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1.发明申请Independent Radiant Gas Preheating for Precursor Disassociation Control and Gas Reaction Kinetics in Low Temperature CVD Systems 有权独立辐射气体预热用于前体脱离控制和气体反应动力学在低温CVD系统公开(公告)号：US20080210163A1
公开(公告)日：2008-09-04
申请号：US11937388
申请日：2007-11-08
Applicant: David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
Inventor： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
IPC: C23C16/455
CPC classification number: C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
Abstract translation: 描述了将前体材料输送到处理室的方法和装置。 该装置包括具有多个气体输送区的气体分配组件。 每个区域可以包括具有用于接收前体气体的入口和至少一个非热能源的诸如红外光源的气室。 可以改变至少一个非热能源，以控制来自红外光源的波长的强度。
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2.发明申请INDEPENDENT RADIANT GAS PREHEATING FOR PRECURSOR DISASSOCIATION CONTROL AND GAS REACTION KINETICS IN LOW TEMPERATURE CVD SYSTEMS 有权独立的放射性气体预加热用于低温CVD系统中的前驱物分配控制和气体反应动力学公开(公告)号：US20110259432A1
公开(公告)日：2011-10-27
申请号：US13175499
申请日：2011-07-01
Applicant: DAVID KEITH CARLSON , SATHEESH KUPPURAO , HOWARD BECKFORD , HERMAN DINIZ , KAILASH KIRAN PATALAY , BRIAN HAYES BURROWS , JEFFREY RONALD CAMPBELL , ZOUMING ZHU , XIAOWEI LI , ERROL ANTONIO SANCHEZ
Inventor： DAVID KEITH CARLSON , SATHEESH KUPPURAO , HOWARD BECKFORD , HERMAN DINIZ , KAILASH KIRAN PATALAY , BRIAN HAYES BURROWS , JEFFREY RONALD CAMPBELL , ZOUMING ZHU , XIAOWEI LI , ERROL ANTONIO SANCHEZ
CPC classification number: C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
Abstract: A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.
Abstract translation: 提供了一种用于将前体材料输送到处理室的方法和装置。 在一个实施例中，提供了沉积设备。 该装置包括具有纵向轴线的腔室和联接到腔室的侧壁的气体分配组件。 气体分配组件包括耦合到一个或多个气体源的多个增压室，被定位成向多个增压室中的每一个提供能量的能量源以及耦合到该能量源的可变电源，其中该气体分配组件提供一个 通过腔室的流动通道，其垂直于腔室的纵向轴线。
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3.发明授权Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems 有权独立辐射气体预热用于前体分解控制和低温CVD系统中的气体反应动力学公开(公告)号：US08663390B2
公开(公告)日：2014-03-04
申请号：US13175499
申请日：2011-07-01
Applicant: David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
Inventor： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
IPC: C23C16/452 , C23C16/46 , C23F1/00 , H01L21/306 , C23C16/02 , C23C16/06
CPC classification number: C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
Abstract: A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.
Abstract translation: 提供了一种用于将前体材料输送到处理室的方法和装置。 在一个实施例中，提供了沉积设备。 该装置包括具有纵向轴线的腔室和联接到腔室的侧壁的气体分配组件。 气体分配组件包括耦合到一个或多个气体源的多个增压室，被定位成向多个增压室中的每一个提供能量的能量源以及耦合到该能量源的可变电源，其中该气体分配组件提供一个 通过腔室的流动通道，其垂直于腔室的纵向轴线。
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4.发明授权Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems 有权独立辐射气体预热用于前体分解控制和低温CVD系统中的气体反应动力学公开(公告)号：US07976634B2
公开(公告)日：2011-07-12
申请号：US11937388
申请日：2007-11-08
Applicant: David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
Inventor： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
IPC: C23C16/452 , C23C16/46 , C23C16/02 , C23F1/00 , H01L21/306 , C23C16/06
CPC classification number: C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
Abstract translation: 描述了将前体材料输送到处理室的方法和装置。 该装置包括具有多个气体输送区的气体分配组件。 每个区域可以包括具有用于接收前体气体的入口和至少一个非热能源的诸如红外光源的气室。 可以改变至少一个非热能源，以控制来自红外光源的波长的强度。
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