公开(公告)号：US10858727B2

公开(公告)日：2020-12-08

申请号：US15600247

申请日：2017-05-19

Applicant: Applied Materials, Inc.

Inventor： Jingjing Liu ,  Zhong Qiang Hua ,  Adolph Miller Allen ,  Michael W. Stowell ,  Srinivas D. Nemani ,  Chentsau Ying ,  Bhargav Citla ,  Viachslav Babayan ,  Andrej Halabica

IPC: H01J37/34 ,  C23C14/06 ,  C23C14/35 ,  H01J37/32 ,  C23C14/54 ,  H01L21/311 ,  H01L21/02 ,  H01L21/033 ,  C23C14/34

Abstract: A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.

公开(公告)号：US20180051368A1

公开(公告)日：2018-02-22

申请号：US15600247

申请日：2017-05-19

Applicant: Applied Materials, Inc.

Inventor： Jingjing Liu ,  Zhong Qiang Hua ,  Adolph Miller Allen ,  Michael W. Stowell ,  Srinivas D. Nemani ,  Chentsau Ying ,  Bhargav Citla ,  Viachslav Babayan ,  Andrej Halabica

IPC: C23C14/06 ,  C23C14/35 ,  C23C14/34 ,  C23C14/54 ,  H01J37/34 ,  H01L21/02

CPC classification number: C23C14/0605 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/354 ,  C23C14/541 ,  C23C14/542 ,  H01J37/32724 ,  H01J37/3426 ,  H01J37/3435 ,  H01J37/3452 ,  H01J37/3467 ,  H01L21/02115 ,  H01L21/02266 ,  H01L21/0332 ,  H01L21/31144

Abstract: A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.