公开(公告)号：US12007590B2

公开(公告)日：2024-06-11

申请号：US16965172

申请日：2019-01-04

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan De Groot ,  Johannes Jacobus Matheus Baselmans ,  Derick Yun Chek Chong ,  Yassin Chowdhury

IPC: G02B5/18 ,  G01M11/02 ,  G02B27/00 ,  G02B27/42 ,  G03F7/00

CPC classification number: G02B5/1819 ,  G01M11/0271 ,  G02B27/0012 ,  G02B27/4233 ,  G03F7/706

Abstract: A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through-apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.

公开(公告)号：US10401723B2

公开(公告)日：2019-09-03

申请号：US16300370

申请日：2017-05-30

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan De Groot ,  Gerard Frans Jozef Schasfoort ,  Maksym Yuriiovych Sladkov ,  Manfred Petrus Johannes Maria Dikkers ,  Jozef Maria Finders ,  Pieter-Jan Van Zwol ,  Johannes Jacobus Matheus Baselmans ,  Stefan Michael Bruno Baumer ,  Laurentius Cornelius De Winter ,  Wouter Joep Engelen ,  Marcus Adrianus Van De Kerkhof ,  Robbert Jan Voogd

IPC: G02B5/02 ,  G03F7/20 ,  G03F1/24 ,  G03F1/42 ,  G03F1/44 ,  G03F9/00 ,  G02B5/22 ,  G02B5/18

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

公开(公告)号：US11960215B2

公开(公告)日：2024-04-16

申请号：US17282871

申请日：2019-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Vahid Mohammadi ,  Yassin Chowdhury ,  Pieter Cristiaan De Groot ,  Wouter Joep Engelen ,  Marcel Johannes Petrus Theodorus Van Der Hoorn

IPC: H01L31/18 ,  G03F7/00 ,  H01L31/02 ,  H01L31/0216

CPC classification number: G03F7/7085 ,  H01L31/02019 ,  H01L31/02161 ,  H01L31/02164 ,  H01L31/1868

Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.

公开(公告)号：US10732498B2

公开(公告)日：2020-08-04

申请号：US16502674

申请日：2019-07-03

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan De Groot ,  Gerard Frans Jozef Schasfoort ,  Maksym Yuriiovych Sladkov ,  Manfred Petrus Johannes Maria Dikkers ,  Jozef Maria Finders ,  Pieter-Jan Van Zwol ,  Johannes Jacobus Matheus Baselmans ,  Stefan Michael Bruno Baumer ,  Laurentius Cornelius De Winter ,  Wouter Joep Engelen ,  Marcus Adrianus Van De Kerkhof ,  Robbert Jan Voogd

IPC: G03F1/24 ,  G03F1/42 ,  G03F1/44 ,  G02B5/02 ,  G03F7/20 ,  G03F9/00 ,  G02B5/22 ,  G02B5/18

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.