Coating and developing apparatus
    1.
    发明授权
    Coating and developing apparatus 有权
    涂装显影装置

    公开(公告)号:US08369977B2

    公开(公告)日:2013-02-05

    申请号:US12654692

    申请日:2009-12-29

    申请人: Wataru Tsukinoki

    发明人: Wataru Tsukinoki

    IPC分类号: G06F19/00

    CPC分类号: H01L21/67769 H01L21/67276

    摘要: A coating and developing apparatus includes: a delivery mounting unit on which a carrier housing a plurality of substrates is to be mounted and the carrier being accessed by a delivery mechanism; a plurality of retreat mounting units on which the carriers are to be mounted; a carrier carry mechanism moving and mounting the carriers between the retreat mounting units and the delivery mounting unit; a collection schedule creating function determining a collection order for collecting the substrates placed in modules into original carriers in which the substrates were housed, when a trouble occurs; and a carry control unit controlling to carry the substrates to the carriers in which the substrates were housed according to the determined collection order.

    摘要翻译: 涂覆和显影装置包括:输送安装单元,其上安装有容纳多个基板的载体并且载体由输送机构进入; 多个后退安装单元,其上将安装所述载体; 载体承载机构,在所述后退安装单元和所述输送安装单元之间移动和安装所述载体; 收集时间表创建功能,当发生故障时,确定用于将放置在模块中的基板收集到其中容纳基板的原始载体中的收集顺序; 以及进位控制单元,其根据确定的收集顺序控制将基板输送到其中容纳基板的载体。

    SUBSTRATE PROCESSING APPARATUS
    2.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工设备

    公开(公告)号:US20100212585A1

    公开(公告)日:2010-08-26

    申请号:US12712255

    申请日:2010-02-25

    申请人: Wataru Tsukinoki

    发明人: Wataru Tsukinoki

    IPC分类号: B05C13/00 H01L21/677

    CPC分类号: H01L21/67781 H01L21/67775

    摘要: Disclosed is a substrate processing apparatus for rapidly supplying a substrate from a carrier to a processing block. The carrier of which a wafer has been taken out is transferred from a wafer loading-in unit to an arrangement unit for retraction, a new carrier receiving a non-processed wafer is transferred to the wafer loading-in unit, a substrate holding unit for holding one hundred wafers in a shelf form is prepared when the wafer is supplied from the new carrier to a processing block, five wafers are collectively transferred by a second substrate transfer unit from the carrier to the substrate holding unit by a first substrate transfer unit, and then the wafers are transferred from the substrate holding unit to the processing block one by one. Five wafers are transferred to the substrate holding unit at a time, but the wafers are taken out of the substrate holding unit one by one. Accordingly, it is possible to rapidly supply the wafer without interruption in supplying the wafer to the processing block.

    摘要翻译: 公开了一种用于将基板从载体快速供给到处理块的基板处理装置。 已经取出晶片的载体从晶片加载单元传送到用于回缩的布置单元,接收未处理晶片的新载体被转移到晶片加载单元,用于 当将晶片从新载体供给到处理块时,准备搁置一百个晶片,通过第一基板传送单元将五个晶片通过第二基板传送单元从载体共同转移到基板保持单元, 然后将晶片从基板保持单元逐个转移到处理块。 一次将五个晶片转移到基板保持单元,但是晶片从基板保持单元一个一个地取出。 因此,可以在将晶片供给处理块时不间断地快速供应晶片。

    Substrate treatment method and substrate treatment system
    3.
    发明授权
    Substrate treatment method and substrate treatment system 有权
    底物处理方法和底物处理系统

    公开(公告)号:US08731701B2

    公开(公告)日:2014-05-20

    申请号:US12733614

    申请日:2008-08-21

    CPC分类号: H01L21/67745 H01L21/67276

    摘要: After a cassette is mounted on a cassette mounting part, a control unit instructs a substrate treatment apparatus to start treatment on substrates in the cassette. Thereafter, the control unit indicates, to the substrate treatment apparatus, a cassette on the cassette mounting part to which a substrate is transferred at completion of the treatment. If the transfer destination cassette for the substrate at the completion of treatment has not been indicated when a number of remaining treatment steps for the substrate reaches a predetermined set number, an alarm is given from the substrate treatment apparatus. This alarm is sent from the substrate treatment apparatus to the control unit, and the control unit indicates a transfer destination cassette for the substrate.

    摘要翻译: 在盒式磁带安装在盒安装部件上之后,控制单元指示基板处理设备开始对盒中的基板进行处理。 此后,控制单元在处理完成时向基板处理设备指示在盒安装部分上传送基板的盒。 如果当基板的剩余处理步骤数达到预定的设定数量时,在处理完成时用于基板的转印目的地盒未被指示,则从基板处理装置发出报警。 该报警从基板处理装置发送到控制单元,控制单元指示用于基板的转印目的地盒。

    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
    4.
    发明申请
    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD 有权
    基板加工系统和基板加工方法

    公开(公告)号:US20110292356A1

    公开(公告)日:2011-12-01

    申请号:US13114103

    申请日:2011-05-24

    IPC分类号: G03B27/52

    摘要: Provided is a substrate processing system including a group controller which determines a combination of processing apparatuses having the shortest total processing time including the processing end time in a final processing apparatus, determines a predictable elapsed time up to a processing start time by a predetermined downstream processing apparatus for a wafer lot from a processing end time of the wafer lot by a predetermined processing apparatus in the combination of the processing apparatuses, and determines a timing of discharging the substrate to the predetermined processing apparatus or an upstream processing apparatus of the predetermined processing apparatus so that the predictable elapsed time is set within a predetermined time when the predictable elapsed time exceeds the predetermined time.

    摘要翻译: 提供了一种基板处理系统,其包括:组控制器,其确定在最终处理装置中包括处理结束时间的具有最短总处理时间的处理装置的组合,通过预定的下游处理确定直到处理开始时间的可预测经过时间 在处理装置的组合中,通过预定的处理装置从晶片块的处理结束时间开始的晶片批次装置,并且确定将基板排出到预定处理装置或预定处理装置的上游处理装置的定时 使得可预测的经过时间设定在可预测的经过时间超过预定时间的预定时间内。

    Substrate processing system and substrate processing method
    5.
    发明授权
    Substrate processing system and substrate processing method 有权
    基板加工系统和基板加工方法

    公开(公告)号:US08909364B2

    公开(公告)日:2014-12-09

    申请号:US13114103

    申请日:2011-05-24

    IPC分类号: H01L21/67 H01L21/677

    摘要: Provided is a substrate processing system including a group controller which determines a combination of processing apparatuses having the shortest total processing time including the processing end time in a final processing apparatus, determines a predictable elapsed time up to a processing start time by a predetermined downstream processing apparatus for a wafer lot from a processing end time of the wafer lot by a predetermined processing apparatus in the combination of the processing apparatuses, and determines a timing of discharging the substrate to the predetermined processing apparatus or an upstream processing apparatus of the predetermined processing apparatus so that the predictable elapsed time is set within a predetermined time when the predictable elapsed time exceeds the predetermined time.

    摘要翻译: 提供了一种基板处理系统,其包括:组控制器,其确定在最终处理装置中包括处理结束时间的具有最短总处理时间的处理装置的组合,通过预定的下游处理确定直到处理开始时间的可预测经过时间 在处理装置的组合中,通过预定的处理装置从晶片块的处理结束时间开始的晶片批次装置,并且确定将基板排出到预定处理装置或预定处理装置的上游处理装置的定时 使得可预测的经过时间设定在可预测的经过时间超过预定时间的预定时间内。

    SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM
    6.
    发明申请
    SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM 有权
    基板处理方法和基板处理系统

    公开(公告)号:US20100203434A1

    公开(公告)日:2010-08-12

    申请号:US12733614

    申请日:2008-08-21

    IPC分类号: G03F7/20 G03B27/42

    CPC分类号: H01L21/67745 H01L21/67276

    摘要: After a cassette is mounted on a cassette mounting part, a control unit instructs a substrate treatment apparatus to start treatment on substrates in the cassette. Thereafter, the control unit indicates, to the substrate treatment apparatus, a cassette on the cassette mounting part to which a substrate is transferred at completion of the treatment. If the transfer destination cassette for the substrate at the completion of treatment has not been indicated when a number of remaining treatment steps for the substrate reaches a predetermined set number, an alarm is given from the substrate treatment apparatus. This alarm is sent from the substrate treatment apparatus to the control unit, and the control unit indicates a transfer destination cassette for the substrate.

    摘要翻译: 在盒式磁带安装在盒安装部件上之后,控制单元指示基板处理设备开始对盒中的基板进行处理。 此后,控制单元在处理完成时向基板处理设备指示在盒安装部分上传送基板的盒。 如果当基板的剩余处理步骤数达到预定的设定数量时,在处理完成时用于基板的转印目的地盒未被指示,则从基板处理装置发出报警。 该报警从基板处理装置发送到控制单元,控制单元指示用于基板的转印目的地盒。

    Substrate treatment apparatus
    7.
    发明授权
    Substrate treatment apparatus 有权
    基板处理装置

    公开(公告)号:US08219233B2

    公开(公告)日:2012-07-10

    申请号:US12656123

    申请日:2010-01-19

    申请人: Wataru Tsukinoki

    发明人: Wataru Tsukinoki

    IPC分类号: G06F19/00 H01L21/677

    摘要: The invention controls a carrier moving and mounting device such that at normal time, the device moves and mounts carriers in sequence to a delivery mounting units according to a carry-in order, and when a priority carrier is carried into the carry-in mounting unit and if all of the delivery mounting units are occupied by the carriers, the device moves and mounts one of the carriers on the retreat mounting unit, and mounts the priority carrier on the delivery mounting unit which has become vacant by the movement; and controls a delivery device such that at normal time, the delivery device carries the substrates out of the carriers according to the carry-in order of the carriers mounted on the delivery mounting units, and when the priority carrier is mounted, the delivery device carries out the substrates in the priority carrier before the substrates in the other carriers.

    摘要翻译: 本发明控制载体移动和安装装置,使得装置在正常时间根据携带顺序依次移动和安装载体到输送安装单元,并且当优先载体运送到携带安装单元 并且如果所有输送安装单元被托架占用,则装置将其中一个托架移动并安装在后退安装单元上,并且将优先托架安装在运动中已经空出的输送安装单元上; 并且控制输送装置,使得在通常的时候,输送装置根据安装在输送安装单元上的载体的顺序将基板输出托架,并且当优先托盘安装时,输送装置携带 在其他载体中的基板之前的优先载体中的基板。

    Substrate treatment apparatus
    8.
    发明申请
    Substrate treatment apparatus 有权
    基板处理装置

    公开(公告)号:US20100204821A1

    公开(公告)日:2010-08-12

    申请号:US12656123

    申请日:2010-01-19

    申请人: Wataru Tsukinoki

    发明人: Wataru Tsukinoki

    IPC分类号: H01L21/677

    摘要: The invention controls a carrier moving and mounting device such that at normal time, the device moves and mounts carriers in sequence to a delivery mounting units according to a carry-in order, and when a priority carrier is carried into the carry-in mounting unit and if all of the delivery mounting units are occupied by the carriers, the device moves and mounts one of the carriers on the retreat mounting unit, and mounts the priority carrier on the delivery mounting unit which has become vacant by the movement; and controls a delivery device such that at normal time, the delivery device carries the substrates out of the carriers according to the carry-in order of the carriers mounted on the delivery mounting units, and when the priority carrier is mounted, the delivery device carries out the substrates in the priority carrier before the substrates in the other carriers.

    摘要翻译: 本发明控制载体移动和安装装置,使得装置在正常时间根据携带顺序依次移动和安装载体到输送安装单元,并且当优先载体运送到携带安装单元 并且如果所有输送安装单元被托架占用,则装置将其中一个托架移动并安装在后退安装单元上,并且将优先托架安装在运动中已经空出的输送安装单元上; 并且控制输送装置,使得在通常的时候,输送装置根据安装在输送安装单元上的载体的顺序将基板输出托架,并且当优先托盘安装时,输送装置携带 在其他载体中的基板之前的优先载体中的基板。

    Substrate treatment apparatus
    9.
    发明授权
    Substrate treatment apparatus 有权
    基板处理装置

    公开(公告)号:US08043039B2

    公开(公告)日:2011-10-25

    申请号:US12207809

    申请日:2008-09-10

    IPC分类号: H01L21/677

    摘要: A substrate treatment apparatus is disclosed. The substrate treatment apparatus includes: a cassette loading portion on which a cassette for containing a substrate is loaded when the cassette is carried to/from outside of the substrate treatment apparatus; a substrate treatment portion for performing a treatment on the substrate; a substrate carrying portion for carrying the substrate in the cassette loaded on the cassette loading portion to the substrate treatment portion, and carrying the substrate that has been subjected to the treatment by the substrate treatment portion to the cassette on the cassette loading portion; a vacant cassette loading portion on which the cassette caused to be vacant by carrying the substrate to the substrate treatment portion is temporarily loaded; and a vacant cassette transfer mechanism for transferring the vacant cassette between the vacant cassette loading portion and the cassette loading portion.

    摘要翻译: 公开了一种基板处理装置。 所述基板处理装置包括:盒装载部,当将所述盒搬运到所述基板处理装置的外部时,装载用于容纳基板的盒; 用于对所述基板进行处理的基板处理部; 用于将装载在所述盒装载部分上的所述盒中的所述基板运送到所述基板处理部分的基板承载部分,以及将已经被所述基板处理部分处理的所述基板运送到所述盒装载部分上的所述盒; 临时装载通过将基板运送到基板处理部而使盒空置的空置盒装载部; 以及用于在空的盒装载部分和盒装载部分之间传送空盒的空的盒传送机构。

    Coating and developing apparatus
    10.
    发明申请
    Coating and developing apparatus 有权
    涂装显影装置

    公开(公告)号:US20100191362A1

    公开(公告)日:2010-07-29

    申请号:US12654692

    申请日:2009-12-29

    申请人: Wataru Tsukinoki

    发明人: Wataru Tsukinoki

    IPC分类号: G05D3/00

    CPC分类号: H01L21/67769 H01L21/67276

    摘要: A coating and developing apparatus includes: a delivery mounting unit on which a carrier housing a plurality of substrates is to be mounted and the carrier being accessed by a delivery mechanism; a plurality of retreat mounting units on which the carriers are to be mounted; a carrier carry mechanism moving and mounting the carriers between the retreat mounting units and the delivery mounting unit; a collection schedule creating function determining a collection order for collecting the substrates placed in modules into original carriers in which the substrates were housed, when a trouble occurs; and a carry control unit controlling to carry the substrates to the carriers in which the substrates were housed according to the determined collection order.

    摘要翻译: 涂覆和显影装置包括:输送安装单元,其上安装有容纳多个基板的载体并且载体由输送机构进入; 多个后退安装单元,其上将安装所述载体; 载体承载机构,在所述后退安装单元和所述输送安装单元之间移动和安装所述载体; 收集时间表创建功能,当发生故障时,确定用于将放置在模块中的基板收集到其中容纳基板的原始载体中的收集顺序; 以及进位控制单元,其根据确定的收集顺序控制将基板输送到其中容纳基板的载体。