公开(公告)号：US12134167B2

公开(公告)日：2024-11-05

申请号：US18316190

申请日：2023-05-11

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L D'Ambra

IPC: B24B53/017

Abstract: A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US20240208006A1

公开(公告)日：2024-06-27

申请号：US18597077

申请日：2024-03-06

Applicant: Applied Materials, Inc.

Inventor： Roy C. Nangoy ,  Shantanu Rajiv Gadgil ,  Nathan Arron Davis ,  Allen L. D`Ambra ,  Michael J. Coughlin ,  Sumit Subhash Patankar

IPC: B24B57/02 ,  B24B37/34 ,  B24B53/017

CPC classification number: B24B57/02 ,  B24B37/34 ,  B24B53/017

Abstract: A polishing liquid delivery arm cleaning tool includes a body configured to be removably secured to a polishing liquid delivery arm of a chemical mechanical polishing system, and an insert removably secured to the body. The insert has an arm-facing surface shaped to direct a cleaning fluid from the polishing liquid delivery arm back to an inner surface of an enclosure of the polishing liquid delivery arm.

公开(公告)号：US20230278165A1

公开(公告)日：2023-09-07

申请号：US18316190

申请日：2023-05-11

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D`Ambra

IPC: B24B53/017

CPC classification number: B24B53/017

Abstract: A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US11602776B2

公开(公告)日：2023-03-14

申请号：US16735489

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Michael J. Coughlin ,  Jianqi Wang

IPC: B08B3/12 ,  B08B3/08 ,  H01L21/67

Abstract: In some embodiments, a sonic cleaning system includes a tank configured to receive a liquid that enables propagation of sonic waves and a cylindrical insert located within the tank. The cylindrical insert includes a first end having a first opening and a second end opposite the first end. The second end has a second opening. The cylindrical insert is configured to suspend a workpiece between the first opening and the second opening. The sonic cleaning system includes a sonic transducer located within the cylindrical insert.

公开(公告)号：US11986925B2

公开(公告)日：2024-05-21

申请号：US17977794

申请日：2022-10-31

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D'Ambra

IPC: B24B53/017 ,  B05C17/00 ,  B24B37/34 ,  B65D47/42 ,  B65D81/32 ,  C09D5/00 ,  B05D1/28 ,  B05D5/08

CPC classification number: B24B53/017 ,  B05C17/00 ,  B24B37/34 ,  B65D81/3266 ,  C09D5/00 ,  B05D1/28 ,  B05D5/08 ,  B65D47/42

Abstract: Chemically impregnated applicators used to provide hydrophobic surfaces on chemical mechanical polishing system components and related application methods are shown. A method of forming a hydrophobic coating on a surface of a polishing system component includes cleaning the surface of the polishing system component to remove a polishing fluid residue therefrom and applying a hydrophobicity causing chemical solution to the surface of the polishing system component.

公开(公告)号：US20220314397A1

公开(公告)日：2022-10-06

申请号：US17849576

申请日：2022-06-24

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D`Ambra

IPC: B24B53/017

Abstract: A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US11648645B2

公开(公告)日：2023-05-16

申请号：US17849576

申请日：2022-06-24

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D'Ambra

IPC: B24B53/017

CPC classification number: B24B53/017

Abstract: A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US20210402565A1

公开(公告)日：2021-12-30

申请号：US17344617

申请日：2021-06-10

Applicant: Applied Materials, Inc.

Inventor： Roy C. Nangoy ,  Shantanu Rajiv Gadgil ,  Nathan Arron Davis ,  Allen L. D`Ambra ,  Michael J. Coughlin ,  Sumit Subhash Patankar

IPC: B24B57/02 ,  B24B53/017 ,  B24B37/34

Abstract: A polishing assembly includes a rotatable platen to support a polishing pad, a polishing liquid delivery arm having an enclosure open at a bottom thereof and one or more ports to deliver a polishing liquid and a cleaning fluid downwardly through an interior space of the enclosure onto the polishing pad, and a delivery arm cleaning tool removably attached to the polishing liquid delivery arm, the cleaning tool extending below the delivery arm and having a delivery arm-facing surface shaped such that the cleaning tool directs the cleaning fluid from the polishing liquid delivery arm on to a surface of the enclosure of the polishing liquid delivery arm.

公开(公告)号：US11484987B2

公开(公告)日：2022-11-01

申请号：US16813275

申请日：2020-03-09

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D'Ambra

IPC: B24B53/017 ,  B24B37/34 ,  C09D5/00 ,  B65D81/32 ,  B65D47/42 ,  B05C17/00 ,  B05D1/28 ,  B05D5/08

Abstract: Chemically impregnated applicators used to provide hydrophobic surfaces on chemical mechanical polishing system components and related application methods. A method of forming a hydrophobic coating on a surface of a polishing system component includes cleaning the surface of the polishing system component to remove a polishing fluid residue therefrom and applying a hydrophobicity causing chemical solution to the surface of the polishing system component.

公开(公告)号：US11433436B2

公开(公告)日：2022-09-06

申请号：US16953156

申请日：2020-11-19

Applicant: Applied Materials, Inc.

Inventor： Michael J. Coughlin ,  Allen L. D'Ambra

IPC: B08B3/12 ,  B08B13/00

Abstract: Disclosed herein is a sonic cleaning insert. In one example, the sonic cleaning insert includes a carousel configured to rotate about a central axis. The carousel further includes a platform having an outer perimeter. The platform is radially disposed about the central axis. The carousel has an inner ring and an outer ring circumscribing the inner ring. A plurality of partitions couple the inner ring and the outer ring to the platform. The plurality of partitions are arranged at a predetermined angle about the central axis. The carousel further includes a plurality of holders. Each holder is formed from a portion of the platform, a portion of each of the inner ring and outer ring, and a first sidewall and a second sidewall formed from the plurality of partitions. The carousel is configured for immersion in an ultrasonic vibrating fluid.