-
公开(公告)号:US20180258540A1
公开(公告)日:2018-09-13
申请号:US15994913
申请日:2018-05-31
发明人: Rodney Thomson
CPC分类号: C23G1/02 , C11D3/042 , C11D7/08 , C11D7/3272 , C11D11/0029 , C23F1/20 , C23F3/03 , C23G1/08
摘要: Novel acid-based chemistries that can be used in various cleaning, de-scaling, rust-removal, brightening, etching and other similar applications, including, but not limited to, those based upon hexafluorozirconic acid and other additives, such as urea in some applications, which are effective for a wide range of applications, while avoiding the health, safety and environmental issues that are often associated with the use of hydrochloric acid and other toxic chemistries.
-
2.
公开(公告)号:US08859476B2
公开(公告)日:2014-10-14
申请号:US13901911
申请日:2013-05-24
发明人: Rod Thomson
CPC分类号: C11D3/3454 , C11D3/0073 , C11D3/323 , C11D3/3409 , C11D7/3272 , C11D7/34
摘要: Compositions comprising an alkanesulfonic acid and an organic nitrogenous base, and related methods of use.
摘要翻译: 包含链烷磺酸和有机含氮碱的组合物及相关使用方法。
-
公开(公告)号:US10280521B2
公开(公告)日:2019-05-07
申请号:US15994913
申请日:2018-05-31
发明人: Rodney Thomson
摘要: Novel acid-based chemistries that can be used in various cleaning, de-scaling, rust-removal, brightening, etching and other similar applications, including, but not limited to, those based upon hexafluorozirconic acid and other additives, such as urea in some applications, which are effective for a wide range of applications, while avoiding the health, safety and environmental issues that are often associated with the use of hydrochloric acid and other toxic chemistries.
-
4.
公开(公告)号:US20130178405A1
公开(公告)日:2013-07-11
申请号:US13783966
申请日:2013-03-04
发明人: Rod Thomson
IPC分类号: C11D3/04
CPC分类号: C11D3/046 , C11D3/042 , C11D3/323 , C11D7/08 , C11D7/3272 , C11D11/0023 , C11D11/0029
摘要: Tetrafluoroboric acid and an organic nitrogenous base, related compounds and compositions, as can be used in conjunction with various methods of cleaning and/or the treatment of substrate surfaces.
摘要翻译: 四氟硼酸和有机氮碱,相关化合物和组合物,可以与各种清洁和/或处理底物表面的方法结合使用。
-
公开(公告)号:US10329674B2
公开(公告)日:2019-06-25
申请号:US15828142
申请日:2017-11-30
申请人: Win Chemicals, Ltd., a Canadian corporation , Vitech International, Inc., a Delaware corporation
发明人: Rodney Thomson
IPC分类号: C11D7/10 , C23G1/02 , C11D7/32 , C11D7/08 , C11D3/04 , C11D11/00 , C23F1/20 , C23F3/03 , C23G1/08
摘要: Novel acid-based chemistries that can be used in various cleaning, de-scaling, rust-removal, brightening, etching and other similar applications, including, but not limited to, those based upon hexafluorozirconic acid and other additives, such as urea in some applications, which are effective for a wide range of applications, while avoiding the health, safety and environmental issues that are often associated with the use of hydrochloric acid and other toxic chemistries.
-
公开(公告)号:US20180155841A1
公开(公告)日:2018-06-07
申请号:US15828142
申请日:2017-11-30
申请人: Win Chemicals, Ltd., a Canadian corporation , Vitech International, Inc., a Delaware corporation
发明人: Rodney Thomson
CPC分类号: C23G1/02 , C11D3/042 , C11D7/08 , C11D7/3272 , C11D11/0029 , C23F1/20 , C23F3/03 , C23G1/08
摘要: Novel acid-based chemistries that can be used in various cleaning, de-scaling, rust-removal, brightening, etching and other similar applications, including, but not limited to, those based upon hexafluorozirconic acid and other additives, such as urea in some applications, which are effective for a wide range of applications, while avoiding the health, safety and environmental issues that are often associated with the use of hydrochloric acid and other toxic chemistries.
-
公开(公告)号:US20190323131A1
公开(公告)日:2019-10-24
申请号:US16449236
申请日:2019-06-21
发明人: Rodney Thomson
摘要: Novel acid-based chemistries that can be used in various cleaning, de-scaling, rust-removal, brightening, etching and other similar applications, including, but not limited to, those based upon hexafluorozirconic acid and other additives, such as urea in some applications, which are effective for a wide range of applications, while avoiding the health, safety and environmental issues that are often associated with the use of hydrochloric acid and other toxic chemistries.
-
8.
公开(公告)号:US08796195B2
公开(公告)日:2014-08-05
申请号:US13783966
申请日:2013-03-04
发明人: Rod Thomson
CPC分类号: C11D3/046 , C11D3/042 , C11D3/323 , C11D7/08 , C11D7/3272 , C11D11/0023 , C11D11/0029
摘要: Tetrafluoroboric acid and an organic nitrogenous base, related compounds and compositions, as can be used in conjunction with various methods of cleaning and/or the treatment of substrate surfaces.
摘要翻译: 四氟硼酸和有机氮碱,相关化合物和组合物,可以与各种清洁和/或处理底物表面的方法结合使用。
-
-
-
-
-
-
-