公开(公告)号：US09488315B2

公开(公告)日：2016-11-08

申请号：US14207475

申请日：2014-03-12

申请人： APPLIED MATERIALS, INC.

发明人： Roy C. Nangoy ,  Saravjeet Singh

IPC分类号： F16K11/20 ,  F17D1/00

CPC分类号： F17D1/00 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/00 ,  H01L21/67017 ,  Y10T137/8733

摘要： In some embodiments, a gas distribution apparatus may include: a manifold having a gas inlet to receive a process gas from a fast gas exchange unit and a first gas outlet to provide the process gas to a first gas delivery zone; a plurality of flow restrictors fluidly coupled to one another in parallel and to the gas inlet, wherein each of the plurality of flow restrictors are configured to allow at least a portion of a total flow of a process gas through each of the plurality of flow restrictors; and a plurality of valves each coupled to respective ones of the plurality of flow restrictors, wherein the plurality of valves are configured to be selectively opened to allow the process gas to flow through selective ones of the plurality of flow restrictors to provide a desired percentage of a total flow of the process gas to the outlet.

摘要翻译： 在一些实施例中，气体分配设备可以包括：具有气体入口以从快速气体交换单元接收工艺气体的歧管和第一气体出口，以将处理气体提供给第一气体输送区域; 多个流量限制器并联流体耦合到气体入口，其中多个限流器中的每一个被配置为允许处理气体的总流量的至少一部分通过多个流量限制器中的每一个 ; 以及多个阀，每个阀分别联接到所述多个限流器中的相应流量限制器，其中所述多个阀被配置为选择性地打开以允许所述工艺气体流过所述多个限流器中的选择性流量限制器，以提供所需的百分比 工艺气体到出口的总流量。

公开(公告)号：US09070633B2

公开(公告)日：2015-06-30

申请号：US14284088

申请日：2014-05-21

申请人： Applied Materials, Inc.

发明人： Roy C. Nangoy ,  Saravjeet Singh ,  Jon C. Farr ,  Sharma V. Pamarthy ,  Ajay Kumar

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  H01L21/3065 ,  H01J37/32 ,  C23C16/455 ,  C23C16/505 ,  H01L21/67

CPC分类号： H01L21/3065 ,  C23C16/45508 ,  C23C16/45563 ,  C23C16/45574 ,  C23C16/45587 ,  C23C16/45591 ,  C23C16/505 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/3222 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32458 ,  H01L21/30655 ,  H01L21/67069

摘要： Embodiments of the present disclosure relate to method and apparatus for providing processing gases to a process chamber with improved plasma dissociation efficiency. One embodiment of the present disclosure provides a baffle nozzle assembly comprising an outer body defining an extension volume connected to a processing chamber. A processing gas is flown to the processing chamber through the extension volume which is exposed to power source for plasma generation.

摘要翻译： 本公开的实施例涉及用于向具有改进的等离子体解离效率的处理室提供处理气体的方法和装置。 本公开的一个实施例提供了一种挡板喷嘴组件，其包括限定连接到处理室的延伸体的外部主体。 处理气体通过暴露于等离子体产生的电源的延伸体积流到处理室。

公开(公告)号：US20140261805A1

公开(公告)日：2014-09-18

申请号：US14207475

申请日：2014-03-12

申请人： APPLIED MATERIALS, INC.

发明人： Roy C. Nangoy ,  Saravjeet Singh

IPC分类号： G05D7/00

CPC分类号： F17D1/00 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/00 ,  H01L21/67017 ,  Y10T137/8733

摘要： In some embodiments, a gas distribution apparatus may include: a manifold having a gas inlet to receive a process gas from a fast gas exchange unit and a first gas outlet to provide the process gas to a first gas delivery zone; a plurality of flow restrictors fluidly coupled to one another in parallel and to the gas inlet, wherein each of the plurality of flow restrictors are configured to allow at least a portion of a total flow of a process gas through each of the plurality of flow restrictors; and a plurality of valves each coupled to respective ones of the plurality of flow restrictors, wherein the plurality of valves are configured to be selectively opened to allow the process gas to flow through selective ones of the plurality of flow restrictors to provide a desired percentage of a total flow of the process gas to the outlet.

摘要翻译： 在一些实施例中，气体分配设备可以包括：具有气体入口以从快速气体交换单元接收工艺气体的歧管和第一气体出口，以将处理气体提供给第一气体输送区域; 多个流量限制器并联流体耦合到气体入口，其中多个限流器中的每一个被配置为允许处理气体的总流量的至少一部分通过多个限流器中的每一个 ; 以及多个阀，每个阀分别联接到所述多个限流器中的相应流量限制器，其中所述多个阀被配置为选择性地打开以允许所述工艺气体流过所述多个限流器中的选择性流量限制器，以提供所需的百分比 工艺气体到出口的总流量。

公开(公告)号：US11251047B2

公开(公告)日：2022-02-15

申请号：US16173676

申请日：2018-10-29

申请人： Applied Materials, Inc.

发明人： Roy C. Nangoy ,  Chad Pollard ,  Allen L. D'Ambra

IPC分类号： H01L21/306 ,  B24B57/02 ,  B67D7/12 ,  B67D7/42 ,  G01F1/20

摘要： Embodiments of the present disclosure provide for apparatus used to detect clogs in a fluid delivery system during CMP processes and methods of detecting clogs in a fluid delivery system during CMP processes. In particular, embodiments herein provide a flow splitter manifold configured to enable monitoring of the pressure of the polishing fluid disposed therein. Monitoring the fluid pressure in the flow splitter manifold enables the detection of clogs in the delivery lines and/or dispense nozzles that inhibit and/or prevent the flow of polishing fluid therethrough or therefrom.

公开(公告)号：US20210402565A1

公开(公告)日：2021-12-30

申请号：US17344617

申请日：2021-06-10

申请人： Applied Materials, Inc.

发明人： Roy C. Nangoy ,  Shantanu Rajiv Gadgil ,  Nathan Arron Davis ,  Allen L. D`Ambra ,  Michael J. Coughlin ,  Sumit Subhash Patankar

IPC分类号： B24B57/02 ,  B24B53/017 ,  B24B37/34

摘要： A polishing assembly includes a rotatable platen to support a polishing pad, a polishing liquid delivery arm having an enclosure open at a bottom thereof and one or more ports to deliver a polishing liquid and a cleaning fluid downwardly through an interior space of the enclosure onto the polishing pad, and a delivery arm cleaning tool removably attached to the polishing liquid delivery arm, the cleaning tool extending below the delivery arm and having a delivery arm-facing surface shaped such that the cleaning tool directs the cleaning fluid from the polishing liquid delivery arm on to a surface of the enclosure of the polishing liquid delivery arm.

公开(公告)号：US09162236B2

公开(公告)日：2015-10-20

申请号：US13790735

申请日：2013-03-08

申请人： Applied Materials, Inc.

发明人： Roy C. Nangoy ,  Andrew Nguyen

IPC分类号： B05B1/18 ,  H01L21/67 ,  H01J37/32 ,  C23C16/455 ,  B01F15/02

CPC分类号： B05B1/185 ,  B01F15/0264 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/45578 ,  H01J37/32119 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/67069

摘要： Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved uniformity. One embodiment of the present invention provides a gas injection assembly. The gas injection assembly includes an inlet hub, a nozzle having a plurality of injection passages disposed against the inlet hub, and a distribution insert disposed between the nozzle and the inlet hub. The distribution insert has one or more gas distribution passages configured to connect the inlet hub to the plurality of the injection passages the nozzle. Each of the one or more gas distribution passages has one inlet connecting with a plurality of outlets, and distances between the inlet and each of the plurality of outlets are substantially equal.

摘要翻译： 本发明的实施例涉及用于向处理室提供具有改进的均匀性的处理气体的方法和装置。 本发明的一个实施例提供一种气体注入组件。 气体注入组件包括入口轮毂，具有多个设置在入口轮毂上的喷射通道的喷嘴以及设置在喷嘴和入口轮毂之间的分配插入件。 分配插件具有一个或多个气体分配通道，其构造成将入口轮毂连接到喷嘴的多个喷射通道。 一个或多个气体分配通道中的每一个具有与多个出口连接的一个入口，并且多个出口中的入口与每个出口之间的距离基本相等。