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公开(公告)号：US08724976B2
公开(公告)日：2014-05-13
申请号：US13433780
申请日：2012-03-29
CPC分类号： F27B17/0025 , C23C16/481 , C23C16/52 , H01L21/67115 , H01L21/67248
摘要： Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.
摘要翻译： 本发明的实施例通常考虑用于在处理期间监测和控制衬底的温度的装置和方法。 该装置和方法的一个实施例利用红外相机获得多个区域或基板的整个表面的温度分布，以及系统控制器实时计算和协调用于降低任何可能的温度不均匀性的优化策略 在加工过程中在基板上发现。
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公开(公告)号：US08150242B2
公开(公告)日：2012-04-03
申请号：US12263349
申请日：2008-10-31
CPC分类号： F27B17/0025 , C23C16/481 , C23C16/52 , H01L21/67115 , H01L21/67248
摘要： Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.
摘要翻译： 本发明的实施例通常考虑用于在处理期间监测和控制衬底的温度的装置和方法。 该装置和方法的一个实施例利用红外相机获得多个区域或基板的整个表面的温度分布，以及系统控制器实时计算和协调用于降低任何可能的温度不均匀性的优化策略 在加工过程中在基板上发现。
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3.发明申请公开(公告)号：US20100111511A1
公开(公告)日：2010-05-06
申请号：US12263349
申请日：2008-10-31
CPC分类号： F27B17/0025 , C23C16/481 , C23C16/52 , H01L21/67115 , H01L21/67248
摘要： Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.
摘要翻译： 本发明的实施例通常考虑用于在处理期间监测和控制衬底的温度的装置和方法。 该装置和方法的一个实施例利用红外相机获得多个区域或基板的整个表面的温度分布，以及系统控制器实时计算和协调用于降低任何可能的温度不均匀性的优化策略 在加工过程中在基板上发现。
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公开(公告)号：US20100047137A1
公开(公告)日：2010-02-25
申请号：US12196894
申请日：2008-08-22
申请人： DAVID KEITH CARLSON
发明人： DAVID KEITH CARLSON
IPC分类号： B01J19/12
CPC分类号： B01J19/123 , B01D53/007 , B01D2257/2027 , B01D2257/2047 , B01D2258/0216 , B01D2259/804
摘要： Methods and apparatus for the removal of exhaust gases are provided herein. In some embodiments, an exhaust apparatus may include a housing defining an inner volume; an inlet and an outlet formed in the housing to facilitate flow of an exhaust gas through the inner volume, wherein the inlet is configured to be coupled to a process chamber to receive an exhaust therefrom; and an ultraviolet light source to provide ultraviolet energy to the inner volume. The ultraviolet light source may provide sufficient energy to at least partially decompose the exhaust gases. In some embodiments, the ultraviolet light source may provide ultraviolet energy until the exhaust gas has cooled below a critical temperature.
摘要翻译： 本文提供了排除废气的方法和装置。 在一些实施例中，排气装置可以包括限定内部容积的壳体; 入口和出口，其形成在所述壳体中以便于排气通过所述内部容积的流动，其中所述入口被配置为联接到处理室以从其接收排气; 以及向内部体积提供紫外线能量的紫外线光源。 紫外光源可以提供足够的能量以至少部分地分解废气。 在一些实施例中，紫外光源可以提供紫外线能量，直到废气冷却到临界温度以下。
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公开(公告)号：US08551415B2
公开(公告)日：2013-10-08
申请号：US12196894
申请日：2008-08-22
申请人： David Keith Carlson
发明人： David Keith Carlson
IPC分类号： B01J19/12
CPC分类号： B01J19/123 , B01D53/007 , B01D2257/2027 , B01D2257/2047 , B01D2258/0216 , B01D2259/804
摘要： Methods and apparatus for the removal of exhaust gases are provided herein. In some embodiments, an exhaust apparatus may include a housing defining an inner volume; an inlet and an outlet formed in the housing to facilitate flow of an exhaust gas through the inner volume, wherein the inlet is configured to be coupled to a process chamber to receive an exhaust therefrom; and an ultraviolet light source to provide ultraviolet energy to the inner volume. The ultraviolet light source may provide sufficient energy to at least partially decompose the exhaust gases. In some embodiments, the ultraviolet light source may provide ultraviolet energy until the exhaust gas has cooled below a critical temperature.
摘要翻译： 本文提供了排除废气的方法和装置。 在一些实施例中，排气装置可以包括限定内部容积的壳体; 入口和出口，其形成在所述壳体中以便于排气通过所述内部容积的流动，其中所述入口被配置为联接到处理室以从其接收排气; 以及向内部体积提供紫外线能量的紫外线光源。 紫外光源可以提供足够的能量以至少部分地分解废气。 在一些实施例中，紫外光源可以提供紫外线能量，直到废气冷却到临界温度以下。
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6.发明申请INDEPENDENT RADIANT GAS PREHEATING FOR PRECURSOR DISASSOCIATION CONTROL AND GAS REACTION KINETICS IN LOW TEMPERATURE CVD SYSTEMS 有权独立的放射性气体预加热用于低温CVD系统中的前驱物分配控制和气体反应动力学公开(公告)号：US20110259432A1
公开(公告)日：2011-10-27
申请号：US13175499
申请日：2011-07-01
申请人： DAVID KEITH CARLSON , SATHEESH KUPPURAO , HOWARD BECKFORD , HERMAN DINIZ , KAILASH KIRAN PATALAY , BRIAN HAYES BURROWS , JEFFREY RONALD CAMPBELL , ZOUMING ZHU , XIAOWEI LI , ERROL ANTONIO SANCHEZ
发明人： DAVID KEITH CARLSON , SATHEESH KUPPURAO , HOWARD BECKFORD , HERMAN DINIZ , KAILASH KIRAN PATALAY , BRIAN HAYES BURROWS , JEFFREY RONALD CAMPBELL , ZOUMING ZHU , XIAOWEI LI , ERROL ANTONIO SANCHEZ
CPC分类号： C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
摘要： A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.
摘要翻译： 提供了一种用于将前体材料输送到处理室的方法和装置。 在一个实施例中，提供了沉积设备。 该装置包括具有纵向轴线的腔室和联接到腔室的侧壁的气体分配组件。 气体分配组件包括耦合到一个或多个气体源的多个增压室，被定位成向多个增压室中的每一个提供能量的能量源以及耦合到该能量源的可变电源，其中该气体分配组件提供一个 通过腔室的流动通道，其垂直于腔室的纵向轴线。
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7.发明授权Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems 有权独立辐射气体预热用于前体分解控制和低温CVD系统中的气体反应动力学公开(公告)号：US08663390B2
公开(公告)日：2014-03-04
申请号：US13175499
申请日：2011-07-01
申请人： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
发明人： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
IPC分类号： C23C16/452 , C23C16/46 , C23F1/00 , H01L21/306 , C23C16/02 , C23C16/06
CPC分类号： C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
摘要： A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.
摘要翻译： 提供了一种用于将前体材料输送到处理室的方法和装置。 在一个实施例中，提供了沉积设备。 该装置包括具有纵向轴线的腔室和联接到腔室的侧壁的气体分配组件。 气体分配组件包括耦合到一个或多个气体源的多个增压室，被定位成向多个增压室中的每一个提供能量的能量源以及耦合到该能量源的可变电源，其中该气体分配组件提供一个 通过腔室的流动通道，其垂直于腔室的纵向轴线。
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8.发明授权Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems 有权独立辐射气体预热用于前体分解控制和低温CVD系统中的气体反应动力学公开(公告)号：US07976634B2
公开(公告)日：2011-07-12
申请号：US11937388
申请日：2007-11-08
申请人： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
发明人： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
IPC分类号： C23C16/452 , C23C16/46 , C23C16/02 , C23F1/00 , H01L21/306 , C23C16/06
CPC分类号： C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
摘要： A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
摘要翻译： 描述了将前体材料输送到处理室的方法和装置。 该装置包括具有多个气体输送区的气体分配组件。 每个区域可以包括具有用于接收前体气体的入口和至少一个非热能源的诸如红外光源的气室。 可以改变至少一个非热能源，以控制来自红外光源的波长的强度。
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9.发明申请公开(公告)号：US20120183915A1
公开(公告)日：2012-07-19
申请号：US13433780
申请日：2012-03-29
IPC分类号： F27D19/00
CPC分类号： F27B17/0025 , C23C16/481 , C23C16/52 , H01L21/67115 , H01L21/67248
摘要： Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.
摘要翻译： 本发明的实施例通常考虑用于在处理期间监测和控制衬底的温度的装置和方法。 该装置和方法的一个实施例利用红外相机获得多个区域或基板的整个表面的温度分布，以及系统控制器实时计算和协调用于降低任何可能的温度不均匀性的优化策略 在加工过程中在基板上发现。
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10.发明申请Independent Radiant Gas Preheating for Precursor Disassociation Control and Gas Reaction Kinetics in Low Temperature CVD Systems 有权独立辐射气体预热用于前体脱离控制和气体反应动力学在低温CVD系统公开(公告)号：US20080210163A1
公开(公告)日：2008-09-04
申请号：US11937388
申请日：2007-11-08
申请人： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
发明人： David Keith Carlson , Satheesh Kuppurao , Howard Beckford , Herman Diniz , Kailash Kiran Patalay , Brian Hayes Burrows , Jeffrey Ronald Campbell , Zouming Zhu , Xiaowei Li , Errol Antonio Sanchez
IPC分类号： C23C16/455
CPC分类号： C23C16/455 , C23C16/22 , C23C16/452 , H01L21/02532 , H01L21/0262 , Y10T137/0318
摘要： A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
摘要翻译： 描述了将前体材料输送到处理室的方法和装置。 该装置包括具有多个气体输送区的气体分配组件。 每个区域可以包括具有用于接收前体气体的入口和至少一个非热能源的诸如红外光源的气室。 可以改变至少一个非热能源，以控制来自红外光源的波长的强度。
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