-
公开(公告)号：US10299361B2
公开(公告)日：2019-05-21
申请号：US15469267
申请日：2017-03-24
Applicant: ASML Netherlands B.V.
Inventor： Christoffel Johannes Liebenberg , Robert William Parry
Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.
-
Patent Agency Ranking
公开(公告)号：US20230143962A1
公开(公告)日：2023-05-11
申请号：US17913013
申请日：2021-03-10
Applicant: ASML Netherlands B.V.
Inventor： Rostislav Rokitski , Philip M. Conklin , Cory Alan Stinson , Alexander Anthony Schafgans , Christoffel Johannes Liebenberg
CPC classification number: H01S3/2333 , H01S3/1003 , H01S3/0085 , H01S3/2232 , H01S3/10061
Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.
-
公开(公告)号：US20220350181A1
公开(公告)日：2022-11-03
申请号：US17762982
申请日：2020-09-17
Applicant: ASML Netherlands B.V.
Abstract: An optical modulator includes an acousto-optic assembly and a thermal management apparatus. The acousto-optic assembly includes: an acousto-optic material; a first side configured to receive an incident light beam; and a second side configured to emit an output light beam based on the incident light beam. The thermal management apparatus includes: a first thermally conductive material in thermal contact with the first side of the acousto-optic assembly; and a second thermally conductive material in thermal contact with the second side of the acousto-optic assembly.
-
公开(公告)号：US20180279458A1
公开(公告)日：2018-09-27
申请号：US15469267
申请日：2017-03-24
Applicant: ASML Netherlands B.V.
Inventor： Christoffel Johannes Liebenberg , Robert William Parry
CPC classification number: H05G2/008 , G02F1/0126 , G02F1/015 , G02F1/35 , G02F2001/0151 , G02F2202/10 , G03F7/70033 , G03F7/70041 , G03F7/70558 , G03F7/70566 , H01S3/0057 , H01S3/0085 , H01S3/2232
Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.
-
公开(公告)号：US10887975B2
公开(公告)日：2021-01-05
申请号：US16246648
申请日：2019-01-14
Applicant: ASML Netherlands B.V.
Inventor： Christoffel Johannes Liebenberg , Robert William Parry
Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.
-
公开(公告)号：US20190150267A1
公开(公告)日：2019-05-16
申请号：US16246648
申请日：2019-01-14
Applicant: ASML Netherlands B.V.
Inventor： Christoffel Johannes Liebenberg , Robert William Parry
Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.
-
-
-
-
-
Search Results
6
records
(took 0.014 seconds)
