公开(公告)号：US20080210163A1

公开(公告)日：2008-09-04

申请号：US11937388

申请日：2007-11-08

Applicant: David Keith Carlson ,  Satheesh Kuppurao ,  Howard Beckford ,  Herman Diniz ,  Kailash Kiran Patalay ,  Brian Hayes Burrows ,  Jeffrey Ronald Campbell ,  Zouming Zhu ,  Xiaowei Li ,  Errol Antonio Sanchez

Inventor： David Keith Carlson ,  Satheesh Kuppurao ,  Howard Beckford ,  Herman Diniz ,  Kailash Kiran Patalay ,  Brian Hayes Burrows ,  Jeffrey Ronald Campbell ,  Zouming Zhu ,  Xiaowei Li ,  Errol Antonio Sanchez

IPC: C23C16/455

CPC classification number: C23C16/455 ,  C23C16/22 ,  C23C16/452 ,  H01L21/02532 ,  H01L21/0262 ,  Y10T137/0318

Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.

Abstract translation: 描述了将前体材料输送到处理室的方法和装置。 该装置包括具有多个气体输送区的气体分配组件。 每个区域可以包括具有用于接收前体气体的入口和至少一个非热能源的诸如红外光源的气室。 可以改变至少一个非热能源，以控制来自红外光源的波长的强度。

公开(公告)号：US20110259432A1

公开(公告)日：2011-10-27

申请号：US13175499

申请日：2011-07-01

Applicant: DAVID KEITH CARLSON ,  SATHEESH KUPPURAO ,  HOWARD BECKFORD ,  HERMAN DINIZ ,  KAILASH KIRAN PATALAY ,  BRIAN HAYES BURROWS ,  JEFFREY RONALD CAMPBELL ,  ZOUMING ZHU ,  XIAOWEI LI ,  ERROL ANTONIO SANCHEZ

Inventor： DAVID KEITH CARLSON ,  SATHEESH KUPPURAO ,  HOWARD BECKFORD ,  HERMAN DINIZ ,  KAILASH KIRAN PATALAY ,  BRIAN HAYES BURROWS ,  JEFFREY RONALD CAMPBELL ,  ZOUMING ZHU ,  XIAOWEI LI ,  ERROL ANTONIO SANCHEZ

IPC: C23C16/48 ,  H05B6/00 ,  F15D1/00

CPC classification number: C23C16/455 ,  C23C16/22 ,  C23C16/452 ,  H01L21/02532 ,  H01L21/0262 ,  Y10T137/0318

Abstract: A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.

Abstract translation: 提供了一种用于将前体材料输送到处理室的方法和装置。 在一个实施例中，提供了沉积设备。 该装置包括具有纵向轴线的腔室和联接到腔室的侧壁的气体分配组件。 气体分配组件包括耦合到一个或多个气体源的多个增压室，被定位成向多个增压室中的每一个提供能量的能量源以及耦合到该能量源的可变电源，其中该气体分配组件提供一个 通过腔室的流动通道，其垂直于腔室的纵向轴线。

公开(公告)号：US08663390B2

公开(公告)日：2014-03-04

申请号：US13175499

申请日：2011-07-01

Applicant: David Keith Carlson ,  Satheesh Kuppurao ,  Howard Beckford ,  Herman Diniz ,  Kailash Kiran Patalay ,  Brian Hayes Burrows ,  Jeffrey Ronald Campbell ,  Zouming Zhu ,  Xiaowei Li ,  Errol Antonio Sanchez

Inventor： David Keith Carlson ,  Satheesh Kuppurao ,  Howard Beckford ,  Herman Diniz ,  Kailash Kiran Patalay ,  Brian Hayes Burrows ,  Jeffrey Ronald Campbell ,  Zouming Zhu ,  Xiaowei Li ,  Errol Antonio Sanchez

IPC: C23C16/452 ,  C23C16/46 ,  C23F1/00 ,  H01L21/306 ,  C23C16/02 ,  C23C16/06

CPC classification number: C23C16/455 ,  C23C16/22 ,  C23C16/452 ,  H01L21/02532 ,  H01L21/0262 ,  Y10T137/0318

Abstract: A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.

Abstract translation: 提供了一种用于将前体材料输送到处理室的方法和装置。 在一个实施例中，提供了沉积设备。 该装置包括具有纵向轴线的腔室和联接到腔室的侧壁的气体分配组件。 气体分配组件包括耦合到一个或多个气体源的多个增压室，被定位成向多个增压室中的每一个提供能量的能量源以及耦合到该能量源的可变电源，其中该气体分配组件提供一个 通过腔室的流动通道，其垂直于腔室的纵向轴线。

公开(公告)号：US07976634B2

公开(公告)日：2011-07-12

申请号：US11937388

申请日：2007-11-08

Applicant: David Keith Carlson ,  Satheesh Kuppurao ,  Howard Beckford ,  Herman Diniz ,  Kailash Kiran Patalay ,  Brian Hayes Burrows ,  Jeffrey Ronald Campbell ,  Zouming Zhu ,  Xiaowei Li ,  Errol Antonio Sanchez

Inventor： David Keith Carlson ,  Satheesh Kuppurao ,  Howard Beckford ,  Herman Diniz ,  Kailash Kiran Patalay ,  Brian Hayes Burrows ,  Jeffrey Ronald Campbell ,  Zouming Zhu ,  Xiaowei Li ,  Errol Antonio Sanchez

IPC: C23C16/452 ,  C23C16/46 ,  C23C16/02 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06

CPC classification number: C23C16/455 ,  C23C16/22 ,  C23C16/452 ,  H01L21/02532 ,  H01L21/0262 ,  Y10T137/0318

Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.

Abstract translation: 描述了将前体材料输送到处理室的方法和装置。 该装置包括具有多个气体输送区的气体分配组件。 每个区域可以包括具有用于接收前体气体的入口和至少一个非热能源的诸如红外光源的气室。 可以改变至少一个非热能源，以控制来自红外光源的波长的强度。

公开(公告)号：US20110155058A1

公开(公告)日：2011-06-30

申请号：US12967576

申请日：2010-12-14

Applicant: David K. Carlson ,  Errol Sanchez ,  Herman Diniz ,  Satheesh Kuppurao

Inventor： David K. Carlson ,  Errol Sanchez ,  Herman Diniz ,  Satheesh Kuppurao

IPC: B05C13/02 ,  C23C16/00

CPC classification number: H01L21/67115 ,  C23C16/46 ,  C23C16/52 ,  C30B25/105 ,  C30B25/12

Abstract: Methods and apparatus for processing substrates are disclosed herein. In some embodiments, an apparatus for processing a substrate may include a substrate support having a base having a convex surface, an annular ring disposed on the base, and an edge ring disposed on the annular ring to support a substrate, wherein the base, annular ring, and edge ring form a radiant cavity capable of reflecting energy radiated from a backside of a substrate when disposed on the edge ring and wherein the backside of the substrate faces the convex surface of the base. Alternatively or in combination, in some embodiments, the base may include a metal layer encapsulated between a transparent non-metal upper layer and a non-metal lower layer.

Abstract translation: 本文公开了处理衬底的方法和设备。 在一些实施例中，用于处理衬底的装置可以包括具有底部的衬底支撑件，其具有凸形表面，设置在基座上的环形环和设置在环形环上以支撑衬底的边缘环，其中， 环和边缘环形成辐射腔，其能够在布置在边缘环上时反射从衬底的背面辐射的能量，并且其中衬底的背面朝向基底的凸面。 或者或组合地，在一些实施方案中，碱可以包括封装在透明非金属上层和非金属下层之间的金属层。