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公开(公告)号：US09097990B2
公开(公告)日：2015-08-04
申请号：US13403706
申请日：2012-02-23
申请人： Jan-Gerard Cornelis Van Der Toorn , Marcel Koenraad Marie Baggen , Stefan Geerte Kruijswijk , Jeroen Pieter Starreveld , Michael Johannes Vervoordeldonk , Mark Constant Johannes Baggen
发明人： Jan-Gerard Cornelis Van Der Toorn , Marcel Koenraad Marie Baggen , Stefan Geerte Kruijswijk , Jeroen Pieter Starreveld , Michael Johannes Vervoordeldonk , Mark Constant Johannes Baggen
CPC分类号： G03F7/70716 , G03F7/709
摘要： A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.
摘要翻译： 舞台系统包括构造成保持物体的物体表，构造成在第一运动范围上移动物体台的短行程致动器元件，以及长行程致动器元件，构造成在短行程致动器元件的第二范围 大于第一运动范围的运动。 舞台系统还包括气动补偿装置，其包括：传感器，布置成测量代表短行程致动器元件上的气动扰动力的量;致动器，被布置成提供补偿力以至少部分地补偿气动扰动;以及 控制器。 传感器连接到控制器的控制器输入端，致动器连接到控制器的控制器输出端，该控制器被布置成响应于从传感器接收到的信号来驱动致动器。
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2.发明授权公开(公告)号：US07250237B2
公开(公告)日：2007-07-31
申请号：US10743272
申请日：2003-12-23
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations.Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。
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公开(公告)号：US09715171B2
公开(公告)日：2017-07-25
申请号：US12964459
申请日：2010-12-09
申请人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
发明人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
IPC分类号： B29C59/02 , G03F7/00 , F16F15/03 , F16F9/53 , F16F15/00 , F16F15/027 , B82Y10/00 , B82Y40/00 , B29C43/02
CPC分类号： G03F7/0002 , B29C2043/025 , B82Y10/00 , B82Y40/00 , F16F9/535 , F16F15/002 , F16F15/0275 , F16F15/03
摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.
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公开(公告)号：US20110163477A1
公开(公告)日：2011-07-07
申请号：US12964459
申请日：2010-12-09
申请人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
发明人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C2043/025 , B82Y10/00 , B82Y40/00 , F16F9/535 , F16F15/002 , F16F15/0275 , F16F15/03
摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.
摘要翻译： 压印光刻设备包括致动器，其构造成使压印模板保持器相对于衬底保持器移位以执行压印处理。 压印模板保持器和/或衬底保持器被支撑在支撑结构上，支撑结构安装到安装到设备的基座上的隔振系统。 隔振系统构造成提供支撑结构相对于底座的隔振。 控制单元构造成在压印过程中控制致动器。 控制单元布置成控制隔振系统的可调节构件，以在至少部分压印过程中调节隔振系统的动态特性，以便减少支撑结构相对于底座的位移，这是由于 在压印过程中施加在支撑结构上的力。
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公开(公告)号：US20120242271A1
公开(公告)日：2012-09-27
申请号：US13403706
申请日：2012-02-23
申请人： Jan-Gerard Cornelis VAN DER TOORN , Marcel Koenraad Marie BAGGEN , Stefan Geerte KRUIJSWIJK , Jeroen Pieter STARREVELD , Michael Johannes Vervoordeldonk , Mark Constant Johannes BAGGEN
发明人： Jan-Gerard Cornelis VAN DER TOORN , Marcel Koenraad Marie BAGGEN , Stefan Geerte KRUIJSWIJK , Jeroen Pieter STARREVELD , Michael Johannes Vervoordeldonk , Mark Constant Johannes BAGGEN
CPC分类号： G03F7/70716 , G03F7/709
摘要： A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.
摘要翻译： 舞台系统包括构造成保持物体的物体表，构造成在第一运动范围上移动物体台的短行程致动器元件，以及长行程致动器元件，构造成在短行程致动器元件的第二范围 大于第一运动范围的运动。 舞台系统还包括气动补偿装置，其包括：传感器，布置成测量代表短行程致动器元件上的气动扰动力的量;致动器，被布置成提供补偿力以至少部分地补偿气动扰动;以及 控制器。 传感器连接到控制器的控制器输入端，致动器连接到控制器的控制器输出端，该控制器被布置成响应于从传感器接收到的信号来驱动致动器。
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公开(公告)号：US08184266B2
公开(公告)日：2012-05-22
申请号：US12393369
申请日：2009-02-26
CPC分类号： G03F7/709 , G03F7/70758
摘要： A lithographic apparatus includes an illumination system, a support, a substrate table, a projection system, and an actuator. The illumination system is configured to condition a radiation beam. The support is constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The substrate table is constructed to hold a substrate. The projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The actuator is constructed and arranged to exert a force on a part of the lithographic apparatus via an elongated structure. The elongated structure is provided with a vibration damper constructed and arranged to damp vibrations in the elongated structure.
摘要翻译： 光刻设备包括照明系统，支撑件，衬底台，投影系统和致动器。 照明系统被配置为调节辐射束。 支撑件被构造成支撑图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 致动器构造和布置成经由细长结构对光刻设备的一部分施加力。 细长结构设置有一个阻尼器，其被构造和布置成阻尼细长结构中的振动。
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公开(公告)号：US20090246703A1
公开(公告)日：2009-10-01
申请号：US12393369
申请日：2009-02-26
CPC分类号： G03F7/709 , G03F7/70758
摘要： A lithographic apparatus includes an illumination system, a support, a substrate table, a projection system, and an actuator. The illumination system is configured to condition a radiation beam. The support is constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The substrate table is constructed to hold a substrate. The projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The actuator is constructed and arranged to exert a force on a part of the lithographic apparatus via an elongated structure. The elongated structure is provided with a vibration damper constructed and arranged to damp vibrations in the elongated structure.
摘要翻译： 光刻设备包括照明系统，支撑件，衬底台，投影系统和致动器。 照明系统被配置为调节辐射束。 支撑件被构造成支撑图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 致动器构造和布置成经由细长结构对光刻设备的一部分施加力。 细长结构设置有一个阻尼器，其被构造和布置成阻尼细长结构中的振动。
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8.发明授权公开(公告)号：US07595496B2
公开(公告)日：2009-09-29
申请号：US11812801
申请日：2007-06-21
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
IPC分类号： G21K5/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。
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