公开(公告)号：US20220122865A1

公开(公告)日：2022-04-21

申请号：US17075321

申请日：2020-10-20

Applicant: Applied Materials, Inc.

Inventor： Kartik Santhanam ,  Kartik Shah ,  Wolfgang Aderhold ,  Martin Hilkene ,  Stephen Moffatt

IPC: H01L21/67 ,  G06N20/00 ,  G05B19/406

Abstract: Embodiments disclosed herein include a processing tool for semiconductor processing. In an embodiment, the processing tool comprises a chamber, and a plurality of witness sensors integrated with the chamber. In an embodiment, the processing tool further comprises a drift detection module. In an embodiment, data from the plurality of witness sensors is provided to the drift detection module as input data. In an embodiment, the processing tool further comprises a dashboard for displaying output data from the drift detection module.

公开(公告)号：US20230163001A1

公开(公告)日：2023-05-25

申请号：US17534116

申请日：2021-11-23

Applicant: Applied Materials, Inc.

Inventor： Martin Hilkene ,  Huy Q. Nguyen ,  Kartik Shah

IPC: H01L21/67 ,  G05B19/406

CPC classification number: H01L21/67276 ,  G05B19/406

Abstract: Embodiments disclosed herein include methods for monitoring chamber performance in order to mitigate first wafer effects. In an embodiment, a method for determining an optimum chamber condition comprises monitoring a parameter during execution of a recipe for a number of substrates after the chamber has been in an idle state. In an embodiment, the method further comprises determining when a repeatability of the parameter meets a stability specification. In an embodiment, the method may continue with recording the parameter.

公开(公告)号：US20240385109A1

公开(公告)日：2024-11-21

申请号：US18197868

申请日：2023-05-16

Applicant: Applied Materials, Inc.

Inventor： Sven Schramm ,  Martin Hilkene ,  Elias Martinez ,  Amir Bayati

IPC: G01N21/3577 ,  G01N21/25

Abstract: Embodiments disclosed herein include a moisture detection module. In an embodiment, the moisture detection module comprises an optical bandpass filter configured to be optically coupled to a light source, where a passband is centered at 309 nm. In an embodiment, the moisture detection module further comprises a detector optically coupled to the optical bandpass filter.

公开(公告)号：US20230187169A1

公开(公告)日：2023-06-15

申请号：US17549703

申请日：2021-12-13

Applicant: Applied Materials, Inc

Inventor： Martin Hilkene ,  Samuel Howells

IPC: H01J37/244 ,  H01J37/32 ,  G01L21/12

CPC classification number: H01J37/244 ,  H01J37/32834 ,  H01J37/32357 ,  G01L21/12

Abstract: Embodiments disclosed herein include, a sensor for detecting radical ion flux. In an embodiment, the sensor comprises a first resistor, where the first resistor comprises a length of wire of a first catalytic composition. In an embodiment, a second resistor is electrically coupled to the first resistor, where the second resistor comprises a length of wire of the first catalytic composition. In an embodiment, the second resistor is coated with a non-catalytic material. In an embodiment, the sensor further comprises a third resistor electrically coupled to the second resistor, and a fourth resistor electrically coupled to the first resistor and the third resistor

公开(公告)号：US20230178346A1

公开(公告)日：2023-06-08

申请号：US17545618

申请日：2021-12-08

Applicant: Applied Materials, Inc.

Inventor： Stephen Moffatt ,  Martin Hilkene

IPC: H01J37/32 ,  H01L21/67 ,  G06F30/20 ,  H01L21/66

CPC classification number: H01J37/32963 ,  H01L21/67253 ,  H01J37/32926 ,  G06F30/20 ,  H01L22/10

Abstract: In an embodiment, a plasma processing tool with an extendable probe is described. In an embodiment, the plasma processing tool comprises a chamber, and a pedestal for supporting a substrate. In an embodiment, an edge ring is around a perimeter of the pedestal. Additionally, a sensor at an end of a probe is provided. In an embodiment, the probe is configured to extend over the pedestal.

公开(公告)号：US20220084842A1

公开(公告)日：2022-03-17

申请号：US17019061

申请日：2020-09-11

Applicant: Applied Materials, Inc.

Inventor： Martin Hilkene ,  Kartik Shah ,  Stephen Moffatt

IPC: H01L21/67 ,  G01F1/86

Abstract: Embodiments disclosed herein include a processing tool and methods of using the processing tool. In an embodiment, the processing tool comprises a chamber, and a cartridge for flowing one or more processing gasses into the chamber from a plurality of gas sources. In an embodiment, the processing tool further comprises a mass flow controller for each of the plurality of gas sources, and a mass flow meter between the gas sources and the cartridge. In an embodiment, the processing tool further comprises a first pressure gauge between the mass flow meter and the cartridge, a second pressure gauge fluidically coupled to the chamber, and an exhaust line coupled to the chamber.

公开(公告)号：US20250062107A1

公开(公告)日：2025-02-20

申请号：US18234169

申请日：2023-08-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Martin Hilkene ,  Tobin Kaufman-Osborn ,  Yunil Cho

IPC: H01J37/32 ,  H01J37/244

Abstract: A method of monitoring a plasma-based process in a process chamber includes measuring a first temperature at a first location associated with a process chamber during a plasma-based process; and determining a value representative of a first radical species flux associated with the plasma-based process based on the first temperature. The method includes a trained machine learning model to determine if a value representative of a radical species flux satisfies a radical species flux drift threshold.

公开(公告)号：US11735447B2

公开(公告)日：2023-08-22

申请号：US17075321

申请日：2020-10-20

Applicant: Applied Materials, Inc.

Inventor： Kartik Santhanam ,  Kartik Shah ,  Wolfgang Aderhold ,  Martin Hilkene ,  Stephen Moffatt

IPC: H01L21/67 ,  G05B19/406 ,  G06N20/00

CPC classification number: H01L21/67276 ,  G05B19/406 ,  G06N20/00 ,  G05B2219/45031

Abstract: Embodiments disclosed herein include a processing tool for semiconductor processing. In an embodiment, the processing tool comprises a chamber, and a plurality of witness sensors integrated with the chamber. In an embodiment, the processing tool further comprises a drift detection module. In an embodiment, data from the plurality of witness sensors is provided to the drift detection module as input data. In an embodiment, the processing tool further comprises a dashboard for displaying output data from the drift detection module.