Plasma Treatment and Plasma Enhanced Chemical Vapor Deposition onto Temperature Sensitive Biological Materials
    1.
    发明申请
    Plasma Treatment and Plasma Enhanced Chemical Vapor Deposition onto Temperature Sensitive Biological Materials 有权
    等离子体处理和等离子体增强化学气相沉积到温度敏感的生物材料上

    公开(公告)号:US20150079300A1

    公开(公告)日:2015-03-19

    申请号:US14553552

    申请日:2014-11-25

    摘要: A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.

    摘要翻译: 提供了一种用于在生物衬底上沉积膜的方法和装置。 等离子体产生装置包括电介质导管和高压电极。 将等离子体产生装置放置在生物基底附近,并且包括前体材料的气体供应被引导通过介电导管。 由高电压电极和生物体之间的电位差产生的电场使至少一部分气体供给离子化,并使等离子体从电介质导管发出并与生物基板接触。 等离子体引起前体材料的反应以形成沉积在生物基底上的膜。

    Plasma Treatment and Plasma Enhanced Chemical Vapor Deposition onto Temperature Sensitive Biological Materials
    2.
    发明申请
    Plasma Treatment and Plasma Enhanced Chemical Vapor Deposition onto Temperature Sensitive Biological Materials 审中-公开
    等离子体处理和等离子体增强化学气相沉积到温度敏感的生物材料上

    公开(公告)号:US20120259272A1

    公开(公告)日:2012-10-11

    申请号:US13440615

    申请日:2012-04-05

    IPC分类号: A61M37/00

    摘要: A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.

    摘要翻译: 提供了一种用于在生物衬底上沉积膜的方法和装置。 等离子体产生装置包括电介质导管和高压电极。 将等离子体产生装置放置在生物基板附近,并且包括前体材料的气体供应被引导通过介电导管。 由高电压电极和生物体之间的电位差产生的电场使至少一部分气体供给离子化,并使等离子体从电介质导管发出并与生物基板接触。 等离子体引起前体材料的反应以形成沉积在生物基底上的膜。

    METHODS AND SOLUTIONS FOR KILLING OR DEACTIVATING SPORES
    3.
    发明申请
    METHODS AND SOLUTIONS FOR KILLING OR DEACTIVATING SPORES 有权
    用于杀死或消除运动的方法和解决方案

    公开(公告)号:US20150265736A1

    公开(公告)日:2015-09-24

    申请号:US13843189

    申请日:2013-03-15

    摘要: Exemplary methods and systems for killing or deactivating spores include applying a fluid to a surface containing a spore; and applying direct or indirect plasma to the surface for a period of time. In some embodiments, the fluid includes water. In some embodiments, the spore is Clostridium difficile and in some is Bacillus Anthracis. In some embodiments, the fluid is in the form of a mist and in some is in the form of a vapor. In some embodiments, peroxynitrite is created in the fluid during the method. Another exemplary embodiment of killing or deactivating a spore includes treating spores with direct plasma or an indirect plasma for a period of time and applying an antimicrobial to the spores. In some embodiments, the antimicrobial is an alcohol, a bleach or an alcohol-based sanitizer.

    摘要翻译: 用于杀死或灭活孢子的示例性方法和系统包括将流体施加到包含孢子的表面; 并将直接或间接的等离子体施加到表面一段时间。 在一些实施例中,流体包括水。 在一些实施方案中,孢子是艰难梭菌,在一些实例中,是炭疽芽孢杆菌。 在一些实施方案中,流体为雾状,一些呈蒸气形式。 在一些实施方案中,在方法期间在流体中产生过氧亚硝酸盐。 杀死或灭活孢子的另一个示例性实施方案包括用直接等离子体或间接血浆处理孢子一段时间并对孢子施用抗微生物剂。 在一些实施方案中,抗微生物剂是醇,漂白剂或基于醇的消毒剂。

    Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials
    6.
    发明授权
    Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials 有权
    等离子体处理和等离子体增强化学气相沉积到温度敏感的生物材料上

    公开(公告)号:US08920361B2

    公开(公告)日:2014-12-30

    申请号:US13440615

    申请日:2012-04-05

    摘要: A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode. The plasma generation device is placed in proximity to the biological substrate and a gas supply that includes a precursor material is directed through the dielectric conduit. An electric field generated by the potential difference between the high voltage electrode and the biological substrate ionizes at least a portion of the gas supply and causes plasma to emanate from the dielectric conduit and contact the biological substrate. The plasma induces a reaction of the precursor material to form a film that is deposited on the biological substrate.

    摘要翻译: 提供了一种用于在生物衬底上沉积膜的方法和装置。 等离子体产生装置包括电介质导管和高压电极。 将等离子体产生装置放置在生物基板附近,并且包括前体材料的气体供应被引导通过介电导管。 由高电压电极和生物体之间的电位差产生的电场使至少一部分气体供给离子化,并使等离子体从电介质导管发出并与生物基板接触。 等离子体引起前体材料的反应以形成沉积在生物基底上的膜。