Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereon
    1.
    发明授权
    Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereon 有权
    精加工方法,精细加工装置以及记录有精加工程序的记录介质

    公开(公告)号:US08691123B2

    公开(公告)日:2014-04-08

    申请号:US13204844

    申请日:2011-08-08

    IPC分类号: B29C43/58

    摘要: According to one embodiment, a fine processing method includes determining a resist amount required for each first region of a pattern formation surface and a total amount of resist. The method include dividing the total amount of resist by a volume of one resist drop to determine the resist drops total number. The method include determining a provisional position for the resist drop of the total number. The method include assigning the each first region to nearest one resist drop, and partitioning again the pattern formation surface into second regions assigned to the each resist drop. The method include determining a divided value by dividing the volume of the one resist drop by the required total amount of resist determined. The method include finalizing a final position of the each resist drop, if a distribution of the divided value in the pattern formation surface falls within a target range.

    摘要翻译: 根据一个实施例,精细处理方法包括确定图案形成表面的每个第一区域和抗蚀剂总量所需的抗蚀剂量。 该方法包括将抗蚀剂的总量除以一个抗蚀剂滴的体积以确定抗蚀剂滴数总数。 该方法包括确定总数的抗蚀剂落下的临时位置。 该方法包括将每个第一区域分配给最接近的一个抗蚀剂层,以及再次将图案形成表面分割成分配给每个抗蚀剂层的第二区域。 该方法包括通过将一个抗蚀剂液滴的体积除以所需的抗蚀剂总量确定分割值。 如果图案形成表面中的分割值的分布落在目标范围内,则该方法包括确定每个抗蚀剂液滴的最终位置。

    POLISHING PAD, METHOD OF POLISHING AND POLISHING APPARATUS
    3.
    发明申请
    POLISHING PAD, METHOD OF POLISHING AND POLISHING APPARATUS 审中-公开
    抛光垫,抛光和抛光装置的方法

    公开(公告)号:US20070224920A1

    公开(公告)日:2007-09-27

    申请号:US11691566

    申请日:2007-03-27

    IPC分类号: B24B7/30 B24B1/00

    CPC分类号: B24B37/26

    摘要: A polishing pad according to the invention comprises a pad body having a polishing surface and a support surface and a plurality of hole apertures extending from the polishing surface to the support surface, each of the plurality of apertures having a noncircular shaped opening oriented at a predetermined angle with respect to a radial direction of the polishing pad.

    摘要翻译: 根据本发明的抛光垫包括具有抛光表面和支撑表面的垫体,以及从抛光表面延伸到支撑表面的多个孔孔,多个孔中的每一个具有以预定的方向取向的非圆形形状的开口 相对于抛光垫的径向的角度。

    Liquid crystal display panel and method for manufacturing same, and liquid crystal display device
    6.
    发明授权
    Liquid crystal display panel and method for manufacturing same, and liquid crystal display device 失效
    液晶显示面板及其制造方法以及液晶显示装置

    公开(公告)号:US08284372B2

    公开(公告)日:2012-10-09

    申请号:US12123861

    申请日:2008-05-20

    IPC分类号: G02F1/1339

    CPC分类号: G02F1/13394

    摘要: A liquid crystal display panel includes: a pair of substrates; a cylindrical spacer configured to hold a gap between the pair of substrates, and a liquid crystal which fills the gap. The cylindrical spacer includes a first support portion having a first support surface and a second support portion having a second support surface. The first support portion is provided inside the second support surface so that the first support surface is projected from the second support surface. The second support portion is provided on a major surface of one of the substrates the second support surface from the major surface.

    摘要翻译: 液晶显示面板包括:一对基板; 被配置为保持所述一对基板之间的间隙的圆柱形间隔件和填充所述间隙的液晶。 圆柱形间隔件包括具有第一支撑表面的第一支撑部分和具有第二支撑表面的第二支撑部分。 第一支撑部分设置在第二支撑表面内部,使得第一支撑表面从第二支撑表面突出。 第二支撑部分在主要表面的第二支撑表面的一个基板的主表面上提供。

    Dresser, polishing apparatus and method for producing an article
    10.
    发明授权
    Dresser, polishing apparatus and method for producing an article 失效
    修整器,抛光装置和制造物品的方法

    公开(公告)号:US06640795B1

    公开(公告)日:2003-11-04

    申请号:US09671263

    申请日:2000-09-28

    IPC分类号: B24B5353

    摘要: A polishing apparatus comprise a lower surface plate rotatably provided and having a polishing surface for polishing an object, and an upper surface plate for pressing the object against the lower surface plate, wherein the polishing surface can be dressed by a dresser comprising a dressing member approachable to and separable from the polishing surface, the dressing member having a dressing surface to be brought into contact with the polishing surface, the dressing surface being shaped as a hollow oval.

    摘要翻译: 抛光装置包括可旋转地设置并具有用于抛光物体的抛光表面的下表面板和用于将物体压靠在下表面板上的上表面板,其中抛光表面可以由修整器修整,该修整器包括可接近的修整构件 并且可以与抛光表面分离,修整构件具有与抛光表面接触的修整表面,修整表面成形为中空椭圆形。