公开(公告)号：US10648074B2

公开(公告)日：2020-05-12

申请号：US16516111

申请日：2019-07-18

Applicant: Applied Materials, Inc.

Inventor： Daniel J. Hoffman ,  Karl M. Brown ,  Ying Rui ,  John Pipitone

IPC: C23C14/34 ,  C23C14/35 ,  H01J37/32 ,  H01J37/34 ,  C23C14/50 ,  C23C14/54

Abstract: In a plasma enhanced physical vapor deposition of a material onto workpiece, a metal target faces the workpiece across a target-to-workpiece gap less than a diameter of the workpiece. A carrier gas is introduced into the chamber and gas pressure in the chamber is maintained above a threshold pressure at which mean free path is less than 5% of the gap. RF plasma source power from a VHF generator is applied to the target to generate a capacitively coupled plasma at the target, the VHF generator having a frequency exceeding 30 MHz. The plasma is extended across the gap to the workpiece by providing through the workpiece a first VHF ground return path at the frequency of the VHF generator.

公开(公告)号：US11049761B2

公开(公告)日：2021-06-29

申请号：US16673894

申请日：2019-11-04

Applicant: Applied Materials, Inc.

Inventor： Karl M. Brown ,  Jason M. Schaller

IPC: H01L21/687 ,  H01L21/67 ,  H01J37/32 ,  C23C14/50

Abstract: A shutter disk suitable for shield a substrate support in a physical vapor deposition chamber is provided. In one embodiment, the shutter disk includes a disk-shaped body having an outer diameter disposed between a top surface and a bottom surface. The disk-shape body includes a double step connecting the bottom surface to the outer diameter.

公开(公告)号：US20180119272A1

公开(公告)日：2018-05-03

申请号：US15853566

申请日：2017-12-22

Applicant: Applied Materials, Inc.

Inventor： Daniel J. Hoffman ,  Karl M. Brown ,  Ying Rui ,  John Pipitone

IPC: C23C14/35 ,  H01J37/34 ,  C23C14/34 ,  H01J37/32 ,  C23C14/50 ,  C23C14/54

CPC classification number: C23C14/35 ,  C23C14/3471 ,  C23C14/50 ,  C23C14/542 ,  H01J37/32091 ,  H01J37/32174 ,  H01J37/32577 ,  H01J37/3266 ,  H01J37/32706 ,  H01J37/32715 ,  H01J37/34 ,  H01J37/3444

Abstract: In a plasma enhanced physical vapor deposition of a material onto workpiece, a metal target faces the workpiece across a target-to-workpiece gap less than a diameter of the workpiece. A carrier gas is introduced into the chamber and gas pressure in the chamber is maintained above a threshold pressure at which mean free path is less than 5% of the gap. RF plasma source power from a VHF generator is applied to the target to generate a capacitively coupled plasma at the target, the VHF generator having a frequency exceeding 30 MHz. The plasma is extended across the gap to the workpiece by providing through the workpiece a first VHF ground return path at the frequency of the VHF generator.

公开(公告)号：US20190338411A1

公开(公告)日：2019-11-07

申请号：US16516111

申请日：2019-07-18

Applicant: Applied Materials, Inc.

Inventor： Daniel J. Hoffman ,  Karl M. Brown ,  Ying Rui ,  John Pipitone

IPC: C23C14/35 ,  H01J37/34 ,  H01J37/32 ,  C23C14/50 ,  C23C14/34 ,  C23C14/54

Abstract: In a plasma enhanced physical vapor deposition of a material onto workpiece, a metal target faces the workpiece across a target-to-workpiece gap less than a diameter of the workpiece. A carrier gas is introduced into the chamber and gas pressure in the chamber is maintained above a threshold pressure at which mean free path is less than 5% of the gap. RF plasma source power from a VHF generator is applied to the target to generate a capacitively coupled plasma at the target, the VHF generator having a frequency exceeding 30 MHz. The plasma is extended across the gap to the workpiece by providing through the workpiece a first VHF ground return path at the frequency of the VHF generator.

公开(公告)号：US10468292B2

公开(公告)日：2019-11-05

申请号：US15245004

申请日：2016-08-23

Applicant: Applied Materials, Inc.

Inventor： Karl M. Brown ,  Jason Schaller

IPC: C23C16/00 ,  H01L21/687 ,  H01J37/32 ,  H01L21/67 ,  C23C14/50

Abstract: A shutter disk suitable for shield a substrate support in a physical vapor deposition chamber is provided. In one embodiment, the shutter disk includes a disk-shaped body having an outer diameter disposed between a top surface and a bottom surface. The disk-shape body includes a double step connecting the bottom surface to the outer diameter.

公开(公告)号：US09518326B2

公开(公告)日：2016-12-13

申请号：US14059402

申请日：2013-10-21

Applicant: Applied Materials, Inc.

Inventor： Karl M. Brown

IPC: C23C28/00 ,  H01L21/683 ,  H02N13/00

CPC classification number: C23C28/32 ,  C23C28/34 ,  H01L21/6831 ,  H02N13/00

Abstract: In one embodiment, a method for forming an electrostatic chuck includes forming vias in a ceramic plate and printing a metal paste in the vias and curing the ceramic plate. The method includes printing the metal paste on a front surface of the ceramic plate and curing the ceramic plate, and printing the metal paste on a bottom surface of the ceramic plate and curing the ceramic plate to form one or more contact pads. The method also includes printing a dielectric film on the front surface of the ceramic plate and curing the ceramic plate. The method may further include printing one or more heating elements on a bottom surface of the ceramic plate and curing the ceramic plate, printing the dielectric film on the bottom, and bonding the ceramic plate to a backing plate.

Abstract translation: 在一个实施例中，用于形成静电卡盘的方法包括在陶瓷板中形成通孔并在通孔中印刷金属膏并固化陶瓷板。 该方法包括将金属膏印刷在陶瓷板的前表面上并固化陶瓷板，并将金属膏印刷在陶瓷板的底表面上并固化陶瓷板以形成一个或多个接触垫。 该方法还包括在陶瓷板的前表面上印刷电介质膜并固化陶瓷板。 该方法还可以包括在陶瓷板的底表面上印刷一个或多个加热元件并固化陶瓷板，将电介质膜印刷在底部上，并将陶瓷板粘合到背板上。

公开(公告)号：US10400328B2

公开(公告)日：2019-09-03

申请号：US15853566

申请日：2017-12-22

Applicant: Applied Materials, Inc.

Inventor： Daniel J. Hoffman ,  Karl M. Brown ,  Ying Rui ,  John Pipitone

IPC: C23C14/34 ,  C23C14/35 ,  H01J37/32 ,  H01J37/34 ,  C23C14/50 ,  C23C14/54

Abstract: In a plasma enhanced physical vapor deposition of a material onto workpiece, a metal target faces the workpiece across a target-to-workpiece gap less than a diameter of the workpiece. A carrier gas is introduced into the chamber and gas pressure in the chamber is maintained above a threshold pressure at which mean free path is less than 5% of the gap. RF plasma source power from a VHF generator is applied to the target to generate a capacitively coupled plasma at the target, the VHF generator having a frequency exceeding 30 MHz. The plasma is extended across the gap to the workpiece by providing through the workpiece a first VHF ground return path at the frequency of the VHF generator.

公开(公告)号：US09871240B2

公开(公告)日：2018-01-16

申请号：US14746771

申请日：2015-06-22

Applicant: Applied Materials, Inc.

Inventor： Mahendra Christopher Orilall ,  Raman Talwar ,  Karl M. Brown ,  Lu Yang ,  Hooman Bolandi ,  Victor Pebenito ,  Connie P. Wang ,  Robert Z. Bachrach

IPC: H01M2/16 ,  B05B5/025 ,  H01M4/485 ,  H01M4/505 ,  H01M4/525 ,  H01M4/58 ,  H01M10/0525

CPC classification number: H01M2/1666 ,  B05B5/0255 ,  H01M2/162 ,  H01M2/1646 ,  H01M2/1686 ,  H01M4/485 ,  H01M4/505 ,  H01M4/525 ,  H01M4/5815 ,  H01M4/5825 ,  H01M10/0525 ,  H01M2220/10 ,  H01M2220/20 ,  H01M2220/30 ,  Y02E60/122

Abstract: Embodiments of the present invention relate generally to lithium-ion batteries, and more specifically, to batteries having integrated separators and methods of fabricating such batteries. In one embodiment, a lithium-ion battery having an electrode structure is provided. The lithium-ion battery comprises an anode stack, a cathode stack, and a porous electrospun polymer separator comprising a nano-fiber backbone structure. The anode stack comprises an anodic current collector and an anode structure formed over a first surface of the anodic current collector. The cathode stack comprises a cathodic current collector and a cathode structure formed over a first surface of the cathodic current collector. The porous electrospun polymer separator is positioned between the anode structure and the cathode structure.