公开(公告)号：US20130255784A1

公开(公告)日：2013-10-03

申请号：US13789819

申请日：2013-03-08

Applicant: APPLIED MATERIALS, INC.

Inventor： ZHIYUAN YE ,  BALASUBRAMANIAN RAMACHANDRAN ,  DENNIS DEMARS

IPC: H01L21/02

CPC classification number: H01L21/02 ,  C23C16/45574 ,  C23C16/481 ,  Y10T137/0318 ,  Y10T137/85938

Abstract: Gas delivery systems and methods of use thereof is provided herein. In some embodiments, a gas delivery system may include a first gas supply to provide a first gas along a first flow path; a flow divider disposed in the first flow path to divide the first flow path into a plurality of second flow paths leading to a plurality of corresponding gas delivery zones; and a plurality of second gas supplies respectively coupled to corresponding ones of the second flow paths to independently provide a second gas to respective ones of the plurality of second flow paths.

Abstract translation: 本文提供气体输送系统及其使用方法。 在一些实施例中，气体输送系统可以包括用于沿第一流动路径提供第一气体的第一气体供应源; 设置在所述第一流动路径中以将所述第一流动路径分成通向多个对应的气体输送区域的多个第二流动路径的分流器; 以及分别耦合到相应的第二流动路径的多个第二气体供应，以独立地向多个第二流动路径中的相应的第二流动路径提供第二气体。

公开(公告)号：US20130319015A1

公开(公告)日：2013-12-05

申请号：US13902310

申请日：2013-05-24

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  ERROL ANTONIO C. SANCHEZ ,  KENRIC CHOI ,  MARCEL E. JOSEPHSON ,  DENNIS DEMARS ,  EMRE CUVALCI ,  MEHMET TUGRUL SAMIR

IPC: F25B21/02

CPC classification number: F25B21/02 ,  C23C16/448 ,  C23C16/4482

Abstract: Methods and apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; a heat sink coupled to the one or more thermoelectric devices; and a fan disposed proximate to a back side of the heat sink to provide a flow of air to the heat sink.

Abstract translation: 本文提供了用于基板处理的前体的热管理方法和装置。 在一些实施例中，用于对基板处理中使用的前体进行热管理的设备可以包括具有开口尺寸的开口的主体，该开口的尺寸适于容纳设置在其中的液体或固体前体的存储容器，所述主体由导热材料制成; 一个或多个耦合到靠近开口的本体的热电装置; 耦合到所述一个或多个热电装置的散热器; 以及靠近所述散热器的后侧设置的风扇，以向所述散热器提供空气流。

公开(公告)号：US20130319013A1

公开(公告)日：2013-12-05

申请号：US13902304

申请日：2013-05-24

Applicant: APPLIED MATERIALS, INC.

Inventor： DAVID K. CARLSON ,  ERROL ANTONIO C. SANCHEZ ,  KENRIC CHOI ,  MARCEL E. JOSEPHSON ,  DENNIS DEMARS

IPC: F25B21/02

CPC classification number: F25B21/02 ,  C23C16/448 ,  C23C16/4482

Abstract: Apparatus for thermal management of a precursor for use in substrate processing are provided herein. In some embodiments, an apparatus for thermal management of a precursor for use in substrate processing may include a body having an opening sized to receive a storage container having a liquid or solid precursor disposed therein, the body fabricated from thermally conductive material; one or more thermoelectric devices coupled to the body proximate the opening; and a heat sink coupled to the one or more thermoelectric devices.

Abstract translation: 本文提供了用于基板处理中使用的前体的热管理装置。 在一些实施例中，用于对基板处理中使用的前体进行热管理的设备可以包括具有开口尺寸的开口的主体，该开口的尺寸适于容纳设置在其中的液体或固体前体的存储容器，所述主体由导热材料制成; 一个或多个耦合到靠近开口的本体的热电装置; 以及耦合到所述一个或多个热电装置的散热器。