公开(公告)号：USD965524S1

公开(公告)日：2022-10-04

申请号：US29702410

申请日：2019-08-19

Applicant: ASM IP Holding B.V.

Designer： Aniket Patil ,  John DiSanto ,  Sam Kim ,  Saket Rathi

公开(公告)号：US20210239614A1

公开(公告)日：2021-08-05

申请号：US17157507

申请日：2021-01-25

Applicant: ASM IP Holding B.V.

Inventor： Shiva K.T. Rajavelu Muralidhar ,  Youness Alvandi-Tabrizi ,  John DiSanto ,  Sam Kim

IPC: G01N21/59

Abstract: Methods and apparatus for measuring light intensity are disclosed. The methods and apparatus can be used to verify an article, such as a reaction chamber. Exemplary apparatus include a first arm, a light source coupled to the first arm, a second arm, and a sensor coupled to the second arm. The sensor can receive light from the light source that is transmitted through at least a portion of the article.

公开(公告)号：US20190051555A1

公开(公告)日：2019-02-14

申请号：US15672096

申请日：2017-08-08

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John DiSanto

IPC: H01L21/687 ,  H01L21/67 ,  C23C16/458 ,  C30B25/08

CPC classification number: H01L21/68742 ,  C23C16/4581 ,  C23C16/4584 ,  C23C16/4586 ,  C30B25/08 ,  C30B25/12 ,  H01L21/67028 ,  H01L21/67069 ,  H01L21/67126 ,  H01L21/67248 ,  H01L21/68757 ,  H01L21/68792

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

公开(公告)号：US12040217B2

公开(公告)日：2024-07-16

申请号：US18100660

申请日：2023-01-24

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John DiSanto

IPC: H01L21/687 ,  C23C16/458 ,  C30B25/08 ,  C30B25/12 ,  H01L21/67

CPC classification number: H01L21/68742 ,  C23C16/4581 ,  C23C16/4584 ,  C23C16/4586 ,  C30B25/08 ,  C30B25/12 ,  H01L21/67028 ,  H01L21/67069 ,  H01L21/67248 ,  H01L21/68792 ,  H01L21/67126 ,  H01L21/68757

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

公开(公告)号：USD965044S1

公开(公告)日：2022-09-27

申请号：US29702423

申请日：2019-08-19

Applicant: ASM IP Holding B.V.

Designer： Aniket Patil ,  Sam Kim ,  John DiSanto ,  Saket Rathi

公开(公告)号：US20240044792A1

公开(公告)日：2024-02-08

申请号：US18379312

申请日：2023-10-12

Applicant: ASM IP Holding B.V.

Inventor： Shiva K.T. Rajavelu Muralidhar ,  Youness Alvandi-Tabrizi ,  John DiSanto ,  Sam Kim

IPC: G01N21/59 ,  G01N21/958 ,  G01B11/02 ,  G01N33/207

CPC classification number: G01N21/59 ,  G01N21/958 ,  G01B11/028 ,  G01N33/207 ,  G01N2201/021

Abstract: Methods and apparatus for measuring light intensity are disclosed. The methods and apparatus can be used to verify an article, such as a reaction chamber. Exemplary apparatus include a first arm, a light source coupled to the first arm, a second arm, and a sensor coupled to the second arm. The sensor can receive light from the light source that is transmitted through at least a portion of the article.

公开(公告)号：US20210229056A1

公开(公告)日：2021-07-29

申请号：US17154851

申请日：2021-01-21

Applicant: ASM IP HOLDING B.V.

Inventor： Youness Alvandi-Tabrizi ,  John DiSanto ,  Shiva K.T. Rajavelu Muralidhar

IPC: B01J8/06

Abstract: A process chamber comprising can include a curved upper wall extending longitudinally from a first end portion of the reaction chamber to a second end portion of the reaction chamber. The process chamber can include a curved lower wall cooperating with the curved upper wall to at least partially define an internal cavity, the curved lower wall connected to the curved upper wall from the first end portion to the second end portion at a first side of the reaction chamber and at a second side of the reaction chamber. A rail can extend along an exterior surface of the process chamber from the first end portion to the second end portion, the rail disposed at or near a connection between the curved upper wall and the curved lower wall.

公开(公告)号：US11828707B2

公开(公告)日：2023-11-28

申请号：US17157507

申请日：2021-01-25

Applicant: ASM IP Holding B.V.

Inventor： Shiva K. T. Rajavelu Muralidhar ,  Youness Alvandi-Tabrizi ,  John DiSanto ,  Sam Kim

IPC: G01N21/59 ,  G01N21/958 ,  G01B11/02 ,  G01N33/207

CPC classification number: G01N21/59 ,  G01B11/028 ,  G01N21/958 ,  G01N33/207 ,  G01N2201/021

Abstract: Methods and apparatus for measuring light intensity are disclosed. The methods and apparatus can be used to verify an article, such as a reaction chamber. Exemplary apparatus include a first arm, a light source coupled to the first arm, a second arm, and a sensor coupled to the second arm. The sensor can receive light from the light source that is transmitted through at least a portion of the article.

公开(公告)号：US20230163019A1

公开(公告)日：2023-05-25

申请号：US18100660

申请日：2023-01-24

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John DiSanto

IPC: H01L21/687 ,  H01L21/67 ,  C23C16/458 ,  C30B25/08 ,  C30B25/12

CPC classification number: H01L21/68742 ,  H01L21/67069 ,  H01L21/67028 ,  C23C16/4586 ,  C23C16/4584 ,  C30B25/08 ,  H01L21/67248 ,  C30B25/12 ,  H01L21/68792 ,  C23C16/4581 ,  H01L21/68757 ,  H01L21/67126

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

公开(公告)号：US11587821B2

公开(公告)日：2023-02-21

申请号：US16944271

申请日：2020-07-31

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John DiSanto

IPC: H01L21/67 ,  C30B25/08 ,  H01L21/687 ,  C23C16/458 ,  C30B25/12

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.