公开(公告)号：US20240420924A1

公开(公告)日：2024-12-19

申请号：US18209716

申请日：2023-06-14

Applicant: Applied Materials, Inc.

Inventor： Amit Sahu ,  Shashidhara Patel H B ,  Muhannad Mustafa ,  Rakesh Ramadas ,  Sanjeev Baluja

IPC: H01J37/32 ,  H01L21/67

Abstract: Cooling flanges and semiconductor manufacturing processing chamber comprising the cooling flanges are disclosed. The cooling flanges comprise a flange body with a gas channel extending through the length thereof. The gas channel has an inlet funnel, a middle channel and an outlet funnel with a purge gas inlet in a side of the flange body. The purge gas inlet connects to the middle channel of the gas channel.

公开(公告)号：US20240247374A1

公开(公告)日：2024-07-25

申请号：US18118499

申请日：2023-03-07

Applicant: Applied Materials, Inc.

Inventor： Shashidhara Patel H B ,  Nagaraj Naik ,  Muhannad Mustafa

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45561 ,  C23C16/4408

Abstract: Embodiments of precursor delivery systems are described herein. The precursor delivery systems include a reservoir having a cylindrical body, a conical shaped inlet on a first end of the cylindrical body, and a conical shaped outlet on a second end of the cylindrical body. Each of the conical shaped inlet and the conical shaped outlet independently have an angle in a range of from 5 degrees to 45 degrees. The amount of time to purge the reservoir described herein is reduced by at least 50% compared to reservoirs not having a conical shaped inlet and/or a conical shaped outlet. Additional embodiments relate to methods for removing particles from the reservoir. An increased number of particles are removed from the reservoir described herein compared to reservoirs not having a conical shaped inlet and/or a conical shaped outlet.

公开(公告)号：US20240068095A1

公开(公告)日：2024-02-29

申请号：US17897452

申请日：2022-08-29

Applicant: Applied Materials, Inc.

Inventor： Youngki Chang ,  Dhritiman Subha Kashyap ,  Rakesh Ramadas ,  Ashutosh Agarwal ,  Shashidhara Patel H B ,  Muhannad Mustafa ,  Sanjeev Baluja

IPC: C23C16/455

CPC classification number: C23C16/45565 ,  C23C16/45512 ,  C23C16/45561 ,  C23C16/45589

Abstract: Gas distribution apparatuses described herein include a mixing plate adjacent a back plate of a showerhead. The mixing plate has a back surface and a front surface defining a thickness of the mixing plate. The mixing plate has a mixing channel comprising a top portion and a bottom portion defining a mixing channel length and at least two gas inlets in fluid communication with the top portion of the mixing channel. The gas distribution apparatus also includes a mixer disposed within the thickness of the mixing plate in the top portion of the mixing channel. The mixer has a top plate and a mixer stem extending from the top plate and a plurality of blades positioned along the mixer stem length. Also provided are processing chambers including the gas distribution apparatuses described herein.

公开(公告)号：US20240408621A1

公开(公告)日：2024-12-12

申请号：US18207457

申请日：2023-06-08

Applicant: Applied Materials, Inc.

Inventor： Shashidhara Patel H B ,  Muhannad Mustafa ,  Amit Sahu ,  Sanjeev Baluja

IPC: B05B1/00 ,  B05B1/24 ,  H01L21/02

Abstract: Process chamber lids, processing chambers and methods using the lids are described. In some embodiments, the lid includes a showerhead with a plurality of heater segments in a peripheral region thereof. The heated showerhead minimizes temperature non-uniformity and/or minimizes heat less near the peripheral edge of a processed wafer.

公开(公告)号：US20240344608A1

公开(公告)日：2024-10-17

申请号：US18209762

申请日：2023-06-14

Applicant: Applied Materials, Inc.

Inventor： Shashidhara Patel H B ,  Nagaraj Naik ,  Muhannad Mustafa ,  Bin Cao ,  Sanjeev Baluja ,  Aditya Chuttar ,  Jae Hwa Park

IPC: F16J15/00 ,  F16J15/02

CPC classification number: F16J15/002 ,  F16J15/024

Abstract: Sealing bodies comprising a first body having a top surface and a bottom surface defining a thickness thereof. An inlet conduit and an outlet conduit are in fluid communication with one or more of the top surface, the bottom surface, or a top channel formed in the top surface or a bottom channel formed in the bottom surface.

公开(公告)号：US20230193463A1

公开(公告)日：2023-06-22

申请号：US18065742

申请日：2022-12-14

Applicant: Applied Materials, Inc.

Inventor： Shashidhara Patel H B ,  Madhuri Kalva ,  Sreenivasa Rao Nunna ,  Shih Chung Chen ,  Yongjing Lin ,  Bin Cao

IPC: C23C16/455 ,  H01J37/32

CPC classification number: C23C16/45565 ,  H01J37/32458 ,  H01J37/32449 ,  C23C16/45544

Abstract: Gas distribution apparatuses, e.g., showerheads, comprise passages having a first conical bore section, a small bore section, and a second conical bore section. The first conical bore sections comprise a first non-perpendicular wall angle relative to a back surface of a faceplate. The second conical bore sections comprise a second non-perpendicular angle to a front surface of the faceplate. The conical sections including non-perpendicular angles are effective to mitigate and/or eliminate changes in flow parameters through the passages after bead blast processes.