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公开(公告)号:US11107740B2
公开(公告)日:2021-08-31
申请号:US15666858
申请日:2017-08-02
Applicant: ABB Power Grids Switzerland AG , Audi AG
Inventor: Jürgen Schuderer , Umamaheswara Vemulapati , Marco Bellini , Jan Vobecky
IPC: H01L23/34 , H01L23/14 , H01L23/62 , H01L25/07 , H01L23/373 , H01L23/36 , H01L23/535 , H01L23/538 , H01L25/18 , H01L29/06
Abstract: A power semiconductor module including at least one power semiconductor chip providing a power electronics switch; and a semiconductor wafer, to which the at least one power semiconductor chip is bonded; wherein the semiconductor wafer is doped, such that it includes a field blocking region and an electrically conducting region on the field blocking region, to which electrically conducting region the at least one power semiconductor chip is bonded.
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公开(公告)号:US11056582B2
公开(公告)日:2021-07-06
申请号:US16969773
申请日:2019-02-13
Applicant: ABB Power Grids Switzerland AG
Inventor: Jan Vobecky , Umamaheswara Vemulapati , Munaf Rahimo
IPC: H01L29/747 , H01L29/06 , H01L29/08 , H01L29/423
Abstract: A bidirectional thyristor device includes a semiconductor wafer with a number of layers forming pn junctions. A first main electrode and a first gate electrode are arranged on a first main side of the wafer. A second main electrode and a second gate electrode are arranged on a second main side of the wafer. First emitter shorts penetrate through a first semiconductor layer and second emitter shorts penetrate through a fifth semiconductor layer. In an orthogonal projection onto a plane parallel to the first main side, a first area occupied by the first semiconductor layer and the first emitter shorts overlaps in an overlapping area with a second area occupied by the fifth semiconductor layer and the second emitter shorts. The overlapping area, in which the first area overlaps with the second area, encompasses at least 50% of a total wafer area occupied by the semiconductor wafer.
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公开(公告)号:US11031473B2
公开(公告)日:2021-06-08
申请号:US16558935
申请日:2019-09-03
Applicant: ABB Power Grids Switzerland AG
Inventor: Friedhelm Bauer , Lars Knoll , Marco Bellini , Renato Minamisawa , Umamaheswara Vemulapati
Abstract: A power semiconductor device includes a semiconductor wafer having a first main side surface and a second main side surface. The semiconductor wafer includes a first semiconductor layer having a first conductivity type and a plurality of columnar or plate-shaped first semiconductor regions extending in the first semiconductor layer between the first main side surface and the second main side surface in a vertical direction perpendicular to the first main side surface and the second main side surface. The first semiconductor regions have a second conductivity type, which is different from the first conductivity type. Therein, the first semiconductor is a layer of hexagonal silicon carbide. The first semiconductor regions are regions of 3C polytype silicon carbide.
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公开(公告)号:US11043943B2
公开(公告)日:2021-06-22
申请号:US16411716
申请日:2019-05-14
Applicant: ABB Power Grids Switzerland AG
Inventor: Umamaheswara Vemulapati , Ulrich Schlapbach , Munaf Rahimo
IPC: H03K5/08 , H03K17/08 , H03K3/02 , H03K17/16 , H03K17/687 , H03K17/567 , H03K17/12 , H03K17/74
Abstract: A semiconductor module comprises reverse conducting IGBT connected in parallel with a wide bandgap MOSFET, wherein each of the reverse conducting IGBT and the wide bandgap MOSFET comprises an internal anti-parallel diode. A method for operating a semiconductor module with the method including the steps of: determining a reverse conduction start time, in which the semiconductor module starts to conduct a current in a reverse direction, which reverse direction is a conducting direction of the internal anti-parallel diodes; applying a positive gate signal to the wide bandgap MOSFET after the reverse conduction start time; determining a reverse conduction end time based on the reverse conduction start time, in which the semiconductor module ends to conduct a current in the reverse direction; and applying a reduced gate signal to the wide bandgap MOSFET a blanking time interval before the reverse conduction end time, the reduced gate signal being adapted for switching the wide bandgap MOSFET into a blocking state.
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公开(公告)号:US20220181473A1
公开(公告)日:2022-06-09
申请号:US17600812
申请日:2020-04-01
Applicant: ABB POWER GRIDS SWITZERLAND AG
Inventor: Tobias Wikstroem , Umamaheswara Vemulapati , Thomas Stiasny
IPC: H01L29/74 , H01L29/745 , H01L29/66
Abstract: A power diode comprises a plurality of diode cells (10). Each diode cell (10) comprises a first conductivity type first anode layer (40), a first conductivity type second anode layer (45) having a lower doping concentration than the first anode layer (40) and being separated from an anode electrode layer (20) by the first anode layer (40), a second conductivity type drift layer (50) forming a pn-junction with the second anode layer (45), a second conductivity type cathode layer (60) being in direct contact with the cathode electrode layer (60), and a cathode-side segmentation layer (67) being in direct contact with the cathode electrode layer (30). A material of the cathode-side segmentation layer (67) is a first conductivity type semiconductor, wherein an integrated doping content of the cathode-side, which is integrated along a direction perpendicular to the second main side (102), is below 2·1013 cm−2, or a material of the cathode-side segmentation layer (67) is an insulating material. A horizontal cross-section through each diode cell (10) along a horizontal plane (K1) comprises a first area where the horizontal plane (K1) intersects the second anode layer (45) and a second area where the plane (K1) intersects the drift layer (50).
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