公开(公告)号：USD846315S1

公开(公告)日：2019-04-23

申请号：US29567404

申请日：2016-06-08

Applicant: Cheng-Tsung Lin

Designer： Cheng-Tsung Lin

公开(公告)号：US10040121B2

公开(公告)日：2018-08-07

申请号：US12777863

申请日：2010-05-11

Applicant: Wei-Hsun Hsu ,  Chi-Hsun Ho ,  Huei-Long Lee ,  Dyi-Nan Shong ,  Shun-Fa Chen ,  Tsung-Lin Yeh ,  Chiu-Lung Chu

Inventor： Wei-Hsun Hsu ,  Chi-Hsun Ho ,  Huei-Long Lee ,  Dyi-Nan Shong ,  Shun-Fa Chen ,  Tsung-Lin Yeh ,  Chiu-Lung Chu

IPC: C22C32/00 ,  B22F1/00 ,  B22F3/24 ,  C22C1/04 ,  H01M8/0206 ,  H01M8/0232 ,  H01M8/12

Abstract: A method for forming an interconnect of a solid oxide fuel cell includes the following steps. First of all, a powder mixture substantially including equal to or more than 90 wt % chromium powder, with the balance being iron powder and inevitable impurities, is provided. Then the powder mixture is pressurized by a pressing process with a pressure equal to or over 8 mt/cm2 to form a green interconnect with a density being equal to or over 90% of the theoretical density. Next the green interconnect is sintered by a sintering process to form an interconnect body. Finally, a protection process is performed on at least one surface of the interconnect body to form an interconnect.

公开(公告)号：US20160290883A1

公开(公告)日：2016-10-06

申请号：US15085592

申请日：2016-03-30

Applicant: Johannes Schumm ,  Andreas Reinhard ,  Thomas Kraehenbuehl ,  Stefan Thiele ,  Rene Hummel ,  Chung-Hsien Lin ,  Wang Shen Su ,  Tsung Lin Tang ,  Chia Min Lin

Inventor： Johannes Schumm ,  Andreas Reinhard ,  Thomas Kraehenbuehl ,  Stefan Thiele ,  Rene Hummel ,  Chung-Hsien Lin ,  Wang Shen Su ,  Tsung Lin Tang ,  Chia Min Lin

IPC: G01L9/00 ,  H01L29/84

CPC classification number: G01L9/0042 ,  B81B3/0089 ,  B81B2201/0264 ,  B81B2203/0315 ,  B81C1/00285 ,  G01L9/0045 ,  G01L9/0073 ,  H01L29/84

Abstract: A pressure sensor comprises a deformable membrane deflecting in response to pressure applied, a first stationary electrode, and a second electrode coupled to the deformable membrane, for determining a change in a capacitance between the first and the second electrode in response to the pressure applied. At least one of the first and the second electrode comprises a getter material for collecting gas molecules.

Abstract translation: 压力传感器包括响应于施加的压力而偏转的可变形膜，第一固定电极和耦合到可变形膜的第二电极，用于响应于施加的压力来确定第一和第二电极之间的电容变化。 第一和第二电极中的至少一个包括用于收集气体分子的吸气剂材料。

公开(公告)号：US09206917B2

公开(公告)日：2015-12-08

申请号：US14155228

申请日：2014-01-14

Applicant: Wen-Tsung Lin

Inventor： Wen-Tsung Lin

IPC: F16K11/00 ,  E03C1/04

CPC classification number: F16K19/006 ,  E03C1/04 ,  E03C1/0401 ,  E03C1/0403 ,  Y10T137/87579

Abstract: A water guiding duct positioning structure in a faucet valve base is disclosed, which may include a valve seat, at least two water guiding ducts, and a position limiting member, wherein a valve chamber is located at upper portion of the valve seat to receive a water control valve, and bottom portion of the valve seat is connected with two water inlet tubes and a water outlet tube, which have horizontal slits located at the outer periphery of the water inlet and outlet tubes for the position limiting member to plug in. The water guiding duct has a connector collar, which is installed with a water sealing ring and has at least one ring slot. The position limiting member has a horizontal holding plate, one end of which has a shoulder portion extending both sides from the holding plate.

Abstract translation: 公开了一种在水龙头阀座中的导水管定位结构，其可以包括阀座，至少两个导水管和位置限制构件，其中阀室位于阀座的上部以接收 水控制阀和阀座的底部与两个进水管和出水管连接，两个进水管和出水管具有位于进水口和出口管的外周边的水平狭缝，用于限位构件插入。 导水管具有连接器环，其安装有水封环并且具有至少一个环槽。 位置限制构件具有水平保持板，其一端具有从保持板两侧延伸的肩部。

公开(公告)号：US08946828B2

公开(公告)日：2015-02-03

申请号：US12702683

申请日：2010-02-09

Applicant: Sey-Ping Sun ,  Tsung-Lin Lee ,  Chin-Hsiang Lin ,  Chih-Hao Chang ,  Chen-Nan Yeh ,  Chao-An Jong

Inventor： Sey-Ping Sun ,  Tsung-Lin Lee ,  Chin-Hsiang Lin ,  Chih-Hao Chang ,  Chen-Nan Yeh ,  Chao-An Jong

IPC: H01L29/78 ,  H01L21/768 ,  H01L29/66

CPC classification number: H01L29/4232 ,  H01L21/76834 ,  H01L21/76849 ,  H01L21/76897 ,  H01L29/495 ,  H01L29/4966 ,  H01L29/66545 ,  H01L29/78

Abstract: A semiconductor device includes a semiconductor substrate; a gate stack overlying the substrate, a spacer formed on sidewalls of the gate stack, and a protection layer overlying the gate stack for filling at least a portion of a space surrounded by the spacer and the top surface of the gate stack. A top surface of the spacer is higher than a top surface of the gate stack.

Abstract translation: 半导体器件包括半导体衬底; 覆盖衬底的栅极堆叠，形成在栅极堆叠的侧壁上的间隔物，以及覆盖栅极堆叠的保护层，用于填充由间隔物和栅极堆叠的顶表面围绕的空间的至少一部分。 间隔件的顶表面高于栅极堆叠的顶表面。

公开(公告)号：US08941153B2

公开(公告)日：2015-01-27

申请号：US12871655

申请日：2010-08-30

Applicant: Tsung-Lin Lee ,  Chih Chieh Yeh ,  Chang-Yun Chang ,  Feng Yuan

Inventor： Tsung-Lin Lee ,  Chih Chieh Yeh ,  Chang-Yun Chang ,  Feng Yuan

IPC: H01L29/76 ,  H01L21/8234 ,  H01L27/088 ,  H01L29/66

CPC classification number: H01L21/823431 ,  H01L21/266 ,  H01L21/76224 ,  H01L21/823437 ,  H01L21/823481 ,  H01L27/0886 ,  H01L27/1104 ,  H01L27/1116 ,  H01L29/0649 ,  H01L29/41791 ,  H01L29/66795 ,  H01L29/785

Abstract: An integrated circuit structure includes a semiconductor substrate including a first portion in a first device region, and a second portion in a second device region. A first semiconductor fin is over the semiconductor substrate and has a first fin height. A second semiconductor fin is over the semiconductor substrate and has a second fin height. The first fin height is greater than the second fin height.

Abstract translation: 集成电路结构包括包括第一器件区域中的第一部分和第二器件区域中的第二部分的半导体衬底。 第一半导体鳍片在半导体衬底之上并且具有第一鳍片高度。 第二半导体鳍片在半导体衬底之上并且具有第二鳍片高度。 第一鳍高度大于第二翅片高度。

公开(公告)号：US08879220B2

公开(公告)日：2014-11-04

申请号：US13091106

申请日：2011-04-20

Applicant: Yuan-Tsung Lin ,  Te-Chang Wu

Inventor： Yuan-Tsung Lin ,  Te-Chang Wu

IPC: H02H9/00 ,  H02H9/04

CPC classification number: H02H9/046

Abstract: The present invention provides an electrostatic discharge (ESD) protection circuit including an ESD detection circuit and a plurality of power clamp circuits. The ESD detection circuit is electrically connected to a first high power line, a second high power line and at least one low power line, and is used to detect an ESD event occurring in the first high power line and another ESD event occurring in the second high power line. The ESD detection circuit includes a first trigger unit and a second trigger unit, electrically connected to the first high power line and the second high power line respectively. Each power clamp circuit has a trigger node, and the trigger nodes are electrically connected to the first trigger unit and the second trigger unit.

Abstract translation: 本发明提供一种包括ESD检测电路和多个功率钳位电路的静电放电（ESD）保护电路。 ESD检测电路电连接到第一高功率线路，第二高功率线路和至少一个低电力线路，并且用于检测在第一高功率线路中发生的ESD事件和在第二高电力线路中发生的另一ESD事件 大功率线。 ESD检测电路包括分别与第一高功率线路和第二高功率线路电连接的第一触发器单元和第二触发器单元。 每个功率钳位电路具有触发节点，并且触发节点电连接到第一触发单元和第二触发单元。

公开(公告)号：US08840079B2

公开(公告)日：2014-09-23

申请号：US13205977

申请日：2011-08-09

Applicant: Hsing-Tsung Lin ,  Lin-Hung Tsai

Inventor： Hsing-Tsung Lin ,  Lin-Hung Tsai

IPC: A47B91/00 ,  A47B95/00

CPC classification number: G03B21/145 ,  F16M7/00 ,  F16M11/046 ,  F16M11/12

Abstract: A projecting apparatus having an adjusting function includes a projector having an adjusting side; and an adjusting device disposed at the adjusting side and including a rotatable base pivoting on the projector, a moving mechanism disposed on the projector, a fixed mechanism comprising a fixed base, and a fixed component disposed on the fixed base, and an adjusting component connected to the fixed component and the moving mechanism. When the adjusting device is adjusted, the adjusting device drives the projector to rotate about an axial center of the rotatable base.

Abstract translation: 具有调节功能的投影设备包括具有调节侧的投影仪; 以及调节装置，其设置在所述调整侧并且包括在所述投影仪上枢转的可旋转基座，设置在所述投影仪上的移动机构，包括固定基座的固定机构和设置在所述固定基座上的固定部件， 到固定部件和移动机构。 当调节装置被调节时，调节装置驱动投影机围绕可旋转底座的轴向中心旋转。

公开(公告)号：US08796156B2

公开(公告)日：2014-08-05

申请号：US13343586

申请日：2012-01-04

Applicant: Ming-Feng Shieh ,  Tsung-Lin Lee ,  Chang-Yun Chang

Inventor： Ming-Feng Shieh ,  Tsung-Lin Lee ,  Chang-Yun Chang

IPC: H01L21/302

CPC classification number: H01L21/823431 ,  H01L21/845

Abstract: A method of forming an integrated circuit structure includes providing a semiconductor substrate; providing a first lithography mask, a second lithography mask, and a third lithography mask; forming a first mask layer over the semiconductor substrate, wherein a pattern of the first mask layer is defined using the first lithography mask; performing a first etch to the semiconductor substrate to define an active region using the first mask layer; forming a second mask layer having a plurality of mask strips over the semiconductor substrate and over the active region; forming a third mask layer over the second mask layer, wherein a middle portion of the plurality of mask strips is exposed through an opening in the third mask layer, and end portions of the plurality of mask strips are covered by the third mask layer; and performing a second etch to the semiconductor substrate through the opening.

Abstract translation: 形成集成电路结构的方法包括提供半导体衬底; 提供第一光刻掩模，第二光刻掩模和第三光刻掩模; 在所述半导体衬底上形成第一掩模层，其中使用所述第一光刻掩模限定所述第一掩模层的图案; 对所述半导体衬底执行第一蚀刻以使用所述第一掩模层限定有源区; 在所述半导体衬底上并在所述有源区上形成具有多个掩模条的第二掩模层; 在所述第二掩模层上形成第三掩模层，其中所述多个掩模条的中间部分通过所述第三掩模层中的开口露出，并且所述多个掩模条的端部被所述第三掩模层覆盖; 以及通过所述开口对所述半导体衬底进行第二蚀刻。

公开(公告)号：US20140166716A1

公开(公告)日：2014-06-19

申请号：US13917626

申请日：2013-06-13

Applicant: Tai-Cheng Tsai ,  Yung-Tsung Lin ,  Gwo-Jiun Sheu ,  Shou-Wen Hsu

Inventor： Tai-Cheng Tsai ,  Yung-Tsung Lin ,  Gwo-Jiun Sheu ,  Shou-Wen Hsu

IPC: B28D5/00

CPC classification number: B28D5/0023 ,  B28D5/0011 ,  Y10T225/371

Abstract: A splitting apparatus suitable to split a work piece along at least one cutting line formed on the work piece is provided. The splitting apparatus includes a chopper, a detector, a controller and an adjustor. The chopper is disposed above the work piece. The detector is disposed above the work piece for transmitting a signal to the work piece so as to get a specification data of the work piece. The controller connects the detector and receives the specification data and generates an adjustment data. The adjustor connects the controller and the chopper. The adjustor receives the adjustment data and adjusts a parameter data of the chopper according to the adjustment data so that the chopper splits the work piece for once along the cutting line formed on the work piece.

Abstract translation: 提供了适于沿着形成在工件上的至少一个切割线分割工件的分割装置。 分割装置包括斩波器，检测器，控制器和调节器。 切碎机位于工件上方。 检测器设置在工件上方，用于将信号传送到工件，以获得工件的规格数据。 控制器连接检测器并接收规格数据并生成调整数据。 调节器连接控制器和斩波器。 调整器接收调整数据并根据调整数据调整斩波器的参数数据，使得斩波器沿着形成在工件上的切割线分割工件一次。