Resistive Memory Arrangement and a Method of Forming the Same
    1.
    发明申请
    Resistive Memory Arrangement and a Method of Forming the Same 有权
    电阻记忆布置及其形成方法

    公开(公告)号:US20130200327A1

    公开(公告)日:2013-08-08

    申请号:US13745993

    申请日:2013-01-21

    Abstract: According to embodiments of the present invention, a resistive memory arrangement is provided. The resistive memory arrangement includes a nanowire, and a resistive memory cell including a resistive layer including a resistive changing material, wherein at least a section of the resistive layer is arranged covering at least a portion of a surface of the nanowire, and a conductive layer arranged on at least a part of the resistive layer. According to further embodiments of the present invention, a method of forming a resistive memory arrangement is also provided.

    Abstract translation: 根据本发明的实施例,提供了一种电阻式存储装置。 电阻性存储器装置包括纳米线和包括电阻层的电阻性存储单元,该电阻层包括电阻变化材料,其中电阻层的至少一部分布置成覆盖纳米线表面的至少一部分,导电层 布置在电阻层的至少一部分上。 根据本发明的另外的实施例,还提供了形成电阻式存储装置的方法。

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