Method of operating a patterning device and lithographic apparatus

    公开(公告)号:US09958788B2

    公开(公告)日:2018-05-01

    申请号:US15405009

    申请日:2017-01-12

    Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a fine (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

    Method of operating a patterning device and lithographic apparatus
    6.
    发明授权
    Method of operating a patterning device and lithographic apparatus 有权
    操作图案形成装置和光刻装置的方法

    公开(公告)号:US09568833B2

    公开(公告)日:2017-02-14

    申请号:US14512120

    申请日:2014-10-10

    Abstract: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

    Abstract translation: 光刻掩模版被照射以将图案转印到基板上,引起由于加热引起的变形。 使用标线的周边部分中的参考标记计算变形,并测量其相对位置随时间的变化。 定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。 在一个实施例中,每个方程将标记对对于沿着连接每对的线(s,s1,s2)的细胞的扩张的位置。 可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。 校正可以根据计算结果进行应用。 可以将能量施加到图案形成装置(例如通过热输入或机械致动器)以修改局部位置偏差的分布。

Patent Agency Ranking