摘要:
There are disclosed a nonlinear optical element capable of second harmonic generation comprising a crystalline inclusion complex of a lattice-forming host compound crystallized with continuous channel cavities in the presence of a nonlinearly polarizable guest compound in a noncentrosymmetric space group, said guest compound having specified properties, and both said guest and host being selected from specified classes; a nonlinear optical device; a method of generating second harmonic radiation; and an electro-optic modulator.
摘要:
There are disclosed a nonlinear optical element capable of second harmonic generation comprising a crystalline inclusion complex of a lattice-forming host compound crystallized with continuous channel cavities in the presence of a nonlinearly polarizable guest compound in a noncentrosymmetric space group, said guest compound having specified properties, and both said guest and host being selected from specified classes; a nonlinear optical device; a method of generating second harmonic radiation; and an electro-optic modulator.
摘要:
Photopolymerizable compositions comprising(a) at least one ethylenically unsaturated compound,(b) at least one organic polymeric binder,(c) optionally at least one photoinitiator and(d) at least one constrained N-alkylamino aryl ketone compound as defined, e.g., bis(9-julolidyl ketone), bis-(N-ethyl-1,2,3,4-tetrahydro-6-quinolyl)ketone, etc. The compositions, in layer form, are useful in photoresists, including projection speed photoresists, printing plates, drafting and toning films, etc.
摘要:
Sensitizers for photopolymerizable compositions, the sensitizers being .alpha.,.beta.-unsaturated ketones derived from acetyltetrahydronaphthalene or acetylindane and dialkylaminoaryl aldehyde; and the photopolymerizable compositions comprising said sensitizers.
摘要:
Semiconductor processing compositions comprising amidoxime compounds having two or more amidoxime functional groups and their use in semiconductor processing to remove photoresist, polymeric materials, etching residues and copper oxides from semiconductor substrates, particularly substrates comprising copper, low-k dielectric material, titanium nitride, and/or titanium oxynitride.
摘要:
The present invention is a composition and cleaning method for use in semiconductor processes wherein the compositions comprises at least one amidoxime compound.
摘要:
This invention concerns the preparation of polymers of low polydispersity and/or controlled molecular weight and architecture employing living free radical polymerization initiated by an alkoxyamine initiator or nitroxide plus, optionally a free radical initiator, the polymer produced thereby; selected nitroxide and alkoxyamine initiators; and a process for making the initiators; the polymeric products being useful in protective coatings.
摘要:
Semiconductor processing compositions comprising amidoxime compounds having two or more amidoxime functional groups and their use in semiconductor processing to remove photoresist, polymeric materials, etching residues and copper oxides from semiconductor substrates, particularly substrates comprising copper, low-k dielectric material, titanium nitride, and/or titanium oxynitride.
摘要:
An improved aqueous cathodic electrocoating composition having a binder of an epoxy-amine adduct and a polyisocyanate crosslinking agent; wherein the improvement is the use of a polyisocyanate crosslinking agent having at least one crosslinkable morpholine dione group per molecule. Electrodeposited finishes are formed that have reduced volatile emissions and film weight loss when heated to cure.