The plasma source assembly includes a plurality of coils configured to inductively couple RF energy into the process chamber to form and maintain a plasma therein, a phase controller for adjusting the relative phase of the RF current applied to each coil in the plurality of coils, and an RF generator coupled to the phase controller and the plurality of coils.

摘要翻译： 本文提供了双模电感耦合等离子体反应器的实施例及其使用方法。 在一些实施例中，双模感应耦合等离子体处理系统可以包括具有电介质盖和设置在电介质盖上方的等离子体源组件的处理室。 等离子体源组件包括多个线圈，其被配置为将RF能量感应耦合到处理室中以在其中形成和维持等离子体;相位控制器，用于调节施加到多个线圈中的每个线圈的RF电流的相对相位;以及 耦合到所述相位控制器和所述多个线圈的RF发生器。