公开(公告)号：US20150114295A1

公开(公告)日：2015-04-30

申请号：US14521588

申请日：2014-10-23

Applicant: ASM IP Holding B.V.

Inventor： Young Hoon KIM ,  Dae Youn KIM ,  Dong Rak JUNG ,  Young Seok CHOI ,  Sang Wook LEE

IPC: C23C16/50 ,  C23C16/455 ,  C23C16/44 ,  C23C16/46

CPC classification number: C23C16/4412 ,  C23C16/452 ,  C23C16/45508

Abstract: An exemplary embodiment of the present invention provides a deposition apparatus including: a substrate support for supporting a substrate; a reaction chamber wall defining a reaction chamber and contacting the substrate support; a plurality of gas inlets connected to the reaction chamber wall; a remote plasma unit connected to at least one of the plurality of gas inlets; and a gas-supplying path connected to the plurality of gas inlets and defining a reaction region along with the substrate support. A plurality of gases passing through the plurality of gas inlets move along the gas-supplying path to be directly supplied onto the substrate without contacting other parts of the reactor.

Abstract translation: 本发明的示例性实施例提供了一种沉积设备，包括：用于支撑衬底的衬底支撑件; 反应室壁，其限定反应室并接触所述基板支撑件; 连接到反应室壁的多个气体入口; 连接到所述多个气体入口中的至少一个的远程等离子体单元; 以及连接到所述多个气体入口并且与所述衬底支撑件一起限定反应区域的气体供应路径。 通过多个气体入口的多个气体沿气体供应路径移动，以直接供应到基板上，而不与反应器的其它部分接触。

公开(公告)号：US20140338601A1

公开(公告)日：2014-11-20

申请号：US14275912

申请日：2014-05-13

Applicant: ASM IP Holding B.V.

Inventor： Young Seok CHOI ,  Dae Youn Kim

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32541 ,  H01J37/32568

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes: a reactor; a plasma chamber connected to the reactor; a plasma electrode mounted inside of the plasma chamber; and a gas supply plate coupled with the plasma chamber to supply gas into the plasma chamber, wherein a plurality of gas holes is formed at an inner wall of the gas supply plate, and the plurality of gas supply holes is spaced apart from each other by a predetermined interval.

Abstract translation: 根据本发明的示例性实施例的沉积设备包括：反应器; 连接到反应器的等离子体室; 安装在等离子体室内部的等离子体电极; 以及气体供给板，其与等离子体室联接以将气体供应到等离子体室中，其中在气体供应板的内壁处形成有多个气体孔，并且多个气体供应孔通过相互间隔开 预定间隔。

公开(公告)号：US20150380286A1

公开(公告)日：2015-12-31

申请号：US14735253

申请日：2015-06-10

Applicant: ASM IP Holding B.V.

Inventor： Young Seok CHOI

IPC: H01L21/673 ,  B25J15/00

CPC classification number: H01L21/68707 ,  B25J11/0095

Abstract: A substrate transporting arm and a substrate transporting apparatus including the same prevent a substrate from sliding and increase a process speed of the substrate, thereby improving productivity. The substrate transporting arm includes a body and a plurality of substrate supporters coupled to the body. Each of the plurality of substrate supporters includes a substrate holder and a substrate supporter pin, and an inner side of the substrate holder includes an inclined portion

Abstract translation: 基板传送臂和包括该基板传送臂的基板传送装置防止基板滑动并增加基板的处理速度，从而提高生产率。 衬底传送臂包括主体和耦合到主体的多个衬底支撑件。 多个基板支撑体中的每一个包括基板保持件和基板支撑销，并且基板保持器的内侧包括倾斜部