摘要:
According to one embodiment, a fine processing method includes determining a resist amount required for each first region of a pattern formation surface and a total amount of resist. The method include dividing the total amount of resist by a volume of one resist drop to determine the resist drops total number. The method include determining a provisional position for the resist drop of the total number. The method include assigning the each first region to nearest one resist drop, and partitioning again the pattern formation surface into second regions assigned to the each resist drop. The method include determining a divided value by dividing the volume of the one resist drop by the required total amount of resist determined. The method include finalizing a final position of the each resist drop, if a distribution of the divided value in the pattern formation surface falls within a target range.
摘要:
According to an aspect of the invention, there is provided, a gas diffusion layer, including, base materials integrated being including in the gas diffusion layer configured in an air electrode, wettability of a surface of each base material changing in an integrated direction.
摘要:
A polishing pad according to the invention comprises a pad body having a polishing surface and a support surface and a plurality of hole apertures extending from the polishing surface to the support surface, each of the plurality of apertures having a noncircular shaped opening oriented at a predetermined angle with respect to a radial direction of the polishing pad.
摘要:
Conductive layers have at least a portion of a conductive member arranged in a nonlinear or polygonal configuration and having a greater layout area and an insulating layer is alternately stacked relative to the conductive layer, wherein a variation in amount of the conductive member at the conductive layer with a middle of a board thickness direction as a reference is set in a range in which a warp is less likely to be produced and in a range near to zero.
摘要:
A method of adjusting a fuel distribution includes: adjusting a distribution of a fuel supply amount to a membrane electrode assembly so that a temperature distribution in the membrane electrode assembly becomes substantially uniform by a membrane provided in a fuel supply side of the membrane electrode assembly of a fuel cell. A membrane adjusts a fuel distribution, which is provided in a fuel supply side of a membrane electrode assembly of a fuel cell. The membrane is provided with openings so that a temperature distribution in the membrane electrode assembly becomes substantially uniform.
摘要:
A liquid crystal display panel includes: a pair of substrates; a cylindrical spacer configured to hold a gap between the pair of substrates, and a liquid crystal which fills the gap. The cylindrical spacer includes a first support portion having a first support surface and a second support portion having a second support surface. The first support portion is provided inside the second support surface so that the first support surface is projected from the second support surface. The second support portion is provided on a major surface of one of the substrates the second support surface from the major surface.
摘要:
The angle of each collimator plate with respect to an X-ray focal point is determined by fitting the collimator plate in grooves formed in upper and lower supports each having an integral structure. In addition, the warpage of each collimator plate is corrected and its flatness is maintained by fitting the periphery of the collimator plate which is on the X-ray detector side in a corresponding groove of an abutment plate provided on the X-ray detection surface side of the upper and lower supports. Furthermore, each collimator plate is supported by the corresponding grooves of the upper and lower supports and the corresponding groove of the abutment plate at least three sides.
摘要:
A gas diffusion layer to be provided on an air electrode of a fuel cell, the gas diffusion layer includes: a portion to be at a relatively high temperature; and a portion to be at a relatively low temperature. Gas permeability of the portion to be at a relatively high temperature is different from gas permeability of the portion to be at a relatively low temperature.
摘要:
A polishing apparatus. The polishing apparatus has an abrasive cloth and a table to rotate the abrasive cloth. A holder holds a subject to be polished against the abrasive cloth. A discharger discharges a polishing solution from the abrasive cloth after the polishing solution passes between the abrasive cloth and the subject.
摘要:
A polishing apparatus comprise a lower surface plate rotatably provided and having a polishing surface for polishing an object, and an upper surface plate for pressing the object against the lower surface plate, wherein the polishing surface can be dressed by a dresser comprising a dressing member approachable to and separable from the polishing surface, the dressing member having a dressing surface to be brought into contact with the polishing surface, the dressing surface being shaped as a hollow oval.