公开(公告)号：US09733573B2

公开(公告)日：2017-08-15

申请号：US14993071

申请日：2016-01-11

Applicant: Applied Materials, Inc.

Inventor： David Markle ,  Thomas Laidig ,  Jeffrey Kaskey ,  Jang Fung Chen

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03F7/7015 ,  G03B27/42 ,  G03F7/70291

Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.

公开(公告)号：US09907152B2

公开(公告)日：2018-02-27

申请号：US15087173

申请日：2016-03-31

Applicant: Applied Materials, Inc.

Inventor： Jeffrey Kaskey ,  Thomas Laidig ,  David Markle ,  Jang Fung Chen

IPC: H05B37/04 ,  H05B37/03 ,  G03F7/20

CPC classification number: H05B37/04 ,  G03F7/70575 ,  H05B37/03 ,  H05B37/032

Abstract: An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.

公开(公告)号：US09250509B2

公开(公告)日：2016-02-02

申请号：US13909076

申请日：2013-06-04

Applicant: Applied Materials, Inc.

Inventor： David Markle ,  Thomas Laidig ,  Jeffrey Kaskey ,  Jang Fung Chen

IPC: G03B7/20 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/7015 ,  G03B27/42 ,  G03F7/70291

Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.

Abstract translation: 公开了一种空间光调制器成像系统。 该系统包括：照明模块，被配置为提供表示由空间光调制器成像系统成像的数据图案的照明光;投影模块，被配置为将照明光投影到基板;以及照明投影光束分离器，其耦合在照明模块 以及所述投影模块，其中所述照明投影光束分离器被配置为沿着照明光轴接收照明光，并且沿着投影光轴传输接收到所述投影模块的照明光，并且其中所述照明光轴和所述投影光学 轴基本上彼此平行。

公开(公告)号：US10114297B2

公开(公告)日：2018-10-30

申请号：US15629183

申请日：2017-06-21

Applicant: Applied Materials, Inc.

Inventor： Thomas L. Laidig ,  Jeffrey Kaskey

IPC: G03B27/44 ,  G03B27/54 ,  G03F7/20

Abstract: Embodiments of the present disclosure generally relate to systems and methods for performing photolithography processes. In one embodiment, a photolithography system includes a plurality of image projection systems each having an extendable lens, and a plate having a plurality of openings. Each extendable lens is configured to be extended through a corresponding opening of the plurality of openings during operation. The plate includes one or more elements disposed adjacent each opening and each lens includes one or more elements formed thereon. The one or more elements formed on the plate and the one or more elements formed on the lens are utilized to measure one or more distances between the lens and the plate. Any deviation of the measured distance from a reference distance indicates that the lens has been shifted. Measures to compensate for the shifting of the lens will be performed.

公开(公告)号：US10031427B2

公开(公告)日：2018-07-24

申请号：US14871066

申请日：2015-09-30

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. Johnston ,  Jeffrey Kaskey ,  Thomas Laidig

IPC: G03F7/20 ,  F16F7/10 ,  F16F15/00 ,  F16F15/02

Abstract: Systems and apparatus for performing photolithography processes are described. The system and apparatus may comprise a slab, at least one stage disposed on the slab, and a vibration damping system disposed on the slab, the vibration damping system comprising a weight that is substantially equal to a weight of one of the at least one stage and a substrate that moves simultaneously with movement of the one of the at least one stage.