公开(公告)号：US20250092491A1

公开(公告)日：2025-03-20

申请号：US18370534

申请日：2023-09-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Chien-Min Liao ,  Chao Liu ,  Tom Cho ,  Hyeon Geu Kim ,  Andrew Nguyen ,  Hari Ponnekanti ,  Mingdong Li ,  Changgong Wang ,  Bruce Alger

IPC: C22C21/06 ,  B22F1/16 ,  B22F1/17 ,  H01J37/32 ,  H01L21/683 ,  H01L21/687

Abstract: Described herein is a chamber component having a body comprising one or more aluminum alloy compositions. A surface of the chamber component has an aluminum alloy composition comprising aluminum (Al), wherein the Al is included in an amount of about 85 wt % to about 98 wt %, based on total weight of the alloy composition, and magnesium (Mg), wherein the Mg is included in an amount of about 1 wt % to about 5 wt %, based on total weight of the alloy composition. The aluminum alloy composition further includes one or more additional chemical elements that form an equiaxed grain structure of an aluminum matrix of the alloy composition.

公开(公告)号：US20230367302A1

公开(公告)日：2023-11-16

申请号：US17742332

申请日：2022-05-11

Applicant: Applied Materials, Inc.

Inventor： Chao Liu ,  Yudong Hao ,  Shifang Li ,  Andreas Schulze

IPC: G05B19/418

CPC classification number: G05B19/41885 ,  G05B2219/33034

Abstract: A method includes receiving, by a processing device, first data. The first data includes data from one or more sensors of a processing chamber and is associated with a processing operation. The first data is resolved in at least two dimensions, one of which is time. The method further includes providing the first data to a model. The method further includes receiving from the model second data. The second data includes an indication of an evolution of a processing parameter during the processing operation. The method further includes causing performance of a corrective action in view of the second data.

公开(公告)号：US20240247379A1

公开(公告)日：2024-07-25

申请号：US18099846

申请日：2023-01-20

Applicant: Applied Materials, Inc.

Inventor： Chao Liu ,  David John Jorgensen ,  Marc Shull ,  Christopher Laurent Beaudry ,  Joseph Frederick Behnke

IPC: C23C28/00

CPC classification number: C23C28/323 ,  C23C28/34

Abstract: Embodiments of the disclosure relate to articles, coated chamber components, and techniques of coating chamber components and systems. In particular, disclosed is a chamber component and methods of forming the chamber component that includes a substrate and a first layer disposed on the substrate, the first layer including a metal with a first atomic concentration. The chamber component further includes a second layer disposed on the first layer, the second layer including the metal with a second atomic concentration that is at least 5 percent higher than the first atomic concentration.