公开(公告)号：US20230313378A1

公开(公告)日：2023-10-05

申请号：US17709931

申请日：2022-03-31

Applicant: Applied Materials, Inc.

Inventor： Yongjing Lin ,  Lei Zhou ,  Muhannad Mustafa ,  Shih Chung Chen ,  Zhihui Liu ,  Chi-Chou Lin ,  Bin Cao ,  Janardhan Devrajan ,  Mario D. Silvetti ,  Mandyam Sriram

IPC: C23C16/458 ,  C23C16/455

CPC classification number: C23C16/4586 ,  C23C16/45544

Abstract: Substrate support, substrate support assemblies and process chambers comprising same are described. The substrate support has a thermally conductive body with a top surface, a bottom surface and an outer edge, and a plurality of long edge purge channel outlet opening at the outer edge of the thermally conductive body. The substrate support is configured to support a substrate to be processed on a top surface of the substrate support. The top surface of the thermally conductive body may have a ceramic coating. Each of the plurality of purge channel outlet is in fluid communication with a long edge purge channel. The long edge purge channel is coated with a long edge purge channel coating. A substrate support assembly includes the substrate support and the support post coupled to the substrate support. The processing chamber include a chamber body and the substrate support within the chamber body.

公开(公告)号：US11598003B2

公开(公告)日：2023-03-07

申请号：US15702234

申请日：2017-09-12

Applicant: APPLIED MATERIALS, INC.

Inventor： Faruk Gungor ,  Dien-Yeh Wu ,  Joel M. Huston ,  Mei Chang ,  Xiaoxiong Yuan ,  Kazuya Daito ,  Avgerinos V. Gelatos ,  Takashi Kuratomi ,  Yu Chang ,  Bin Cao

IPC: C23C16/455 ,  C23C16/505 ,  C23C16/46 ,  C23C16/458

Abstract: Apparatus for processing a substrate are provided herein. In some embodiments a showerhead assembly includes a gas distribution plate having a plurality of apertures; a holder having a wall, an radially inwardly extending flange extending from a lower portion of the wall and coupled to the gas distribution plate, and a radially outwardly extending flange extending from an upper portion of the wall, wherein the wall has a thickness between about 0.015 inches and about 0.2 inches; and a heating apparatus disposed above and spaced apart from the gas distribution plate, wherein the heating apparatus includes a heater configured to heat the gas distribution plate.

公开(公告)号：US20240344608A1

公开(公告)日：2024-10-17

申请号：US18209762

申请日：2023-06-14

Applicant: Applied Materials, Inc.

Inventor： Shashidhara Patel H B ,  Nagaraj Naik ,  Muhannad Mustafa ,  Bin Cao ,  Sanjeev Baluja ,  Aditya Chuttar ,  Jae Hwa Park

IPC: F16J15/00 ,  F16J15/02

CPC classification number: F16J15/002 ,  F16J15/024

Abstract: Sealing bodies comprising a first body having a top surface and a bottom surface defining a thickness thereof. An inlet conduit and an outlet conduit are in fluid communication with one or more of the top surface, the bottom surface, or a top channel formed in the top surface or a bottom channel formed in the bottom surface.

公开(公告)号：US20230193463A1

公开(公告)日：2023-06-22

申请号：US18065742

申请日：2022-12-14

Applicant: Applied Materials, Inc.

Inventor： Shashidhara Patel H B ,  Madhuri Kalva ,  Sreenivasa Rao Nunna ,  Shih Chung Chen ,  Yongjing Lin ,  Bin Cao

IPC: C23C16/455 ,  H01J37/32

CPC classification number: C23C16/45565 ,  H01J37/32458 ,  H01J37/32449 ,  C23C16/45544

Abstract: Gas distribution apparatuses, e.g., showerheads, comprise passages having a first conical bore section, a small bore section, and a second conical bore section. The first conical bore sections comprise a first non-perpendicular wall angle relative to a back surface of a faceplate. The second conical bore sections comprise a second non-perpendicular angle to a front surface of the faceplate. The conical sections including non-perpendicular angles are effective to mitigate and/or eliminate changes in flow parameters through the passages after bead blast processes.