公开(公告)号：US20220326152A1

公开(公告)日：2022-10-13

申请号：US17639845

申请日：2020-09-04

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Johannes Hendrikus SCHELLEKENS ,  David O'DWYER ,  Nan LIN ,  Gerrit Jacobus Hendrik BRUSSAARD

IPC: G01N21/47 ,  G02F1/35 ,  G03F7/20

Abstract: A high harmonic generation assembly and method for generating high harmonic radiation. The assembly comprises a cavity configured to receive input radiation and increase the intensity of the input radiation inside the cavity for forming drive radiation suitable for use in high harmonic generation. The assembly further comprises an interaction region within the cavity at which, in use, a medium is present, the medium being configured to generate harmonic radiation by high harmonic generation when the drive radiation is incident thereupon, and an optical assembly configured to direct the drive radiation to pass through the interaction region, and comprising an output coupler comprising an aperture through which at least a part of the generated harmonic radiation is able to exit the cavity. The optical assembly is further configured to shape the drive radiation into a converging hollow beam before the drive radiation passes through the interaction region.

公开(公告)号：US20190212660A1

公开(公告)日：2019-07-11

申请号：US16331547

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Willem Maria Julia Marcel COENE ,  Peter Danny VAN VOORST ,  Duygu AKBULUT ,  Sarathi ROY

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70941

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

公开(公告)号：US20240377765A1

公开(公告)日：2024-11-14

申请号：US18286486

申请日：2022-03-31

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Stephen EDWARD ,  Sjoerd Nicolaas Lambertus DONDERS ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  David Q'DWYER ,  Andrey NIKIPELOV ,  Gosse Charies DE VRIES

IPC: G03F7/00 ,  G02F1/35

Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.

公开(公告)号：US20180149987A1

公开(公告)日：2018-05-31

申请号：US15575069

申请日：2016-03-14

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Arie Jeffrey DEN BOEF ,  Alessandro POLO ,  Patricius Aloysius Jacobus TINNEMANS ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Elahe YEGANEGI DASTGERDI ,  Willem Marie Julia Marcel COENE ,  Erik Willem BOGAART ,  Simon Reinald HUISMAN

IPC: G03F9/00 ,  G03F7/20

Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.