公开(公告)号：US12011731B2

公开(公告)日：2024-06-18

申请号：US17365727

申请日：2021-07-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Yao-Hung Yang ,  Shantanu Rajiv Gadgil ,  Tanmay Pramod Gurjar ,  Sudhir R. Gondhalekar

IPC: B05B15/18 ,  B05B1/18 ,  C23C16/455

CPC classification number: B05B15/18 ,  B05B1/18 ,  C23C16/45565

Abstract: Embodiments of showerheads for use in a process chamber and methods of reducing drooping of a showerhead faceplate are provided herein. In some embodiments, a showerhead for use in a process chamber includes: a faceplate having a plurality of gas distribution holes disposed therethrough; and one or more cables that engage with the faceplate and configured to prestress the faceplate.

公开(公告)号：US20210394540A1

公开(公告)日：2021-12-23

申请号：US16909947

申请日：2020-06-23

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Allen L. D`Ambra

IPC: B41J29/17 ,  B41J11/36

Abstract: In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

公开(公告)号：US11881392B2

公开(公告)日：2024-01-23

申请号：US18196341

申请日：2023-05-11

Applicant: Applied Materials, Inc.

Inventor： Yao-Hung Yang ,  Shantanu Rajiv Gadgil ,  Kaushik Rao ,  Vincent Joseph Kirchhoff ,  Sagir Kadiwala ,  Munirah Mahyudin ,  Daniel Chou

IPC: H01K1/18 ,  H01K1/14 ,  H01K1/20 ,  H01K7/00

CPC classification number: H01K1/20 ,  H01K7/00

Abstract: A lamp and epitaxial processing apparatus are described herein. In one example, the lamp includes a bulb, a filament, and a plurality of filament supports disposed in spaced-apart relation to the filament, each of the filament supports having a hook support and a hook. The hook includes a connector configured to fasten the hook to the hook support, a first vertical portion extending from the connector toward the filament, and a rounded portion extending from an end of the first vertical portion distal from the connector and configured to wrap around the filament. A second vertical portion extends from an end of the rounded portion distal from the first vertical portion and the second vertical portion has a length between 60% and 100% of the length of the first vertical portion.

公开(公告)号：US11648645B2

公开(公告)日：2023-05-16

申请号：US17849576

申请日：2022-06-24

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D'Ambra

IPC: B24B53/017

CPC classification number: B24B53/017

Abstract: A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US20210402565A1

公开(公告)日：2021-12-30

申请号：US17344617

申请日：2021-06-10

Applicant: Applied Materials, Inc.

Inventor： Roy C. Nangoy ,  Shantanu Rajiv Gadgil ,  Nathan Arron Davis ,  Allen L. D`Ambra ,  Michael J. Coughlin ,  Sumit Subhash Patankar

IPC: B24B57/02 ,  B24B53/017 ,  B24B37/34

Abstract: A polishing assembly includes a rotatable platen to support a polishing pad, a polishing liquid delivery arm having an enclosure open at a bottom thereof and one or more ports to deliver a polishing liquid and a cleaning fluid downwardly through an interior space of the enclosure onto the polishing pad, and a delivery arm cleaning tool removably attached to the polishing liquid delivery arm, the cleaning tool extending below the delivery arm and having a delivery arm-facing surface shaped such that the cleaning tool directs the cleaning fluid from the polishing liquid delivery arm on to a surface of the enclosure of the polishing liquid delivery arm.

公开(公告)号：US11986925B2

公开(公告)日：2024-05-21

申请号：US17977794

申请日：2022-10-31

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D'Ambra

IPC: B24B53/017 ,  B05C17/00 ,  B24B37/34 ,  B65D47/42 ,  B65D81/32 ,  C09D5/00 ,  B05D1/28 ,  B05D5/08

CPC classification number: B24B53/017 ,  B05C17/00 ,  B24B37/34 ,  B65D81/3266 ,  C09D5/00 ,  B05D1/28 ,  B05D5/08 ,  B65D47/42

Abstract: Chemically impregnated applicators used to provide hydrophobic surfaces on chemical mechanical polishing system components and related application methods are shown. A method of forming a hydrophobic coating on a surface of a polishing system component includes cleaning the surface of the polishing system component to remove a polishing fluid residue therefrom and applying a hydrophobicity causing chemical solution to the surface of the polishing system component.

公开(公告)号：US20230146929A1

公开(公告)日：2023-05-11

申请号：US18091309

申请日：2022-12-29

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Allen L. D`Ambra

IPC: H01L21/67 ,  B24B37/27 ,  B08B3/00 ,  B08B1/04 ,  B24B37/34

CPC classification number: H01L21/6704 ,  B24B37/27 ,  B08B3/003 ,  B08B1/04 ,  B24B37/34 ,  B24B37/12

Abstract: In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

公开(公告)号：US20220314397A1

公开(公告)日：2022-10-06

申请号：US17849576

申请日：2022-06-24

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L. D`Ambra

IPC: B24B53/017

Abstract: A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US12134167B2

公开(公告)日：2024-11-05

申请号：US18316190

申请日：2023-05-11

Applicant: Applied Materials, Inc.

Inventor： Shantanu Rajiv Gadgil ,  Sumit Subhash Patankar ,  Nathan Arron Davis ,  Michael J. Coughlin ,  Allen L D'Ambra

IPC: B24B53/017

Abstract: A method of cleaning a conditioner head includes bringing two clamps of a cleaning tool inward toward a disk-shaped pad conditioner head to press a sponge against an outer surface of the disk-shaped pad conditioner head, and creating relative motion between the cleaning tool and the pad conditioner head to wipe the sponge against the pad conditioner head.

公开(公告)号：US20240208006A1

公开(公告)日：2024-06-27

申请号：US18597077

申请日：2024-03-06

Applicant: Applied Materials, Inc.

Inventor： Roy C. Nangoy ,  Shantanu Rajiv Gadgil ,  Nathan Arron Davis ,  Allen L. D`Ambra ,  Michael J. Coughlin ,  Sumit Subhash Patankar

IPC: B24B57/02 ,  B24B37/34 ,  B24B53/017

CPC classification number: B24B57/02 ,  B24B37/34 ,  B24B53/017

Abstract: A polishing liquid delivery arm cleaning tool includes a body configured to be removably secured to a polishing liquid delivery arm of a chemical mechanical polishing system, and an insert removably secured to the body. The insert has an arm-facing surface shaped to direct a cleaning fluid from the polishing liquid delivery arm back to an inner surface of an enclosure of the polishing liquid delivery arm.