公开(公告)号：US11488819B2

公开(公告)日：2022-11-01

申请号：US16702506

申请日：2019-12-03

Applicant: ASM IP Holding B.V.

Inventor： HakJoo Lee ,  HakJoon Lee ,  YoungSim Kim

IPC: H01L21/02 ,  H01L21/67

Abstract: A method of cleaning blind spots around a substrate supporting apparatus by controlling a position of the substrate supporting apparatus includes moving the substrate supporting apparatus relative to a ring and supplying a cleaning gas to an upper space of the substrate supporting apparatus.

公开(公告)号：US20230070340A1

公开(公告)日：2023-03-09

申请号：US17896340

申请日：2022-08-26

Applicant: ASM IP Holding B.V.

Inventor： YongWoong Jeong ,  HakJoo Lee ,  KiKang Kim ,  JongHyun Ahn ,  YoungMin Kim ,  YoungSim Kim

IPC: C23C16/44 ,  C23C16/455

Abstract: Provided is a method for seasoning a reactor in which a dry cleaning step and a first seasoning step are carried out at the first temperature, then the temperature is raised to a second temperature. The method also comprises a second seasoning step and a substrate processing step are carried out at the second temperature. The seasoning step of the disclosure suppresses dry cleaning byproducts from evaporating, spreading and re-spreading in a reactor. Thus, deterioration of the film quality deposited on a substrate is prevented, extending the wet etch cycle of the reactor and improving the uptime and the efficiency of the reactor.

公开(公告)号：US20220243322A1

公开(公告)日：2022-08-04

申请号：US17585224

申请日：2022-01-26

Applicant: ASM IP Holding B.V.

Inventor： TaeWoong Kim ,  JiHwan Ryu ,  YongWoong Jeong ,  YoungSim Kim ,  YoungMin Kim

IPC: C23C16/44 ,  H01J37/32 ,  C23C16/458 ,  C23C16/455

Abstract: Provided is a reactor capable of improving the symmetry of the profile of a thin film deposited on a substrate with an asymmetric exhaust structure, wherein a distance between a gas flow control ring (FCR) and an exhaust unit on one side where an exhaust port is located is greater than a distance between the FCR and the exhaust unit on the opposite side of the exhaust port.

公开(公告)号：US20200176244A1

公开(公告)日：2020-06-04

申请号：US16702506

申请日：2019-12-03

Applicant: ASM IP Holding B.V.

Inventor： HakJoo Lee ,  HakJoon Kim ,  YoungSim Kim

IPC: H01L21/02 ,  H01L21/67

Abstract: A method of cleaning blind spots around a substrate supporting apparatus by controlling a position of the substrate supporting apparatus includes moving the substrate supporting apparatus relative to a ring and supplying a cleaning gas to an upper space of the substrate supporting apparatus.