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14 条记录 (耗时 0.018 秒)

    Mosaic quantification by birefringence measurement
    2.
    发明授权
    Mosaic quantification by birefringence measurement 有权
    双折射测量的马赛克定量

    公开(公告)号：US07626700B2

    公开(公告)日：2009-12-01

    申请号：US11591810

    申请日：2006-11-02

    申请人： William Rogers Rosch ,  Horst Schreiber

    发明人： William Rogers Rosch ,  Horst Schreiber

    IPC分类号： G01J4/00

    CPC分类号： G01N21/23

    摘要： A crystal optical material is illuminated at a wavelength of light that does not ionize the crystal optical material. Birefringence is measured between a plurality of voxels within the crystal optical material having spatial dimensions small enough to distinguish optical propagations of the light encountering boundary regions between subgrains of the crystal mosaic from optical propagations of the light through the subgrains themselves. The measured birefringence is evaluated for quantifying a characteristic of the crystal matrix. Metrics describing the crystal matrix are associated with performance of the crystal optical material.

    摘要翻译： 在没有离子化晶体光学材料的光的波长下照射晶体光学材料。 在具有足够小的空间尺寸的晶体光学材料中的多个体素之间测量双折射，以区分晶体镶嵌的子晶粒与光的光学传播通过亚晶粒本身之间的遇光边界区域的光学传播。 评估测量的双折射以量化晶体矩阵的特性。 描述晶体矩阵的度量与晶体光学材料的性能相关。

    Sub-aperture deterministric finishing of high aspect ratio glass products
    3.
    发明申请
    Sub-aperture deterministric finishing of high aspect ratio glass products 审中-公开
    高宽比玻璃制品的子孔径决定整理

    公开(公告)号：US20080125014A1

    公开(公告)日：2008-05-29

    申请号：US11605640

    申请日：2006-11-29

    申请人： William Rogers Rosch ,  Robert Sabia

    发明人： William Rogers Rosch ,  Robert Sabia

    IPC分类号： B24B49/12 ,  B24B51/00 ,  G02F1/00

    CPC分类号： B24B37/04 ,  G03F1/60 ,  G03F7/70791

    摘要： The invention is directed to large LCD image masks having a final flatness of less than 40 nm and a method of making such LCD image masks by utilizing subaperture deterministic grinding/lapping/polishing. In one preferred embodiment the final flatness is

    摘要翻译： 本发明涉及具有小于40nm的最终平坦度的大型LCD图像掩模和通过利用子孔径确定性研磨/研磨/研磨来制造这种LCD图像掩模的方法。 在一个优选实施例中，最终平坦度为<20μm。 在另一个中，最终平坦度<10nm。 LCD图像掩模的长度和宽度各自独立于大于400mm，厚度小于20mm。 在至少一个优选实施例中，ICD图像掩模的长度和宽度各自独立地大于100mm，厚度<15mm。 玻璃LCD图像掩模可以是适用于LCD图像掩模的任何玻璃材料。 本发明的方法可以与所有这样的眼镜一起使用。 示例性LCD图像掩模玻璃包括熔融二氧化硅，高纯度熔融石英和含有5-10重量份的二氧化硅 - 二氧化钛。 二氧化钛。

    Three pressure hydrogen loading cycle for fused silica
    4.
    发明授权
    Three pressure hydrogen loading cycle for fused silica 有权

    公开(公告)号：US08404605B2

    公开(公告)日：2013-03-26

    申请号：US12080952

    申请日：2008-04-08

    申请人： William Rogers Rosch

    发明人： William Rogers Rosch

    IPC分类号： C01C1/00

    CPC分类号： C03B19/12 ,  C03B19/1453 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/21 ,  Y10T428/249954

    摘要： A method of loading at least one fused silica article with hydrogen. At least one fused silica article is first loaded with an amount of hydrogen so that the hydrogen concentration at the center of the article exceeds a minimum concentration upon completion of loading. An amount of hydrogen is the removed from the fused silica article so that the fused silica article has an average hydrogen concentration that is less than the maximum average concentration limit. The surface region of the fused silica article is then reloaded to ensure that the hydrogen concentration throughout the article is within a predetermined pressure range. A fused silica article comprising hydrogen is also described.

    REDUCED STRIAE LOW EXPANSION GLASS AND ELEMENTS, AND A METHOD FOR MAKING SAME
    7.
    发明申请
    REDUCED STRIAE LOW EXPANSION GLASS AND ELEMENTS, AND A METHOD FOR MAKING SAME 审中-公开
    减少的低膨胀玻璃和元素，以及制造它们的方法

    公开(公告)号：US20100154474A1

    公开(公告)日：2010-06-24

    申请号：US12688218

    申请日：2010-01-15

    申请人： Lorrie Foley Beall ,  John Edward Maxon ,  William Rogers Rosch ,  Robert Sabia

    发明人： Lorrie Foley Beall ,  John Edward Maxon ,  William Rogers Rosch ,  Robert Sabia

    IPC分类号： C03B19/06 ,  C03B19/00

    CPC分类号： C03B19/1453 ,  C03B2201/42 ,  C03C3/06 ,  C03C2203/40 ,  C03C2203/44

    摘要： The invention is directed to a method for reducing striae in ultra-low expansion glass, for example, silica-titania glass, by heat-treating the glass at temperatures above 1600° C. for a time in the range of 72-288 hours. The silica-titania glass is formed by substantially simultaneously forming, collecting and consolidating a silica-titania soot formed in one or a plurality of burners using silicon-containing feedstock and a titanium-containing feedstock. In one embodiment of the invention the glass is heat treated without forcing the glass to flow or “move”. The invention was found to reduce the magnitude of striae in an ultra-low expansion glass by at least 50%, and particularly reduces most of the “higher frequency” striae.

    摘要翻译： 本发明涉及通过在高于1600℃的温度下将玻璃热处理72-88小时的时间，来减少超低膨胀玻璃（例如二氧化硅 - 二氧化钛玻璃）中的条纹的方法。 二氧化硅 - 二氧化钛玻璃通过使用含硅原料和含钛原料基本上同时形成，收集和固结形成在一个或多个燃烧器中的二氧化硅 - 二氧化钛烟炱而形成。 在本发明的一个实施例中，玻璃被热处理而不强迫玻璃流动或“移动”。 发现本发明能够将超低膨胀玻璃中的条纹幅度减小至少50％，特别是减少大部分“较高频率”的条纹。

    Mosaic quantification by birefringence measurement
    9.
    发明申请
    Mosaic quantification by birefringence measurement 有权
    双折射测量的马赛克定量

    公开(公告)号：US20080123077A1

    公开(公告)日：2008-05-29

    申请号：US11591810

    申请日：2006-11-02

    申请人： William Rogers Rosch ,  Horst Schreiber

    发明人： William Rogers Rosch ,  Horst Schreiber

    IPC分类号： G01N21/23

    CPC分类号： G01N21/23

    摘要： A crystal optical material is illuminated at a wavelength of light that does not ionize the crystal optical material. Birefringence is measured between a plurality of voxels within the crystal optical material having spatial dimensions small enough to distinguish optical propagations of the light encountering boundary regions between subgrains of the crystal mosaic from optical propagations of the light through the subgrains themselves. The measured birefringence is evaluated for quantifying a characteristic of the crystal matrix. Metrics describing the crystal matrix are associated with performance of the crystal optical material.

    摘要翻译： 在没有离子化晶体光学材料的光的波长下照射晶体光学材料。 在具有足够小的空间尺寸的晶体光学材料中的多个体素之间测量双折射，以区分晶体镶嵌的子晶粒与光的光学传播通过亚晶粒本身之间的遇光边界区域的光学传播。 评估测量的双折射以量化晶体矩阵的特性。 描述晶体矩阵的度量与晶体光学材料的性能相关。

    METHOD OF PRODUCING CONSTANCY OF COMPRESSIVE STRESS IN GLASS IN AN ION-EXCHANGE PROCESS
    10.
    发明申请
    METHOD OF PRODUCING CONSTANCY OF COMPRESSIVE STRESS IN GLASS IN AN ION-EXCHANGE PROCESS 审中-公开
    在离子交换过程中生产玻璃中压缩应力的常数的方法

    公开(公告)号：US20120216569A1

    公开(公告)日：2012-08-30

    申请号：US13034118

    申请日：2011-02-24

    申请人： Douglas Clippinger Allan ,  Kenneth Edward Hrdina ,  William Rogers Rosch

    发明人： Douglas Clippinger Allan ,  Kenneth Edward Hrdina ,  William Rogers Rosch

    IPC分类号： C03C21/00

    CPC分类号： C03C21/002

    摘要： The present disclosure is directed to a method for producing constancy of the ion-exchanged product stress profile through adjustment of ion-exchange conditions by taking account of the influence of salt bath poisoning on the bath's useful lifetime. The present disclosure is directed to a method of ion-exchange in which the salt bath temperature and salt bath time are adjusted as a function of the amount of alkali metal ions that exchange in the bath. That is, temperature and time are adjusted as a function of salt bath poisoning. Temperature is set to its highest value and time to its shortest value in the starting unpoisoned salt bath, those values chosen to hit target values of surface compressive stress and exchange depth of layer. Temperature is then reduced and time lengthened as salt bath poisoning proceeds, those changes chosen to maintain the same surface compressive stress and exchange depth of layer.

    摘要翻译： 本公开涉及通过考虑盐浴中毒对浴的使用寿命的影响来调节离子交换条件来产生离子交换产物应力分布的恒定性的方法。 本公开涉及一种离子交换方法，其中盐浴温度和盐浴时间作为在浴中交换的碱金属离子的量的函数来调节。 也就是说，温度和时间被调整为盐浴中毒的功能。 在起始未经处理的盐浴中将温度设定为其最小值和时间到其最短值，这些值被选择以达到表面压应力的目标值和层的交换深度。 随着盐浴中毒的进行，温度降低，时间延长，这些变化被选择为保持相同的表面压应力和层的交换深度。