公开(公告)号：US20070229337A1

公开(公告)日：2007-10-04

申请号：US11692409

申请日：2007-03-28

Applicant: Yoshimasa Sanmiya ,  Akira Noma

Inventor： Yoshimasa Sanmiya ,  Akira Noma

IPC: H03M1/66

CPC classification number: H03M1/1071 ,  H03M1/66

Abstract: A charged particle beam apparatus includes a plurality of digital-analog (DA) converter units configured to input digital signals, convert the digital signals into analog values, and amplify the analog values to output the analog values, a deflector configured to input at least one analog value of the plurality of analog values output from the plurality of DA converter units to deflect a charged particle beam, and a judging unit configured to judge that at least one of the plurality of DA converter units is abnormal by using the plurality of analog values output from the plurality of DA converter units.

Abstract translation: 带电粒子束装置包括多个数字模拟（DA）转换器单元，其被配置为输入数字信号，将数字信号转换为模拟值，并放大模拟值以输出模拟值;偏转器，被配置为输入至少一个 从所述多个DA转换器单元输出的多个模拟值的模拟值，以偏转带电粒子束;以及判断单元，被配置为通过使用所述多个模拟值来判断所述多个DA转换器单元中的至少一个是异常的 从多个DA转换器单元输出。

公开(公告)号：US20110012617A1

公开(公告)日：2011-01-20

申请号：US12504428

申请日：2009-07-16

Applicant: Yoshikuni GOSHIMA ,  Seiichi Tsuchiya ,  Yoshimasa Sanmiya ,  John William Kay ,  Chising Lai

Inventor： Yoshikuni GOSHIMA ,  Seiichi Tsuchiya ,  Yoshimasa Sanmiya ,  John William Kay ,  Chising Lai

IPC: H01H31/02

CPC classification number: H03M1/109 ,  G03F1/78 ,  H01J2237/1518 ,  H01J2237/2485 ,  H01J2237/3175 ,  H03M1/66

Abstract: A digital-to-analog converter (DAC)/amplifier testing system for use in an electron-beam (e-beam) mask writer, the e-beam mask writer including a plurality of DAC/amplifier circuits to output analog voltage signals, each DAC/amplifier circuit having a first output terminal and a second output terminal, the first output terminals of the plurality of DAC/amplifier circuits being respectively coupled to deflection plates of the e-beam mask writer to provide the output analog voltages as deflection voltages, is provided. The testing system including a summation circuit to sum voltage signals and to output a summation signal indicating the sum of the received analog voltage signals and an analyzer circuit to digitize the summation signal and to detect to compare the digitized summation signal with an error tolerance range to detect whether at least one of the DAC/amplifier circuits is experiencing an operating error.

Abstract translation: 一种用于电子束（电子束）掩模写入器的数模转换器（DAC）/放大器测试系统，电子束掩模写入器包括多个DAC /放大器电路以输出模拟电压信号，每个 DAC /放大器电路具有第一输出端和第二输出端，多个DAC /放大器电路的第一输出端分别耦合到电子束掩模写入器的偏转板，以提供输出模拟电压作为偏转电压， 被提供。 该测试系统包括一个求和电路，用于求和电压信号，并输出一个表示所接收的模拟电压信号和分析电路之和的求和信号，以对加和信号进行数字化，并检测以将数字化求和信号与误差容差范围进行比较 检测至少一个DAC /放大器电路是否正在经历操作错误。

公开(公告)号：US07898447B2

公开(公告)日：2011-03-01

申请号：US12504428

申请日：2009-07-16

Applicant: Yoshikuni Goshima ,  Seiichi Tsuchiya ,  Yoshimasa Sanmiya ,  John William Kay ,  Chising Lai

Inventor： Yoshikuni Goshima ,  Seiichi Tsuchiya ,  Yoshimasa Sanmiya ,  John William Kay ,  Chising Lai

IPC: H03M1/10

CPC classification number: H03M1/109 ,  G03F1/78 ,  H01J2237/1518 ,  H01J2237/2485 ,  H01J2237/3175 ,  H03M1/66

Abstract: A digital-to-analog converter (DAC)/amplifier testing system for use in an electron-beam (e-beam) mask writer, the e-beam mask writer including a plurality of DAC/amplifier circuits to output analog voltage signals, each DAC/amplifier circuit having a first output terminal and a second output terminal, the first output terminals of the plurality of DAC/amplifier circuits being respectively coupled to deflection plates of the e-beam mask writer to provide the output analog voltages as deflection voltages, is provided. The testing system including a summation circuit to sum voltage signals and to output a summation signal indicating the sum of the received analog voltage signals and an analyzer circuit to digitize the summation signal and to detect to compare the digitized summation signal with an error tolerance range to detect whether at least one of the DAC/amplifier circuits is experiencing an operating error.

Abstract translation: 一种用于电子束（电子束）掩模写入器的数模转换器（DAC）/放大器测试系统，电子束掩模写入器包括多个DAC /放大器电路以输出模拟电压信号，每个 DAC /放大器电路具有第一输出端和第二输出端，多个DAC /放大器电路的第一输出端分别耦合到电子束掩模写入器的偏转板，以提供输出模拟电压作为偏转电压， 被提供。 该测试系统包括一个求和电路，用于求和电压信号，并输出一个表示所接收的模拟电压信号和分析电路之和的求和信号，以对加和信号进行数字化，并检测以将数字化求和信号与误差容差范围进行比较 检测至少一个DAC /放大器电路是否正在经历操作错误。

公开(公告)号：US07463173B2

公开(公告)日：2008-12-09

申请号：US11692409

申请日：2007-03-28

Applicant: Yoshimasa Sanmiya ,  Akira Noma

Inventor： Yoshimasa Sanmiya ,  Akira Noma

IPC: H03M1/10

CPC classification number: H03M1/1071 ,  H03M1/66

Abstract: A charged particle beam apparatus includes a plurality of digital-analog (DA) converter units configured to input digital signals, convert the digital signals into analog values, and amplify the analog values to output the analog values, a deflector configured to input at least one analog value of the plurality of analog values output from the plurality of DA converter units to deflect a charged particle beam, and a judging unit configured to judge that at least one of the plurality of DA converter units is abnormal by using the plurality of analog values output from the plurality of DA converter units.

Abstract translation: 带电粒子束装置包括多个数字模拟（DA）转换器单元，其被配置为输入数字信号，将数字信号转换为模拟值，并放大模拟值以输出模拟值;偏转器，被配置为输入至少一个 从所述多个DA转换器单元输出的多个模拟值的模拟值，以偏转带电粒子束;以及判断单元，被配置为通过使用所述多个模拟值来判断所述多个DA转换器单元中的至少一个是异常的 从多个DA转换器单元输出。

公开(公告)号：US20070181819A1

公开(公告)日：2007-08-09

申请号：US11671152

申请日：2007-02-05

Applicant: Yoshimasa SANMIYA ,  Kenji Ohtoshi ,  Tetsuro Nishiyama

Inventor： Yoshimasa SANMIYA ,  Kenji Ohtoshi ,  Tetsuro Nishiyama

IPC: H01J3/14

CPC classification number: H01J37/1477 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

Abstract: A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively, a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes and a plurality of earth electrodes arranged respectively at the plurality of molding substrates. The deflector can suppress generation of cross talks with an improved accuracy of controlling an electron beam.

Abstract translation: 一种用于电子束光刻设备的偏转器，所述偏转器包括相对于照射的电子束的中心轴对称布置的多个控制电极，所述电极被配置为通过分别施加电压来控制电子束;多个成型基板布置 对应于构成为面对多个控制电极的外周面的电子束的中心轴线以及分别布置在多个成型基板上的多个接地电极。 偏转器可以抑制电子束控制精度的提高。

公开(公告)号：US07521689B2

公开(公告)日：2009-04-21

申请号：US11671152

申请日：2007-02-05

Applicant: Yoshimasa Sanmiya ,  Kenji Ohtoshi ,  Tetsuro Nishiyama

Inventor： Yoshimasa Sanmiya ,  Kenji Ohtoshi ,  Tetsuro Nishiyama

IPC: H01J37/30

CPC classification number: H01J37/1477 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

Abstract: A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively, a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes and a plurality of earth electrodes arranged respectively at the plurality of molding substrates. The deflector can suppress generation of cross talks with an improved accuracy of controlling an electron beam.

Abstract translation: 一种用于电子束光刻设备的偏转器，所述偏转器包括相对于照射的电子束的中心轴对称布置的多个控制电极，所述电极被配置为通过分别施加电压来控制电子束;多个成型基板布置 对应于构成为面对多个控制电极的外周面的电子束的中心轴线以及分别布置在多个成型基板上的多个接地电极。 偏转器可以抑制电子束控制精度的提高。