-
公开(公告)号：US10852247B2
公开(公告)日：2020-12-01
申请号：US15664808
申请日：2017-07-31
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Stanislav Smirnov , Johannes Matheus Marie De Wit , Teunis Willem Tukker , Armand Eugene Albert Koolen
Abstract: An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.
-
公开(公告)号：US20170248794A1
公开(公告)日：2017-08-31
申请号：US15439856
申请日：2017-02-22
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Markus Franciscus Antonius EURLINGS , Armand Eugene Albert Koolen , Teunis Willem Tukker , Johannes Matheus Marie De Wit , Stanislav Smirnov
CPC classification number: G02B27/0988 , G01B11/272 , G01N21/49 , G01N21/8806 , G01N2201/0631 , G02B6/0008 , G02B26/008 , G02B27/0927 , G02B27/0994 , G03F7/70075 , G03F7/70191 , G03F7/70616 , G03F7/70633
Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.
-
Patent Agency Ranking
3.发明授权Photon source, metrology apparatus, lithographic system and device manufacturing method 有权光子源，计量仪器，光刻系统和器件制造方法公开(公告)号：US09357626B2
公开(公告)日：2016-05-31
申请号：US14548734
申请日：2014-11-20
Applicant: ASML Netherlands B.V.
Inventor： Henricus Petrus Maria Pellemans , Pavel Stanislavovich Antsiferov , Vladimir Mihailovitch Krivtsun , Johannes Matheus Marie De Wit , Ralph Jozef Johannes Gerardus Anna Maria Smeets , Gerbrand Van Der Zouw
IPC: G21K5/04 , H01J65/04 , H05H1/24 , G03F7/20 , G01N21/956 , H05G2/00 , H01J61/54 , H01J61/02 , H05B41/38
CPC classification number: H05H1/24 , G01N21/956 , G01N2201/061 , G03F7/20 , G03F7/70033 , G03F7/70483 , G03F7/70616 , G03F7/70641 , H01J61/02 , H01J61/54 , H01J61/545 , H01J65/04 , H05B41/38 , H05G2/003 , H05G2/008
Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
Abstract translation: 激光驱动光源包括激光和聚焦光学元件。 这些产生聚焦在容纳气体（例如Xe）的容器内的等离子体形成区域上的辐射束。 收集光学器件收集由激光辐射维持的等离子体发射的光子以形成输出辐射束。 等离子体具有细长形式（L> d），并且收集光学器件被配置为收集从等离子体沿纵向出现的光子。 与收集从等离子体横向辐射的辐射的源相比，等离子体的亮度增加。 使用光源的计量装置可以由于亮度的增加而获得更高的精度和/或吞吐量。 可以提供背反射器。 可以使用微波辐射代替激光辐射以形成等离子体。
-
公开(公告)号：US10303064B2
公开(公告)日：2019-05-28
申请号：US15589958
申请日：2017-05-08
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Teunis Willem Tukker , Johannes Matheus Marie De Wit , Jonas Mertes , Gerbrand Van Der Zouw
IPC: G03B27/42 , G03F7/20 , G03F7/16 , G03F7/38 , G03F7/26 , G01B11/06 , G01B11/27 , G01N21/88 , G01N21/47 , G02B27/09
Abstract: Disclosed are an optical system for conditioning a beam of radiation, and an illumination system and metrology apparatus comprising such an optical system. The optical system comprises one or more optical mixing elements in an optical system. The optical system defines at least a first optical mixing stage, at least a second optical mixing stage, and at least one transformation stage, configured such that radiation entering the second optical mixing stage includes a transformed version of radiation exiting the first optical mixing stage. The first and second optical mixing stages can be provided using separate optical mixing elements, or by multiple passes through the same optical mixing element. The transformation stage can be a Fourier transformation stage. Both spatial distribution and angular distribution of illumination can be homogenized as desired.
-
公开(公告)号：US10416567B2
公开(公告)日：2019-09-17
申请号：US15443681
申请日：2017-02-27
Applicant: ASML Netherlands B.V.
Inventor： Johannes Matheus Marie De Wit , Kim Gerard Feijen , Anko Jozef Cornelus Sijben , Martinus Maassen , Henricus Martinus Johannes Van De Groes
Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.
-
6.发明授权Photon source, metrology apparatus, lithographic system and device manufacturing method 有权光子源，计量仪器，光刻系统和器件制造方法公开(公告)号：US08921814B2
公开(公告)日：2014-12-30
申请号：US13902285
申请日：2013-05-24
Applicant: ASML Netherlands B.V.
Inventor： Henricus Petrus Maria Pellemans , Pavel Stanislavovich Antsiferov , Vladimir Mihailovitch Krivtsun , Johannes Matheus Marie De Wit , Ralph Josef Johannes Gerardus Anna M Smeets , Gerbrand Van Der Zouw
IPC: G21K5/04 , H01J65/04 , G01N21/956 , G03F7/20 , H01J61/54 , H05H1/24 , H05G2/00 , H05B41/38 , H01J61/02
CPC classification number: H05H1/24 , G01N21/956 , G01N2201/061 , G03F7/20 , G03F7/70033 , G03F7/70483 , G03F7/70616 , G03F7/70641 , H01J61/02 , H01J61/54 , H01J61/545 , H01J65/04 , H05B41/38 , H05G2/003 , H05G2/008
Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.
Abstract translation: 激光驱动光源包括激光和聚焦光学元件。 这些产生聚焦在容纳气体（例如Xe）的容器内的等离子体形成区域上的辐射束。 收集光学器件收集由激光辐射维持的等离子体发射的光子以形成输出辐射束。 等离子体具有细长形式（L> d），并且收集光学器件被配置成收集从等离子体沿纵向出现的光子。 与收集从等离子体横向辐射的辐射的源相比，等离子体的亮度增加。 使用光源的计量装置可以由于亮度的增加而获得更高的精度和/或吞吐量。 可以提供背反射器。 可以使用微波辐射代替激光辐射以形成等离子体。
-
公开(公告)号：US10234767B2
公开(公告)日：2019-03-19
申请号：US15660498
申请日：2017-07-26
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Nitesh Pandey , Duygu Akbulut , Teunis Willem Tukker , Johannes Matheus Marie De Wit
Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.
-
-
-
-
-
-
Search Results
7
records
(took 0.016 seconds)
